Publication Information

Title:
Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Applied Physics 92, 7080-7085 (2002)
Date:
2002-09-16

Author Information

Name Institution
Hyungjun KimIBM
A. J. KellockIBM
S. M. RossnagelIBM

Films

Plasma TaNx


Film/Plasma Properties

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Thickness
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: FRES, Forward Recoil Elastic Spectrometry

Characteristic: Microstructure
Analysis: XRD, X-Ray Diffraction

Characteristic: Microstructure
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Resistivity, Sheet Resistance
Analysis: -

Substrates

Si(001)
SiO2

Keywords

Notes

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