|1||Ereztech||Tantalum (V) chloride, sublimed (99.99+%-Ta)|
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Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition|
|2||Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers|
|3||Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties|
|4||Radical Enhanced Atomic Layer Deposition of Metals and Oxides|
|5||The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties|
|6||Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper|
|7||Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition|
|8||The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties|
|9||The physical properties of cubic plasma-enhanced atomic layer deposition TaN films|
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