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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 461 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
2Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
3Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
4Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
5Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
6Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
7Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
8Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
9Radical Enhanced Atomic Layer Deposition of Metals and Oxides
10Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
11Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
12Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
13Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
14Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
15Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
16Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
17Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
18Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
19Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
20Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
21Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
22Plasma-Assisted Atomic Layer Deposition of Palladium
23Radical Enhanced Atomic Layer Deposition of Metals and Oxides
24Film Uniformity in Atomic Layer Deposition
25Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
26Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
27Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
28Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
29Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
30Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
31Plasma enhanced atomic layer deposition of aluminum sulfide thin films
32ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
33Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
34Radical Enhanced Atomic Layer Deposition of Metals and Oxides
35Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
36Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
37Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
38Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
39GeSbTe deposition for the PRAM application
40Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
41Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
42In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
43RF Characterization of Novel Superconducting Materials and Multilayers
44Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
45Atomic layer epitaxy for quantum well nitride-based devices
46Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
47A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
48Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
49HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
50Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
51Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
52Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
53Plasma-enhanced atomic layer deposition of tungsten nitride
54Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
55Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
56Nitride memristors
57Plasma-Enhanced Atomic Layer Deposition of Ni
58The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
59Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
60AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
61High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
62Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
63Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
64GeSbTe deposition for the PRAM application
65Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
66Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
67Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
68Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
69Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
70Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
71Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
72Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
73Evaluation of plasma parameters on PEALD deposited TaCN
74The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
75Atomic Layer Deposition of Nanolayered Carbon Films
76Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
77Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
78AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
79Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
80Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
81Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
82Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
83Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
84Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
85Atomic layer epitaxy for quantum well nitride-based devices
86Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
87Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
88Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
89Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
90Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
91Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
92Highly-Conformal Amorphous W-Si-N Thin Films by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization
93The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
94High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
95Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
96Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
97Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
98Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
99PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
100Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
101Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
102Copper-ALD Seed Layer as an Enabler for Device Scaling
103AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
104Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
105Microwave properties of superconducting atomic-layer deposited TiN films
106Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
107Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
108Atomic hydrogen-assisted ALE of germanium
109Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
110Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
111Tuning size and coverage of Pd nanoparticles using atomic layer deposition
112PEALD of Copper using New Precursors for Next Generation of Interconnections
113Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
114Study on the characteristics of aluminum thin films prepared by atomic layer deposition
115Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
116Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
117Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
118Gadolinium nitride films deposited using a PEALD based process
119Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
120Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
121Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
122Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
123Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
124In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
125A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
126Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
127The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
128Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
129Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
130Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
131Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
132Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
133Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
134Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
135Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
136Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
137Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
138Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
139In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
140Radical Enhanced Atomic Layer Deposition of Metals and Oxides
141Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
142Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
143Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
144In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
145New materials for memristive switching
146Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
147Self-limiting diamond growth from alternating CFx and H fluxes
148Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
149Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
150Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
151In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
152Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
153Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
154Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
155Formation of aluminum nitride thin films as gate dielectrics on Si(100)
156Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
157Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
158Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
159Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
160High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
161Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
162Performance of Samples with Novel SRF Materials and Growth Techniques
163Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
164GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
165Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
166Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
167Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
168Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
169Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
170Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
171Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
172Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
173Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
174Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
175Radical Enhanced Atomic Layer Deposition of Metals and Oxides
176Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
177Hydrogen plasma-enhanced atomic layer deposition of copper thin films
178In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
179In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
180A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
181Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
182Radical Enhanced Atomic Layer Deposition of Metals and Oxides
183ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
184In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
185P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
186Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
187Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
188New materials for memristive switching
189Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
190Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
191Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
192Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
193Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
194Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
195Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
196Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
197Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
198Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
199Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
200Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
201Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
202Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
203Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
204Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
205Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
206Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
207Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
208A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
209Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
210Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
211High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
212Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
213Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
214Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
215Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
216Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
217Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
218Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
219Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
220Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
221High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
222Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
223Plasma-enhanced atomic layer deposition of superconducting niobium nitride
224A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
225Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
226Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
227Atmospheric pressure plasma enhanced spatial ALD of silver
228Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
229Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
230Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
231Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
232Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
233Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
234Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
235Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
236Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
237Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
238RF Characterization of Novel Superconducting Materials and Multilayers
239AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
240GeSbTe deposition for the PRAM application
241Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
242The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
243Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
244Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
245Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
246Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
247Radical Enhanced Atomic Layer Deposition of Metals and Oxides
248Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
249Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
250Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
251Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
252Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
253Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
254Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
255Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
256Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
257Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
258Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
259Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
260Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
261Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
262Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
263Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
264Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
265Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
266Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
267Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
268Remote Plasma ALD of Platinum and Platinum Oxide Films
269HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
270Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
271Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
272Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
273Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
274Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
275Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
276Room-Temperature Atomic Layer Deposition of Platinum
277Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
278Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
279Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
280Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
281Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
282Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
283Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
284Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
285Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
286Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
287Radical Enhanced Atomic Layer Deposition of Metals and Oxides
288Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
289Fabrication and deformation of three-dimensional hollow ceramic nanostructures
290Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
291Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
292A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
293Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
294Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
295Sub-nanometer heating depth of atomic layer annealing
296Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
297Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
298Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
299Structural and optical characterization of low-temperature ALD crystalline AlN
300Plasma-enhanced atomic layer deposition of Co on metal surfaces
301Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
302Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
303Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
304Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
305Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
306Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
307Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
308The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
309In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
310Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
311Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
312Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
313Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
314Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
315The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
316Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
317Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
318Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
319Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
320TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
321P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
322Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
323Plasma enhanced atomic layer deposition of Co thin film on Ï„-MnAl for effective magnetic exchange coupling and enhanced energy products
324Nitride memristors
325New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
326Sub-10-nm ferroelectric Gd-doped HfO2 layers
327Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
328Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
329Atomic Layer Deposition of Niobium Nitride from Different Precursors
330Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
331Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
332Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
333Atomic layer epitaxy for quantum well nitride-based devices
334Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
335Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
336Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
337Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
338Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
339Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
340Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
341Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
342WS2 transistors on 300 mm wafers with BEOL compatibility
343The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
344Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
345A route to low temperature growth of single crystal GaN on sapphire
346Atomic layer epitaxy of germanium
347Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
348Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
349Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
350Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
351Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
352Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
353Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
354High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
355Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
356Radical Enhanced Atomic Layer Deposition of Metals and Oxides
357Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
358Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
359Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
360Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
361Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
362Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
363Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
364Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
365Atomic layer epitaxy of Si using atomic H
366Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
367Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
368Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
369Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
370Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
371A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
372Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
373Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
374Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
375Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
376Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
377Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
378Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
379XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
380Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
381Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
382Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
383Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
384Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
385Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
386Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
387Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
388Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
389Trilayer Tunnel Selectors for Memristor Memory Cells
390Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
391Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
392A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
393Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
394Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
395GeSbTe deposition for the PRAM application
396Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
397Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
398Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
399Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
400P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
401Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
402Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
403Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
404The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
405Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
406Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
407Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
408Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
409Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
410Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
411Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
412Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
413TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
414Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
415Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
416Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
417Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
418Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
419Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
420Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
421In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films