Publication Information

Title:
Radical Enhanced Atomic Layer Deposition of Metals and Oxides
Type:
Thesis
Info:
Niskanen Thesis
Date:
2006-11-10

Author Information

Name Institution
Antti NiskanenUniversity of Helsinki

Films

Plasma TiN


Plasma TiN


Plasma Al



Plasma Al


Plasma AlN



Plasma Ta



Plasma Hf



Plasma Mo



Plasma CuOx



Plasma SrTiO3


Plasma SiO2


Plasma ZnO


Plasma Nb2O5


Plasma Cr2O3


Plasma RuO2


Plasma NiOx


Film/Plasma Properties

Substrates

Keywords

Notes

Thesis covers 5 materials: Al2O3, Ta2O5, TiO2, Cu, and Ag. Films listed on this page either did not work at the chosen experimental conditions or the resulting films were less studied. Consult tables 6 and 10 in the thesis for further information.
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