Publication Information

Title:
The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
Type:
Journal
Info:
Mat. Res. Soc. Symp. Proc. Vol. 716
Date:
2002-01-01

Author Information

Name Institution
Hyungjun KimIBM
C. CabralIBM
C. LavoieIBM
S. M. RossnagelIBM

Films



Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Diffusion Barrier Properties
Analysis: XRD, X-Ray Diffraction

Substrates

Silicon

Keywords

Diffusion Barrier

Notes

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