TaCl5, Tantalum Pentachloride, CAS# 7721-01-9

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NumberVendorLink
1EreztechTantalum (V) chloride, sublimed (99.99+%-Ta)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
2Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
3Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
4Radical Enhanced Atomic Layer Deposition of Metals and Oxides
5The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
6Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
7Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
8The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
9The physical properties of cubic plasma-enhanced atomic layer deposition TaN films


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