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S. M. Rossnagel Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by S. M. Rossnagel returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
2The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
3Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
4Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
5Oxygen migration in TiO2-based higher-k gate stacks
6Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
7Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
8Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
9The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
10Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition