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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 461 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
2Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
3Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
4A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
5Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
6Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
7Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
8Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
9Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
10Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
11Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
12The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
13Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
14Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
15Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
16Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
17Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
18Formation of aluminum nitride thin films as gate dielectrics on Si(100)
19Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
20Tuning size and coverage of Pd nanoparticles using atomic layer deposition
21Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
22Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
23Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
24Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
25Room-Temperature Atomic Layer Deposition of Platinum
26Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
27Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
28Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
29Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
30Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
31In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
32Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
33Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
34Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
35Copper-ALD Seed Layer as an Enabler for Device Scaling
36Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
37Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
38In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
39Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
40Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
41Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
42Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
43Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
44Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
45Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
46Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
47Plasma-enhanced atomic layer deposition of Co on metal surfaces
48Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
49Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
50Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
51Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
52Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
53Radical Enhanced Atomic Layer Deposition of Metals and Oxides
54Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
55Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
56Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
57PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
58Nitride memristors
59Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
60Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
61Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
62Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
63Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
64Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
65Nitride memristors
66The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
67Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
68Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
69Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
70P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
71AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
72Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
73PEALD of Copper using New Precursors for Next Generation of Interconnections
74XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
75WS2 transistors on 300 mm wafers with BEOL compatibility
76Atomic layer epitaxy for quantum well nitride-based devices
77High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
78Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
79Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
80Atmospheric pressure plasma enhanced spatial ALD of silver
81Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
82Gadolinium nitride films deposited using a PEALD based process
83Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
84Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
85In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
86Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
87Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
88Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
89Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
90Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
91Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
92Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
93Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
94Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
95Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
96Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
97Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
98In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
99Fabrication and deformation of three-dimensional hollow ceramic nanostructures
100Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
101Atomic layer epitaxy for quantum well nitride-based devices
102Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
103Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
104Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
105Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
106Performance of Samples with Novel SRF Materials and Growth Techniques
107Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
108Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
109Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
110Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
111A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
112Film Uniformity in Atomic Layer Deposition
113Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
114The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
115Trilayer Tunnel Selectors for Memristor Memory Cells
116High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
117Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
118Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
119Radical Enhanced Atomic Layer Deposition of Metals and Oxides
120Radical Enhanced Atomic Layer Deposition of Metals and Oxides
121A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
122Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
123Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
124Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
125Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
126Radical Enhanced Atomic Layer Deposition of Metals and Oxides
127Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
128Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
129Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
130Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
131Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
132Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
133Evaluation of plasma parameters on PEALD deposited TaCN
134Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
135Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
136Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
137Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
138Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
139Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
140Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
141Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
142Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
143Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
144In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
145A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
146GeSbTe deposition for the PRAM application
147Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
148Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
149ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
150Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
151Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
152Atomic layer epitaxy of Si using atomic H
153Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
154Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
155Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
156Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
157Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
158Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
159Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
160Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
161Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
162Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
163Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
164Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
165Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
166Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
167Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
168Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
169Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
170Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
171Radical Enhanced Atomic Layer Deposition of Metals and Oxides
172Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
173The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
174RF Characterization of Novel Superconducting Materials and Multilayers
175Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
176Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
177In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
178Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
179Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
180Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
181Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
182Sub-10-nm ferroelectric Gd-doped HfO2 layers
183AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
184GeSbTe deposition for the PRAM application
185Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
186Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
187Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
188Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
189Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
190Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
191In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
192Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
193Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
194Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
195TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
196Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
197Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
198Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
199Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
200Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
201Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
202Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
203TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
204Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
205Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
206Hydrogen plasma-enhanced atomic layer deposition of copper thin films
207Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
208Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
209Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
210Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
211Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
212Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
213Highly-Conformal Amorphous W-Si-N Thin Films by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization
214Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
215Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
216Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
217Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
218Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
219Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
220Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
221Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
222Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
223Plasma enhanced atomic layer deposition of aluminum sulfide thin films
224Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
225Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
226Plasma-enhanced atomic layer deposition of tungsten nitride
227Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
228Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
229Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
230High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
231Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
232Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
233The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
234New materials for memristive switching
235Radical Enhanced Atomic Layer Deposition of Metals and Oxides
236Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
237Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
238Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
239Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
240Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
241Atomic hydrogen-assisted ALE of germanium
242Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
243Self-limiting diamond growth from alternating CFx and H fluxes
244Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
245Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
246New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
247Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
248Radical Enhanced Atomic Layer Deposition of Metals and Oxides
249Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
250Radical Enhanced Atomic Layer Deposition of Metals and Oxides
251Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
252Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
253Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
254RF Characterization of Novel Superconducting Materials and Multilayers
255Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
256Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
257Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
258HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
259Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
260Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
261Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
262Atomic Layer Deposition of Nanolayered Carbon Films
263Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
264Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
265Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
266Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
267P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
268Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
269Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
270Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
271Atomic Layer Deposition of Niobium Nitride from Different Precursors
272P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
273Atomic layer epitaxy of germanium
274Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
275Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
276High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
277Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
278Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
279Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
280Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
281Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
282Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
283Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
284In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
285Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
286Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
287Remote Plasma ALD of Platinum and Platinum Oxide Films
288Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
289Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
290Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
291Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
292Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
293High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
294Atomic layer epitaxy for quantum well nitride-based devices
295Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
296Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
297Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
298Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
299Sub-nanometer heating depth of atomic layer annealing
300Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
301Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
302Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
303Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
304Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
305HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
306Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
307Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
308Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
309Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
310Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
311A route to low temperature growth of single crystal GaN on sapphire
312Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
313Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
314Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
315AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
316High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
317Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
318Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
319Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
320Plasma-enhanced atomic layer deposition of superconducting niobium nitride
321Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
322Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
323Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
324A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
325The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
326Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
327Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
328Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
329Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
330Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
331Radical Enhanced Atomic Layer Deposition of Metals and Oxides
332Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
333Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
334Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
335Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
336New materials for memristive switching
337Plasma-Assisted Atomic Layer Deposition of Palladium
338Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
339Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
340Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
341A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
342Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
343Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
344ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
345Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
346Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
347Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
348Plasma-Enhanced Atomic Layer Deposition of Ni
349Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
350Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
351Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
352Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
353Study on the characteristics of aluminum thin films prepared by atomic layer deposition
354Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
355Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
356Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
357Microwave properties of superconducting atomic-layer deposited TiN films
358Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
359Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
360GeSbTe deposition for the PRAM application
361The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
362Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
363Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
364Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
365Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
366In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
367Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
368Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
369Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
370Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
371Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
372Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
373Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
374Plasma enhanced atomic layer deposition of Co thin film on Ï„-MnAl for effective magnetic exchange coupling and enhanced energy products
375Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
376GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
377GeSbTe deposition for the PRAM application
378Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
379Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
380Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
381Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
382Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
383Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
384The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
385Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
386Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
387Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
388Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
389Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
390Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
391Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
392Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
393Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
394Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
395In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
396Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
397Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
398Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
399Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
400A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
401Structural and optical characterization of low-temperature ALD crystalline AlN
402Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
403Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
404Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
405Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
406Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
407Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
408Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
409Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
410Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
411Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
412AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
413Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
414Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
415Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
416A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
417Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
418Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
419The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
420Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
421Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma