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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 461 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
2Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
3Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
4Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
5Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
6Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
7Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
8Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
9Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
10Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
11Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
12Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
13Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
14GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
15Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
16Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
17Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
18P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
19Radical Enhanced Atomic Layer Deposition of Metals and Oxides
20Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
21Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
22Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
23Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
24Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
25Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
26Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
27In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
28Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
29Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
30Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
31Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
32Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
33Highly-Conformal Amorphous W-Si-N Thin Films by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization
34Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
35Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
36AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
37Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
38Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
39Atmospheric pressure plasma enhanced spatial ALD of silver
40Room-Temperature Atomic Layer Deposition of Platinum
41Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
42Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
43Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
44Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
45Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
46Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
47High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
48Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
49Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
50Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
51Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
52Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
53Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
54Radical Enhanced Atomic Layer Deposition of Metals and Oxides
55Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
56Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
57Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
58Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
59Plasma-enhanced atomic layer deposition of Co on metal surfaces
60Plasma-Enhanced Atomic Layer Deposition of Ni
61Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
62Performance of Samples with Novel SRF Materials and Growth Techniques
63Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
64Plasma enhanced atomic layer deposition of Co thin film on Ï„-MnAl for effective magnetic exchange coupling and enhanced energy products
65Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
66Nitride memristors
67XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
68Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
69Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
70Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
71Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
72Radical Enhanced Atomic Layer Deposition of Metals and Oxides
73Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
74Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
75Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
76Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
77Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
78Radical Enhanced Atomic Layer Deposition of Metals and Oxides
79Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
80Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
81Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
82Radical Enhanced Atomic Layer Deposition of Metals and Oxides
83Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
84A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
85Atomic layer epitaxy of Si using atomic H
86Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
87Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
88Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
89A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
90Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
91Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
92Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
93Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
94Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
95Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
96The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
97RF Characterization of Novel Superconducting Materials and Multilayers
98Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
99New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
100Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
101Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
102Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
103Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
104Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
105Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
106Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
107Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
108Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
109Formation of aluminum nitride thin films as gate dielectrics on Si(100)
110Atomic layer epitaxy for quantum well nitride-based devices
111Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
112Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
113Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
114New materials for memristive switching
115Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
116Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
117Atomic Layer Deposition of Nanolayered Carbon Films
118Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
119Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
120Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
121Radical Enhanced Atomic Layer Deposition of Metals and Oxides
122TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
123ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
124Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
125Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
126High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
127Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
128Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
129Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
130Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
131Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
132Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
133Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
134Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
135Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
136Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
137Atomic layer epitaxy for quantum well nitride-based devices
138Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
139Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
140Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
141Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
142Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
143Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
144Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
145Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
146Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
147Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
148Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
149Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
150ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
151Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
152Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
153Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
154Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
155Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
156Atomic Layer Deposition of Niobium Nitride from Different Precursors
157TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
158Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
159In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
160Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
161Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
162Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
163Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
164Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
165In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
166Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
167Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
168High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
169Nitride memristors
170Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
171AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
172High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
173Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
174Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
175Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
176Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
177Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
178PEALD of Copper using New Precursors for Next Generation of Interconnections
179Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
180Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
181Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
182Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
183Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
184A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
185GeSbTe deposition for the PRAM application
186Trilayer Tunnel Selectors for Memristor Memory Cells
187In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
188Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
189Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
190Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
191Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
192Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
193Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
194Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
195Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
196Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
197Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
198GeSbTe deposition for the PRAM application
199Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
200Atomic layer epitaxy of germanium
201Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
202Sub-10-nm ferroelectric Gd-doped HfO2 layers
203Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
204Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
205Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
206Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
207Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
208Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
209Microwave properties of superconducting atomic-layer deposited TiN films
210A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
211High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
212Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
213Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
214Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
215Self-limiting diamond growth from alternating CFx and H fluxes
216Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
217Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
218Radical Enhanced Atomic Layer Deposition of Metals and Oxides
219GeSbTe deposition for the PRAM application
220Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
221Copper-ALD Seed Layer as an Enabler for Device Scaling
222Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
223Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
224Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
225Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
226Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
227The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
228A route to low temperature growth of single crystal GaN on sapphire
229Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
230Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
231Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
232Radical Enhanced Atomic Layer Deposition of Metals and Oxides
233Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
234Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
235Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
236Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
237Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
238Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
239Hydrogen plasma-enhanced atomic layer deposition of copper thin films
240Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
241Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
242WS2 transistors on 300 mm wafers with BEOL compatibility
243Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
244Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
245In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
246Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
247Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
248Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
249Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
250In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
251The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
252Plasma enhanced atomic layer deposition of aluminum sulfide thin films
253Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
254Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
255Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
256Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
257Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
258Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
259Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
260Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
261Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
262Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
263Atomic hydrogen-assisted ALE of germanium
264Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
265Atomic layer epitaxy for quantum well nitride-based devices
266Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
267Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
268Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
269P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
270Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
271Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
272A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
273Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
274Plasma-Assisted Atomic Layer Deposition of Palladium
275Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
276Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
277Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
278Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
279Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
280Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
281Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
282Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
283Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
284The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
285Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
286HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
287Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
288Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
289Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
290Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
291Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
292Tuning size and coverage of Pd nanoparticles using atomic layer deposition
293The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
294Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
295Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
296Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
297Plasma-enhanced atomic layer deposition of tungsten nitride
298Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
299Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
300Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
301Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
302Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
303Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
304Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
305Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
306Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
307In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
308Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
309Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
310Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
311Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
312Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
313Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
314Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
315Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
316In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
317Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
318Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
319GeSbTe deposition for the PRAM application
320Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
321PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
322Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
323Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
324Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
325Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
326Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
327Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
328Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
329Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
330Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
331Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
332HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
333Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
334Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
335Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
336New materials for memristive switching
337Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
338Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
339Radical Enhanced Atomic Layer Deposition of Metals and Oxides
340Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
341AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
342Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
343Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
344Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
345In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
346Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
347Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
348Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
349Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
350Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
351Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
352Structural and optical characterization of low-temperature ALD crystalline AlN
353High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
354Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
355P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
356Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
357Evaluation of plasma parameters on PEALD deposited TaCN
358Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
359Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
360Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
361A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
362Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
363Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
364Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
365Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
366RF Characterization of Novel Superconducting Materials and Multilayers
367The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
368AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
369Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
370Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
371Fabrication and deformation of three-dimensional hollow ceramic nanostructures
372Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
373Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
374Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
375Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
376Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
377Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
378Study on the characteristics of aluminum thin films prepared by atomic layer deposition
379Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
380The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
381Film Uniformity in Atomic Layer Deposition
382Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
383Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
384A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
385A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
386Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
387Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
388Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
389Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
390Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
391Sub-nanometer heating depth of atomic layer annealing
392Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
393Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
394Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
395Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
396Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
397Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
398Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
399Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
400Plasma-enhanced atomic layer deposition of superconducting niobium nitride
401Gadolinium nitride films deposited using a PEALD based process
402The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
403Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
404The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
405Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
406Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
407Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
408Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
409Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
410Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
411Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
412Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
413Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
414Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
415Remote Plasma ALD of Platinum and Platinum Oxide Films
416Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
417Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
418Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
419In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
420Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
421Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films