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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 461 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
2Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
3Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
4Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
5Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
6Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
7Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
8Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
9Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
10Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
11Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
12Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
13Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
14Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
15The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
16Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
17Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
18Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
19Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
20Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
21Atomic layer epitaxy for quantum well nitride-based devices
22Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
23Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
24Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
25Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
26Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
27Radical Enhanced Atomic Layer Deposition of Metals and Oxides
28Structural and optical characterization of low-temperature ALD crystalline AlN
29Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
30Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
31Radical Enhanced Atomic Layer Deposition of Metals and Oxides
32In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
33Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
34Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
35Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
36Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
37Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
38Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
39Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
40Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
41Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
42Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
43Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
44In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
45Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
46Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
47Highly-Conformal Amorphous W-Si-N Thin Films by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization
48Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
49Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
50Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
51Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
52The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
53Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
54Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
55Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
56Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
57Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
58Atomic layer epitaxy for quantum well nitride-based devices
59Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
60Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
61Tuning size and coverage of Pd nanoparticles using atomic layer deposition
62Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
63Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
64Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
65AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
66Radical Enhanced Atomic Layer Deposition of Metals and Oxides
67Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
68Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
69Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
70Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
71Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
72Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
73Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
74Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
75Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
76Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
77Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
78TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
79New materials for memristive switching
80Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
81Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
82HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
83Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
84Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
85Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
86Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
87Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
88Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
89Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
90Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
91Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
92Atomic Layer Deposition of Nanolayered Carbon Films
93Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
94Atomic layer epitaxy of germanium
95Plasma enhanced atomic layer deposition of Co thin film on Ï„-MnAl for effective magnetic exchange coupling and enhanced energy products
96Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
97Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
98P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
99Trilayer Tunnel Selectors for Memristor Memory Cells
100Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
101Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
102Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
103Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
104High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
105Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
106Atomic Layer Deposition of Niobium Nitride from Different Precursors
107Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
108Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
109Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
110The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
111PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
112Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
113Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
114Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
115Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
116Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
117Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
118Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
119Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
120Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
121Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
122Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
123GeSbTe deposition for the PRAM application
124Remote Plasma ALD of Platinum and Platinum Oxide Films
125Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
126Hydrogen plasma-enhanced atomic layer deposition of copper thin films
127Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
128Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
129High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
130Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
131Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
132Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
133Self-limiting diamond growth from alternating CFx and H fluxes
134Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
135Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
136Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
137Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
138GeSbTe deposition for the PRAM application
139Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
140High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
141Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
142Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
143P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
144Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
145Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
146AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
147Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
148Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
149Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
150Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
151The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
152Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
153Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
154RF Characterization of Novel Superconducting Materials and Multilayers
155Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
156Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
157Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
158Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
159Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
160Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
161Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
162Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
163Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
164In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
165Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
166Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
167Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
168Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
169Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
170High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
171Formation of aluminum nitride thin films as gate dielectrics on Si(100)
172Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
173Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
174The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
175Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
176Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
177Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
178Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
179Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
180Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
181Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
182Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
183Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
184Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
185A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
186Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
187Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
188Radical Enhanced Atomic Layer Deposition of Metals and Oxides
189Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
190Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
191Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
192Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
193Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
194Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
195Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
196In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
197In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
198Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
199Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
200Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
201Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
202P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
203Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
204Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
205High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
206Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
207Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
208Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
209Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
210Evaluation of plasma parameters on PEALD deposited TaCN
211Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
212Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
213GeSbTe deposition for the PRAM application
214Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
215Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
216Radical Enhanced Atomic Layer Deposition of Metals and Oxides
217Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
218The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
219Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
220Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
221In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
222Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
223Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
224A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
225Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
226Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
227Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
228Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
229Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
230Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
231Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
232Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
233GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
234Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
235Room-Temperature Atomic Layer Deposition of Platinum
236Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
237Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
238High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
239AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
240Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
241Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
242Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
243Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
244In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
245The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
246In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
247Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
248Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
249Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
250Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
251Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
252Radical Enhanced Atomic Layer Deposition of Metals and Oxides
253Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
254Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
255Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
256TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
257Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
258Plasma-Enhanced Atomic Layer Deposition of Ni
259A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
260Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
261Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
262New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
263Study on the characteristics of aluminum thin films prepared by atomic layer deposition
264Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
265Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
266Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
267Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
268In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
269Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
270Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
271Film Uniformity in Atomic Layer Deposition
272Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
273Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
274Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
275A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
276Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
277Microwave properties of superconducting atomic-layer deposited TiN films
278Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
279Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
280Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
281Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
282Plasma-enhanced atomic layer deposition of tungsten nitride
283Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
284Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
285PEALD of Copper using New Precursors for Next Generation of Interconnections
286Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
287Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
288Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
289Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
290Atomic hydrogen-assisted ALE of germanium
291Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
292Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
293Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
294Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
295Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
296Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
297Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
298Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
299Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
300Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
301Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
302Radical Enhanced Atomic Layer Deposition of Metals and Oxides
303Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
304Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
305Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
306Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
307Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
308Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
309WS2 transistors on 300 mm wafers with BEOL compatibility
310Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
311Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
312ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
313Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
314Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
315Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
316Radical Enhanced Atomic Layer Deposition of Metals and Oxides
317Atmospheric pressure plasma enhanced spatial ALD of silver
318Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
319A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
320Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
321ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
322Radical Enhanced Atomic Layer Deposition of Metals and Oxides
323Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
324Plasma-Assisted Atomic Layer Deposition of Palladium
325Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
326Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
327Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
328Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
329Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
330The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
331Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
332The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
333Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
334Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
335Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
336Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
337Nitride memristors
338Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
339Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
340Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
341Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
342Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
343XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
344Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
345Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
346Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
347Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
348Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
349A route to low temperature growth of single crystal GaN on sapphire
350GeSbTe deposition for the PRAM application
351Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
352A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
353Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
354Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
355Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
356Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
357Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
358Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
359Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
360Nitride memristors
361Sub-nanometer heating depth of atomic layer annealing
362Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
363Atomic layer epitaxy for quantum well nitride-based devices
364Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
365Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
366Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
367Plasma-enhanced atomic layer deposition of superconducting niobium nitride
368Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
369Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
370Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
371Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
372Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
373Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
374Plasma-enhanced atomic layer deposition of Co on metal surfaces
375Plasma enhanced atomic layer deposition of aluminum sulfide thin films
376New materials for memristive switching
377Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
378In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
379AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
380Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
381Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
382Fabrication and deformation of three-dimensional hollow ceramic nanostructures
383Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
384Gadolinium nitride films deposited using a PEALD based process
385Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
386Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
387Atomic layer epitaxy of Si using atomic H
388Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
389Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
390Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
391Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
392Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
393Copper-ALD Seed Layer as an Enabler for Device Scaling
394Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
395Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
396Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
397Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
398Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
399A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
400Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
401Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
402Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
403Performance of Samples with Novel SRF Materials and Growth Techniques
404Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
405Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
406Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
407Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
408Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
409Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
410Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
411Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
412Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
413Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
414Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
415Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
416HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
417Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
418Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
419Sub-10-nm ferroelectric Gd-doped HfO2 layers
420RF Characterization of Novel Superconducting Materials and Multilayers
421Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires