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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 461 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
2Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
3Microwave properties of superconducting atomic-layer deposited TiN films
4Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
5Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
6Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
7Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
8Atomic layer epitaxy of Si using atomic H
9The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
10Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
11Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
12Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
13Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
14New materials for memristive switching
15Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
16Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
17In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
18Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
19Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
20Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
21Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
22Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
23Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
24Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
25A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
26Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
27Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
28Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
29WS2 transistors on 300 mm wafers with BEOL compatibility
30Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
31Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
32Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
33Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
34Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
35AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
36Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
37Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
38Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
39Room-Temperature Atomic Layer Deposition of Platinum
40Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
41Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
42Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
43Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
44Nitride memristors
45Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
46Radical Enhanced Atomic Layer Deposition of Metals and Oxides
47Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
48Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
49Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
50Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
51Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
52Plasma-enhanced atomic layer deposition of tungsten nitride
53Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
54Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
55Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
56Nitride memristors
57A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
58Sub-nanometer heating depth of atomic layer annealing
59Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
60Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
61Trilayer Tunnel Selectors for Memristor Memory Cells
62Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
63Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
64Atmospheric pressure plasma enhanced spatial ALD of silver
65Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
66The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
67Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
68Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
69In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
70Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
71Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
72Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
73PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
74Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
75Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
76Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
77Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
78Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
79Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
80Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
81Sub-10-nm ferroelectric Gd-doped HfO2 layers
82High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
83Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
84Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
85Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
86The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
87Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
88Fabrication and deformation of three-dimensional hollow ceramic nanostructures
89High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
90Highly-Conformal Amorphous W-Si-N Thin Films by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization
91AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
92Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
93A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
94Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
95Radical Enhanced Atomic Layer Deposition of Metals and Oxides
96A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
97New materials for memristive switching
98Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
99Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
100Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
101Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
102Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
103Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
104Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
105Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
106Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
107Plasma-enhanced atomic layer deposition of Co on metal surfaces
108Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
109Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
110In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
111Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
112Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
113Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
114New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
115Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
116ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
117Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
118Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
119Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
120Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
121Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
122Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
123Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
124Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
125AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
126P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
127Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
128Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
129Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
130Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
131Plasma-Assisted Atomic Layer Deposition of Palladium
132Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
133Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
134Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
135Plasma enhanced atomic layer deposition of Co thin film on Ï„-MnAl for effective magnetic exchange coupling and enhanced energy products
136Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
137Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
138Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
139PEALD of Copper using New Precursors for Next Generation of Interconnections
140Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
141Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
142Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
143Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
144Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
145Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
146Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
147Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
148Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
149Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
150Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
151Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
152Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
153Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
154Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
155Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
156Atomic Layer Deposition of Nanolayered Carbon Films
157A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
158Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
159XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
160Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
161Formation of aluminum nitride thin films as gate dielectrics on Si(100)
162Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
163Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
164Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
165Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
166Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
167Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
168Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
169Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
170Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
171Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
172Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
173Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
174Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
175Copper-ALD Seed Layer as an Enabler for Device Scaling
176Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
177Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
178Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
179Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
180Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
181Radical Enhanced Atomic Layer Deposition of Metals and Oxides
182Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
183Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
184Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
185Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
186Radical Enhanced Atomic Layer Deposition of Metals and Oxides
187Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
188Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
189Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
190In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
191Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
192Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
193Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
194A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
195Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
196AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
197Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
198Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
199Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
200Radical Enhanced Atomic Layer Deposition of Metals and Oxides
201A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
202Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
203P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
204Atomic layer epitaxy of germanium
205Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
206Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
207Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
208Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
209Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
210Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
211Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
212Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
213Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
214Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
215Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
216Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
217Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
218Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
219Remote Plasma ALD of Platinum and Platinum Oxide Films
220GeSbTe deposition for the PRAM application
221Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
222Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
223Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
224Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
225Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
226Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
227Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
228Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
229Radical Enhanced Atomic Layer Deposition of Metals and Oxides
230Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
231Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
232Tuning size and coverage of Pd nanoparticles using atomic layer deposition
233Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
234Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
235Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
236Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
237Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
238Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
239The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
240Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
241Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
242Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
243Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
244Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
245Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
246Evaluation of plasma parameters on PEALD deposited TaCN
247Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
248A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
249Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
250Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
251Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
252Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
253Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
254Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
255Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
256High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
257Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
258Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
259Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
260Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
261Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
262Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
263Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
264Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
265In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
266Atomic hydrogen-assisted ALE of germanium
267Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
268Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
269HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
270Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
271Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
272Self-limiting diamond growth from alternating CFx and H fluxes
273Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
274Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
275Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
276HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
277Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
278Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
279RF Characterization of Novel Superconducting Materials and Multilayers
280In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
281Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
282Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
283ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
284A route to low temperature growth of single crystal GaN on sapphire
285Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
286TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
287Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
288Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
289Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
290Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
291Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
292Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
293Performance of Samples with Novel SRF Materials and Growth Techniques
294Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
295Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
296Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
297Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
298Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
299Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
300Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
301Radical Enhanced Atomic Layer Deposition of Metals and Oxides
302Radical Enhanced Atomic Layer Deposition of Metals and Oxides
303Radical Enhanced Atomic Layer Deposition of Metals and Oxides
304The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
305Structural and optical characterization of low-temperature ALD crystalline AlN
306Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
307Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
308Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
309Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
310GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
311Hydrogen plasma-enhanced atomic layer deposition of copper thin films
312Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
313Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
314Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
315Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
316Atomic Layer Deposition of Niobium Nitride from Different Precursors
317Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
318Plasma-Enhanced Atomic Layer Deposition of Ni
319Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
320Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
321High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
322GeSbTe deposition for the PRAM application
323Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
324Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
325Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
326Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
327Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
328Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
329The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
330Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
331Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
332Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
333Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
334Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
335Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
336Atomic layer epitaxy for quantum well nitride-based devices
337GeSbTe deposition for the PRAM application
338Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
339Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
340Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
341In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
342Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
343Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
344Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
345Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
346Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
347GeSbTe deposition for the PRAM application
348Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
349Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
350Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
351Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
352Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
353Plasma-enhanced atomic layer deposition of superconducting niobium nitride
354Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
355TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
356The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
357Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
358Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
359Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
360Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
361Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
362Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
363Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
364Study on the characteristics of aluminum thin films prepared by atomic layer deposition
365Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
366Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
367Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
368Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
369Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
370Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
371High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
372The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
373Gadolinium nitride films deposited using a PEALD based process
374Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
375Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
376Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
377Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
378Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
379Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
380Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
381Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
382Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
383Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
384Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
385Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
386Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
387Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
388Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
389Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
390Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
391High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
392Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
393In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
394Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
395Atomic layer epitaxy for quantum well nitride-based devices
396Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
397P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
398Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
399Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
400Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
401The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
402Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
403Plasma enhanced atomic layer deposition of aluminum sulfide thin films
404Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
405Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
406Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
407Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
408Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
409Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
410Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
411Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
412Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
413In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
414Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
415Atomic layer epitaxy for quantum well nitride-based devices
416Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
417In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
418Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
419RF Characterization of Novel Superconducting Materials and Multilayers
420Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
421Film Uniformity in Atomic Layer Deposition