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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Ta Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing Ta films returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
2Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
3High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
4Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
5Radical Enhanced Atomic Layer Deposition of Metals and Oxides
6A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
7The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties