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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 461 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1New materials for memristive switching
2Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
3Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
4Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
5In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
6Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
7Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
8A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
9High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
10Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
11Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
12Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
13Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
14Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
15Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
16Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
17Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
18Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
19Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
20Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
21PEALD of Copper using New Precursors for Next Generation of Interconnections
22Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
23Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
24Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
25Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
26Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
27Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
28A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
29Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
30Plasma-enhanced atomic layer deposition of Co on metal surfaces
31Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
32Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
33Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
34Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
35Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
36The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
37ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
38Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
39Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
40The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
41Nitride memristors
42Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
43Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
44Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
45Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
46P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
47Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
48Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
49In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
50Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
51Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
52Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
53Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
54Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
55Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
56Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
57GeSbTe deposition for the PRAM application
58Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
59Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
60Structural and optical characterization of low-temperature ALD crystalline AlN
61Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
62Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
63Radical Enhanced Atomic Layer Deposition of Metals and Oxides
64Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
65In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
66Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
67Highly-Conformal Amorphous W-Si-N Thin Films by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization
68Copper-ALD Seed Layer as an Enabler for Device Scaling
69Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
70Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
71Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
72Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
73Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
74Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
75Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
76Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
77The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
78Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
79Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
80Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
81Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
82Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
83P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
84Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
85Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
86Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
87Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
88Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
89A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
90Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
91Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
92Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
93Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
94Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
95Atomic Layer Deposition of Niobium Nitride from Different Precursors
96Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
97Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
98PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
99Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
100Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
101AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
102Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
103Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
104A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
105Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
106Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
107Trilayer Tunnel Selectors for Memristor Memory Cells
108HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
109Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
110Film Uniformity in Atomic Layer Deposition
111A route to low temperature growth of single crystal GaN on sapphire
112Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
113Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
114Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
115TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
116Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
117Radical Enhanced Atomic Layer Deposition of Metals and Oxides
118High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
119Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
120Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
121Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
122Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
123Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
124Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
125Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
126Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
127Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
128Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
129Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
130Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
131Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
132Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
133Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
134The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
135GeSbTe deposition for the PRAM application
136Plasma-Enhanced Atomic Layer Deposition of Ni
137Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
138AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
139Atomic layer epitaxy of Si using atomic H
140Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
141Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
142Plasma-enhanced atomic layer deposition of superconducting niobium nitride
143Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
144Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
145Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
146Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
147Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
148Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
149Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
150Radical Enhanced Atomic Layer Deposition of Metals and Oxides
151Atmospheric pressure plasma enhanced spatial ALD of silver
152Tuning size and coverage of Pd nanoparticles using atomic layer deposition
153In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
154Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
155High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
156Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
157Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
158Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
159Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
160Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
161Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
162Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
163RF Characterization of Novel Superconducting Materials and Multilayers
164Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
165Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
166Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
167Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
168Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
169Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
170Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
171Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
172Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
173Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
174TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
175Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
176Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
177XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
178Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
179Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
180Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
181Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
182Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
183Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
184Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
185Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
186Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
187Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
188Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
189Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
190Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
191Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
192Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
193Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
194Microwave properties of superconducting atomic-layer deposited TiN films
195Remote Plasma ALD of Platinum and Platinum Oxide Films
196Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
197Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
198Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
199Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
200Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
201In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
202Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
203A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
204Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
205Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
206The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
207Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
208Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
209Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
210Atomic layer epitaxy for quantum well nitride-based devices
211Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
212Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
213Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
214A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
215Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
216Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
217Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
218Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
219Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
220Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
221Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
222Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
223Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
224Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
225Plasma-enhanced atomic layer deposition of tungsten nitride
226In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
227Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
228New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
229Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
230Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
231Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
232Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
233Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
234Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
235Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
236Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
237Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
238Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
239Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
240Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
241In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
242Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
243Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
244Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
245In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
246Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
247Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
248Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
249Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
250Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
251Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
252In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
253Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
254Plasma-Assisted Atomic Layer Deposition of Palladium
255Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
256Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
257Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
258Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
259The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
260The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
261Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
262Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
263Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
264Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
265AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
266New materials for memristive switching
267Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
268Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
269Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
270Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
271Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
272Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
273Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
274Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
275Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
276Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
277Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
278Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
279Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
280Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
281Self-limiting diamond growth from alternating CFx and H fluxes
282Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
283Atomic hydrogen-assisted ALE of germanium
284Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
285Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
286Gadolinium nitride films deposited using a PEALD based process
287Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
288Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
289Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
290Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
291Formation of aluminum nitride thin films as gate dielectrics on Si(100)
292Sub-nanometer heating depth of atomic layer annealing
293GeSbTe deposition for the PRAM application
294Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
295Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
296RF Characterization of Novel Superconducting Materials and Multilayers
297Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
298Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
299Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
300Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
301Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
302Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
303Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
304A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
305Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
306Hydrogen plasma-enhanced atomic layer deposition of copper thin films
307Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
308High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
309Radical Enhanced Atomic Layer Deposition of Metals and Oxides
310GeSbTe deposition for the PRAM application
311Plasma enhanced atomic layer deposition of aluminum sulfide thin films
312Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
313Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
314Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
315Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
316Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
317Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
318Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
319Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
320The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
321Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
322Room-Temperature Atomic Layer Deposition of Platinum
323Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
324Performance of Samples with Novel SRF Materials and Growth Techniques
325Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
326Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
327Radical Enhanced Atomic Layer Deposition of Metals and Oxides
328Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
329Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
330Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
331High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
332Study on the characteristics of aluminum thin films prepared by atomic layer deposition
333Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
334Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
335A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
336Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
337Fabrication and deformation of three-dimensional hollow ceramic nanostructures
338Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
339Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
340Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
341Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
342Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
343Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
344Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
345Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
346Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
347Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
348Plasma enhanced atomic layer deposition of Co thin film on Ï„-MnAl for effective magnetic exchange coupling and enhanced energy products
349Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
350Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
351Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
352Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
353Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
354Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
355Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
356Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
357Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
358Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
359Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
360WS2 transistors on 300 mm wafers with BEOL compatibility
361Radical Enhanced Atomic Layer Deposition of Metals and Oxides
362Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
363Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
364Radical Enhanced Atomic Layer Deposition of Metals and Oxides
365Atomic layer epitaxy of germanium
366Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
367Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
368Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
369Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
370Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
371Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
372Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
373ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
374Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
375Atomic layer epitaxy for quantum well nitride-based devices
376Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
377HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
378High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
379Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
380Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
381Evaluation of plasma parameters on PEALD deposited TaCN
382Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
383Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
384Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
385Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
386AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
387Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
388In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
389Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
390Nitride memristors
391Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
392Atomic layer epitaxy for quantum well nitride-based devices
393Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
394Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
395Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
396Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
397Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
398P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
399Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
400GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
401Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
402Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
403Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
404Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
405Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
406Radical Enhanced Atomic Layer Deposition of Metals and Oxides
407Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
408Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
409Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
410Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
411Radical Enhanced Atomic Layer Deposition of Metals and Oxides
412Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
413Atomic Layer Deposition of Nanolayered Carbon Films
414Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
415Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
416Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
417The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
418Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
419Sub-10-nm ferroelectric Gd-doped HfO2 layers
420Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
421Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S