Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Ta Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing Ta films returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
2Radical Enhanced Atomic Layer Deposition of Metals and Oxides
3Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
4A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
5Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
6High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
7The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties