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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 461 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
2Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
3Radical Enhanced Atomic Layer Deposition of Metals and Oxides
4Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
5Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
6Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
7Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
8In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
9Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
10Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
11Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
12Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
13Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
14Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
15Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
16Study on the characteristics of aluminum thin films prepared by atomic layer deposition
17Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
18Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
19Nitride memristors
20Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
21Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
22P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
23P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
24A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
25TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
26Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
27Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
28Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
29Atomic layer epitaxy of Si using atomic H
30Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
31Atomic layer epitaxy for quantum well nitride-based devices
32Radical Enhanced Atomic Layer Deposition of Metals and Oxides
33Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
34Film Uniformity in Atomic Layer Deposition
35Nitride memristors
36Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
37Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
38High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
39Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
40Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
41Radical Enhanced Atomic Layer Deposition of Metals and Oxides
42Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
43Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
44Atomic layer epitaxy for quantum well nitride-based devices
45Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
46Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
47Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
48Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
49Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
50Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
51Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
52Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
53Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
54Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
55Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
56Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
57Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
58Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
59Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
60Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
61Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
62Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
63Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
64Atomic Layer Deposition of Niobium Nitride from Different Precursors
65PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
66Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
67RF Characterization of Novel Superconducting Materials and Multilayers
68Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
69Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
70Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
71Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
72Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
73Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
74Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
75Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
76Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
77Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
78Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
79Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
80Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
81Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
82Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
83Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
84Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
85Radical Enhanced Atomic Layer Deposition of Metals and Oxides
86Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
87Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
88Radical Enhanced Atomic Layer Deposition of Metals and Oxides
89Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
90Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
91Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
92Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
93Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
94In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
95Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
96Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
97Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
98Radical Enhanced Atomic Layer Deposition of Metals and Oxides
99Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
100Atomic layer epitaxy of germanium
101Plasma-Enhanced Atomic Layer Deposition of Ni
102Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
103Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
104New materials for memristive switching
105Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
106Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
107Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
108The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
109Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
110Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
111Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
112Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
113Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
114Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
115High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
116Performance of Samples with Novel SRF Materials and Growth Techniques
117Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
118AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
119Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
120New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
121Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
122Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
123Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
124Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
125In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
126RF Characterization of Novel Superconducting Materials and Multilayers
127Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
128Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
129Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
130Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
131Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
132In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
133Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
134A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
135Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
136Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
137Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
138Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
139Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
140Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
141Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
142Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
143Tuning size and coverage of Pd nanoparticles using atomic layer deposition
144Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
145Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
146Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
147Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
148Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
149Sub-10-nm ferroelectric Gd-doped HfO2 layers
150Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
151Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
152Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
153The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
154Highly-Conformal Amorphous W-Si-N Thin Films by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization
155Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
156Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
157Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
158Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
159Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
160Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
161Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
162Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
163HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
164Plasma enhanced atomic layer deposition of Co thin film on Ï„-MnAl for effective magnetic exchange coupling and enhanced energy products
165Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
166Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
167Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
168Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
169High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
170Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
171Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
172Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
173High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
174Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
175Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
176Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
177Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
178Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
179Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
180Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
181Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
182The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
183Plasma-enhanced atomic layer deposition of tungsten nitride
184New materials for memristive switching
185Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
186In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
187Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
188Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
189Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
190Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
191High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
192Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
193Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
194Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
195Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
196Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
197The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
198Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
199Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
200Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
201Trilayer Tunnel Selectors for Memristor Memory Cells
202Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
203Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
204Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
205Evaluation of plasma parameters on PEALD deposited TaCN
206Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
207Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
208Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
209Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
210Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
211Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
212Plasma-enhanced atomic layer deposition of superconducting niobium nitride
213HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
214The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
215Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
216Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
217Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
218Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
219Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
220Plasma-enhanced atomic layer deposition of Co on metal surfaces
221AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
222Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
223Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
224Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
225Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
226Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
227Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
228Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
229In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
230Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
231Plasma enhanced atomic layer deposition of aluminum sulfide thin films
232Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
233Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
234Atomic hydrogen-assisted ALE of germanium
235Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
236Radical Enhanced Atomic Layer Deposition of Metals and Oxides
237Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
238Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
239Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
240GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
241Structural and optical characterization of low-temperature ALD crystalline AlN
242Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
243Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
244Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
245ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
246Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
247Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
248Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
249Plasma-Assisted Atomic Layer Deposition of Palladium
250Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
251Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
252Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
253Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
254Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
255Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
256Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
257Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
258Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
259Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
260Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
261Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
262Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
263Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
264Atmospheric pressure plasma enhanced spatial ALD of silver
265A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
266Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
267Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
268Gadolinium nitride films deposited using a PEALD based process
269Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
270Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
271Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
272Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
273Atomic Layer Deposition of Nanolayered Carbon Films
274Radical Enhanced Atomic Layer Deposition of Metals and Oxides
275Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
276Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
277In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
278Microwave properties of superconducting atomic-layer deposited TiN films
279Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
280Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
281Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
282Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
283AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
284Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
285GeSbTe deposition for the PRAM application
286A route to low temperature growth of single crystal GaN on sapphire
287Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
288Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
289TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
290Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
291Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
292Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
293Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
294GeSbTe deposition for the PRAM application
295Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
296Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
297Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
298Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
299The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
300Remote Plasma ALD of Platinum and Platinum Oxide Films
301Room-Temperature Atomic Layer Deposition of Platinum
302P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
303Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
304Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
305Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
306Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
307A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
308Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
309GeSbTe deposition for the PRAM application
310GeSbTe deposition for the PRAM application
311Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
312Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
313Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
314In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
315Radical Enhanced Atomic Layer Deposition of Metals and Oxides
316A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
317ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
318Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
319Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
320Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
321Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
322Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
323Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
324Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
325Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
326Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
327Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
328Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
329Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
330Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
331Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
332Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
333In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
334Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
335Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
336Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
337Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
338Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
339A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
340Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
341Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
342Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
343Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
344Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
345Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
346The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
347Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
348Fabrication and deformation of three-dimensional hollow ceramic nanostructures
349Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
350A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
351Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
352Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
353Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
354The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
355Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
356Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
357Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
358WS2 transistors on 300 mm wafers with BEOL compatibility
359Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
360Self-limiting diamond growth from alternating CFx and H fluxes
361Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
362A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
363Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
364Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
365Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
366Atomic layer epitaxy for quantum well nitride-based devices
367Hydrogen plasma-enhanced atomic layer deposition of copper thin films
368Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
369Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
370Formation of aluminum nitride thin films as gate dielectrics on Si(100)
371XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
372Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
373Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
374Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
375Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
376Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
377PEALD of Copper using New Precursors for Next Generation of Interconnections
378Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
379Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
380Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
381Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
382Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
383Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
384Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
385Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
386Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
387Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
388AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
389Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
390Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
391Sub-nanometer heating depth of atomic layer annealing
392Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
393Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
394Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
395Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
396High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
397Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
398Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
399Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
400Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
401Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
402Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
403Copper-ALD Seed Layer as an Enabler for Device Scaling
404Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
405Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
406Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
407Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
408Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
409Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
410Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
411The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
412Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
413Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
414In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
415Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
416Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
417Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
418Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
419Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
420Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
421Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper