Publication Information

Title:
Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology B 20, 1321-1326 (2002)
Date:
2002-04-22

Author Information

Name Institution
Hyungjun KimIBM
C. CabralIBM
C. LavoieIBM
S. M. RossnagelIBM

Films


Film/Plasma Properties

Characteristic: Diffusion Barrier Properties
Analysis: XRD, X-Ray Diffraction

Characteristic: Diffusion Barrier Properties
Analysis: Optical Scattering

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Substrates

Si(001)
Silicon

Keywords

Notes

1225