S. M. Rossnagel Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by S. M. Rossnagel returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
2Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
3Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
4Oxygen migration in TiO2-based higher-k gate stacks
5Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
6Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
7Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
8Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
9The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
10The physical properties of cubic plasma-enhanced atomic layer deposition TaN films


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