The publication database currently has 1673 entries.
Use Advanced Search for more complex searches
Recent Database Additions
Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology B 20, 1321-1326 (2002)
Date:
2002-04-22
Author Information
| Name | Institution |
|---|---|
| Hyungjun Kim | IBM |
| C. Cabral | IBM |
| C. Lavoie | IBM |
| S. M. Rossnagel | IBM |
Films
Plasma Ta
Film/Plasma Properties
Characteristic: Diffusion Barrier Properties
Analysis: XRD, X-Ray Diffraction
Characteristic: Diffusion Barrier Properties
Analysis: Optical Scattering
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Substrates
| Si(001) |
| Silicon |
Keywords
Notes
| 1225 |