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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 461 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
2P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
3RF Characterization of Novel Superconducting Materials and Multilayers
4Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
5Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
6Atomic Layer Deposition of Niobium Nitride from Different Precursors
7Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
8Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
9Remote Plasma ALD of Platinum and Platinum Oxide Films
10Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
11Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
12AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
13Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
14Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
15Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
16Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
17GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
18Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
19Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
20WS2 transistors on 300 mm wafers with BEOL compatibility
21Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
22Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
23High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
24Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
25Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
26Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
27Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
28Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
29Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
30Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
31Gadolinium nitride films deposited using a PEALD based process
32Plasma enhanced atomic layer deposition of aluminum sulfide thin films
33Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
34Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
35New materials for memristive switching
36Microwave properties of superconducting atomic-layer deposited TiN films
37Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
38Self-limiting diamond growth from alternating CFx and H fluxes
39Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
40Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
41Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
42Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
43Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
44Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
45Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
46A route to low temperature growth of single crystal GaN on sapphire
47Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
48Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
49Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
50Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
51In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
52Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
53P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
54Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
55Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
56High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
57Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
58Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
59Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
60Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
61Plasma-enhanced atomic layer deposition of Co on metal surfaces
62Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
63Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
64Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
65Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
66Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
67Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
68Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
69Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
70Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
71Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
72Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
73Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
74Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
75Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
76Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
77Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
78In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
79The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
80Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
81Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
82Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
83Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
84Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
85Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
86Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
87Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
88Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
89Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
90Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
91Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
92Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
93Sub-10-nm ferroelectric Gd-doped HfO2 layers
94Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
95Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
96Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
97Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
98Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
99Nitride memristors
100Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
101Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
102Atomic layer epitaxy of germanium
103Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
104A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
105Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
106Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
107The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
108Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
109A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
110Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
111Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
112Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
113Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
114Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
115Plasma-Assisted Atomic Layer Deposition of Palladium
116Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
117Sub-nanometer heating depth of atomic layer annealing
118Structural and optical characterization of low-temperature ALD crystalline AlN
119A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
120RF Characterization of Novel Superconducting Materials and Multilayers
121In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
122Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
123Atomic layer epitaxy for quantum well nitride-based devices
124Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
125High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
126HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
127In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
128High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
129Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
130Copper-ALD Seed Layer as an Enabler for Device Scaling
131Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
132Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
133A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
134Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
135Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
136Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
137AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
138Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
139Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
140Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
141Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
142Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
143Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
144Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
145Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
146Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
147In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
148ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
149Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
150Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
151Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
152Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
153Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
154Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
155Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
156Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
157Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
158XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
159Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
160Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
161Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
162Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
163Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
164Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
165Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
166Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
167Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
168Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
169Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
170Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
171Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
172Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
173Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
174Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
175Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
176Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
177GeSbTe deposition for the PRAM application
178Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
179Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
180Radical Enhanced Atomic Layer Deposition of Metals and Oxides
181Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
182Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
183Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
184Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
185Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
186Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
187Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
188Radical Enhanced Atomic Layer Deposition of Metals and Oxides
189Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
190Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
191Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
192TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
193Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
194Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
195HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
196Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
197Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
198Radical Enhanced Atomic Layer Deposition of Metals and Oxides
199Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
200Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
201Radical Enhanced Atomic Layer Deposition of Metals and Oxides
202Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
203Radical Enhanced Atomic Layer Deposition of Metals and Oxides
204Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
205The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
206Room-Temperature Atomic Layer Deposition of Platinum
207Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
208Atomic layer epitaxy of Si using atomic H
209Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
210Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
211Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
212Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
213Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
214Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
215Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
216Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
217New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
218ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
219Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
220Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
221Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
222Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
223Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
224Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
225Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
226Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
227Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
228Film Uniformity in Atomic Layer Deposition
229Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
230A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
231Radical Enhanced Atomic Layer Deposition of Metals and Oxides
232Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
233Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
234Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
235In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
236Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
237Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
238Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
239Plasma-enhanced atomic layer deposition of superconducting niobium nitride
240Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
241Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
242In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
243Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
244A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
245Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
246Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
247Atomic layer epitaxy for quantum well nitride-based devices
248Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
249Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
250The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
251Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
252The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
253Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
254Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
255Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
256Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
257Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
258Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
259Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
260Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
261Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
262Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
263Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
264Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
265Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
266Trilayer Tunnel Selectors for Memristor Memory Cells
267Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
268Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
269Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
270Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
271In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
272P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
273Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
274Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
275Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
276Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
277Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
278Radical Enhanced Atomic Layer Deposition of Metals and Oxides
279Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
280Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
281Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
282Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
283TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
284Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
285Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
286Atomic layer epitaxy for quantum well nitride-based devices
287Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
288Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
289Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
290Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
291Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
292Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
293Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
294Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
295Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
296In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
297Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
298Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
299Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
300AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
301Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
302Hydrogen plasma-enhanced atomic layer deposition of copper thin films
303Plasma-enhanced atomic layer deposition of tungsten nitride
304Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
305High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
306In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
307Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
308Nitride memristors
309Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
310Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
311Atomic Layer Deposition of Nanolayered Carbon Films
312The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
313Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
314The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
315Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
316Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
317Highly-Conformal Amorphous W-Si-N Thin Films by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization
318Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
319Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
320Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
321Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
322Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
323PEALD of Copper using New Precursors for Next Generation of Interconnections
324Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
325Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
326Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
327Radical Enhanced Atomic Layer Deposition of Metals and Oxides
328Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
329Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
330Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
331Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
332Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
333Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
334Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
335Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
336Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
337Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
338Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
339Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
340Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
341Performance of Samples with Novel SRF Materials and Growth Techniques
342GeSbTe deposition for the PRAM application
343Formation of aluminum nitride thin films as gate dielectrics on Si(100)
344Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
345Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
346Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
347Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
348Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
349Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
350Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
351Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
352Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
353Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
354Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
355Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
356Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
357Atmospheric pressure plasma enhanced spatial ALD of silver
358Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
359Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
360Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
361Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
362Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
363Plasma enhanced atomic layer deposition of Co thin film on Ï„-MnAl for effective magnetic exchange coupling and enhanced energy products
364Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
365Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
366Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
367A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
368Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
369Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
370Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
371The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
372Study on the characteristics of aluminum thin films prepared by atomic layer deposition
373Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
374High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
375Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
376Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
377Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
378Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
379Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
380Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
381Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
382Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
383Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
384Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
385New materials for memristive switching
386Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
387Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
388PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
389Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
390Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
391GeSbTe deposition for the PRAM application
392Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
393Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
394Atomic hydrogen-assisted ALE of germanium
395Plasma-Enhanced Atomic Layer Deposition of Ni
396Evaluation of plasma parameters on PEALD deposited TaCN
397Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
398Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
399Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
400Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
401Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
402Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
403Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
404Radical Enhanced Atomic Layer Deposition of Metals and Oxides
405AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
406Fabrication and deformation of three-dimensional hollow ceramic nanostructures
407Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
408Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
409Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
410Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
411Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
412Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
413Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
414GeSbTe deposition for the PRAM application
415A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
416Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
417Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
418Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
419The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
420Tuning size and coverage of Pd nanoparticles using atomic layer deposition
421Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide