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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 448 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
2Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
3Atomic layer epitaxy of germanium
4Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
5Atomic layer epitaxy of Si using atomic H
6Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
7Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
8High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
9Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
10Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
11Atomic layer epitaxy for quantum well nitride-based devices
12Gadolinium nitride films deposited using a PEALD based process
13Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
14Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
15The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
16Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
17P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
18Radical Enhanced Atomic Layer Deposition of Metals and Oxides
19Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
20Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
21Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
22Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
23AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
24Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
25Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
26Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
27Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
28Sub-nanometer heating depth of atomic layer annealing
29Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
30Formation of aluminum nitride thin films as gate dielectrics on Si(100)
31Radical Enhanced Atomic Layer Deposition of Metals and Oxides
32Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
33Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
34New materials for memristive switching
35Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
36Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
37Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
38Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
39Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
40In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
41Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
42PEALD of Copper using New Precursors for Next Generation of Interconnections
43Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
44Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
45Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
46Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
47Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
48AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
49Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
50Performance of Samples with Novel SRF Materials and Growth Techniques
51Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
52Hydrogen plasma-enhanced atomic layer deposition of copper thin films
53Remote Plasma ALD of Platinum and Platinum Oxide Films
54Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
55Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
56Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
57Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
58Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
59Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
60Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
61Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
62Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
63Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
64Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
65Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
66Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
67Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
68Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
69Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
70Radical Enhanced Atomic Layer Deposition of Metals and Oxides
71Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
72Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
73Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
74Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
75Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
76Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
77Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
78Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
79Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
80In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
81In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
82P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
83Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
84Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
85Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
86Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
87Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
88Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
89Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
90Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
91TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
92Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
93Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
94Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
95Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
96In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
97Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
98Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
99Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
100Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
101AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
102Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
103Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
104Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
105XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
106Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
107Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
108Plasma-enhanced atomic layer deposition of tungsten nitride
109Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
110Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
111Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
112Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
113Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
114Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
115Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
116Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
117Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
118Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
119GeSbTe deposition for the PRAM application
120A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
121Tuning size and coverage of Pd nanoparticles using atomic layer deposition
122Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
123ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
124Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
125High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
126Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
127Radical Enhanced Atomic Layer Deposition of Metals and Oxides
128Structural and optical characterization of low-temperature ALD crystalline AlN
129Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
130Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
131Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
132High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
133Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
134The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
135Radical Enhanced Atomic Layer Deposition of Metals and Oxides
136A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
137Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
138Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
139Trilayer Tunnel Selectors for Memristor Memory Cells
140Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
141WS2 transistors on 300 mm wafers with BEOL compatibility
142Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
143Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
144Plasma-Enhanced Atomic Layer Deposition of Ni
145Copper-ALD Seed Layer as an Enabler for Device Scaling
146Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
147Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
148Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
149Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
150Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
151Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
152Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
153Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
154Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
155Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
156Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
157The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
158Radical Enhanced Atomic Layer Deposition of Metals and Oxides
159Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
160Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
161Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
162Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
163Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
164Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
165Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
166Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
167Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
168Study on the characteristics of aluminum thin films prepared by atomic layer deposition
169Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
170In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
171Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
172Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
173Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
174Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
175Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
176Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
177The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
178Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
179In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
180Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
181A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
182Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
183The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
184Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
185Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
186Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
187Self-limiting diamond growth from alternating CFx and H fluxes
188Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
189Plasma enhanced atomic layer deposition of aluminum sulfide thin films
190Atomic layer epitaxy for quantum well nitride-based devices
191Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
192Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
193Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
194Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
195Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
196Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
197Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
198Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
199Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
200Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
201Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
202The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
203Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
204In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
205Room-Temperature Atomic Layer Deposition of Platinum
206Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
207Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
208Radical Enhanced Atomic Layer Deposition of Metals and Oxides
209Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
210Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
211Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
212Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
213The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
214The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
215Nitride memristors
216Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
217Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
218Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
219New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
220Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
221A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
222Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
223Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
224Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
225Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
226Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
227Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
228Plasma-Assisted Atomic Layer Deposition of Palladium
229Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
230Sub-10-nm ferroelectric Gd-doped HfO2 layers
231Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
232A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
233Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
234Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
235Plasma-enhanced atomic layer deposition of superconducting niobium nitride
236Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
237Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
238Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
239Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
240Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
241Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
242Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
243PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
244Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
245Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
246Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
247In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
248Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
249Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
250Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
251In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
252Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
253Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
254Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
255Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
256Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
257Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
258Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
259Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
260Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
261Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
262Evaluation of plasma parameters on PEALD deposited TaCN
263Atomic Layer Deposition of Niobium Nitride from Different Precursors
264Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
265Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
266Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
267Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
268Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
269Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
270Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
271Fabrication and deformation of three-dimensional hollow ceramic nanostructures
272ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
273A route to low temperature growth of single crystal GaN on sapphire
274Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
275Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
276High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
277Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
278Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
279Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
280Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
281Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
282Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
283Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
284Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
285Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
286GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
287Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
288Plasma-enhanced atomic layer deposition of Co on metal surfaces
289Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
290Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
291Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
292Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
293Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
294Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
295Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
296Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
297Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
298Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
299Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
300Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
301Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
302Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
303Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
304GeSbTe deposition for the PRAM application
305Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
306Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
307Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
308Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
309Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
310Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
311Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
312Atomic layer epitaxy for quantum well nitride-based devices
313Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
314TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
315Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
316Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
317Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
318GeSbTe deposition for the PRAM application
319Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
320Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
321Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
322Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
323Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
324HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
325Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
326A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
327Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
328High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
329Atomic Layer Deposition of Nanolayered Carbon Films
330Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
331Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
332Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
333Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
334Atomic hydrogen-assisted ALE of germanium
335Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
336GeSbTe deposition for the PRAM application
337Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
338Nitride memristors
339Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
340High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
341Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
342Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
343Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
344Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
345Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
346Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
347Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
348Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
349Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
350Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
351Highly-Conformal Amorphous W-Si-N Thin Films by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization
352Atmospheric pressure plasma enhanced spatial ALD of silver
353Microwave properties of superconducting atomic-layer deposited TiN films
354P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
355Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
356Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
357Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
358Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
359Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
360Radical Enhanced Atomic Layer Deposition of Metals and Oxides
361Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
362A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
363Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
364Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
365Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
366Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
367Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
368Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
369Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
370Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
371Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
372New materials for memristive switching
373Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
374Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
375Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
376Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
377Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
378Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
379Radical Enhanced Atomic Layer Deposition of Metals and Oxides
380Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
381Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
382Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
383Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
384Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
385Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
386Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
387In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
388Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
389The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
390Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
391Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
392Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
393Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
394Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
395HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
396A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
397Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
398Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
399Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
400Film Uniformity in Atomic Layer Deposition
401Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
402Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
403AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
404Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
405Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
406Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
407Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
408Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage