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Publication Information
Title:
Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology B 20, 1321-1326 (2002)
Date:
2002-04-22
Author Information
Name | Institution |
---|---|
Hyungjun Kim | IBM |
C. Cabral | IBM |
C. Lavoie | IBM |
S. M. Rossnagel | IBM |
Films
Plasma Ta
Film/Plasma Properties
Characteristic: Diffusion Barrier Properties
Analysis: XRD, X-Ray Diffraction
Characteristic: Diffusion Barrier Properties
Analysis: Optical Scattering
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Substrates
Si(001) |
Silicon |
Keywords
Notes
1225 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |