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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 461 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
2Radical Enhanced Atomic Layer Deposition of Metals and Oxides
3Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
4Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
5Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
6Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
7Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
8Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
9In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
10AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
11TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
12Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
13Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
14Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
15Plasma-enhanced atomic layer deposition of Co on metal surfaces
16Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
17Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
18PEALD of Copper using New Precursors for Next Generation of Interconnections
19Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
20Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
21In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
22HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
23Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
24Atomic layer epitaxy for quantum well nitride-based devices
25Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
26Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
27Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
28Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
29Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
30Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
31Nitride memristors
32Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
33Self-limiting diamond growth from alternating CFx and H fluxes
34Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
35Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
36Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
37Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
38High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
39Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
40Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
41Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
42High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
43Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
44Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
45Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
46Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
47Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
48Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
49Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
50Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
51Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
52Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
53Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
54Structural and optical characterization of low-temperature ALD crystalline AlN
55Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
56Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
57The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
58Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
59Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
60Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
61Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
62Atmospheric pressure plasma enhanced spatial ALD of silver
63Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
64Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
65Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
66Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
67Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
68Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
69Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
70Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
71Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
72Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
73The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
74Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
75Sub-10-nm ferroelectric Gd-doped HfO2 layers
76Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
77Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
78Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
79Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
80Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
81New materials for memristive switching
82Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
83Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
84Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
85Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
86Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
87A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
88In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
89Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
90Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
91Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
92Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
93Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
94Radical Enhanced Atomic Layer Deposition of Metals and Oxides
95Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
96Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
97WS2 transistors on 300 mm wafers with BEOL compatibility
98Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
99Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
100Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
101Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
102Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
103Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
104Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
105Performance of Samples with Novel SRF Materials and Growth Techniques
106Atomic layer epitaxy for quantum well nitride-based devices
107Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
108High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
109Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
110Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
111Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
112Plasma-enhanced atomic layer deposition of tungsten nitride
113Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
114Radical Enhanced Atomic Layer Deposition of Metals and Oxides
115Radical Enhanced Atomic Layer Deposition of Metals and Oxides
116Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
117Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
118Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
119Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
120Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
121In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
122Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
123Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
124Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
125Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
126Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
127Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
128New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
129Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
130Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
131Nitride memristors
132Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
133The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
134ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
135Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
136Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
137A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
138Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
139Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
140Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
141A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
142Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
143Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
144Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
145Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
146Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
147Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
148Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
149Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
150Atomic hydrogen-assisted ALE of germanium
151Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
152Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
153Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
154Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
155Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
156Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
157Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
158Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
159Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
160Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
161HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
162Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
163A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
164Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
165Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
166Radical Enhanced Atomic Layer Deposition of Metals and Oxides
167Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
168Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
169Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
170Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
171Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
172Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
173Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
174Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
175Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
176Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
177High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
178TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
179Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
180Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
181Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
182Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
183Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
184Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
185Plasma-enhanced atomic layer deposition of superconducting niobium nitride
186Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
187Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
188Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
189Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
190Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
191Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
192Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
193Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
194AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
195Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
196Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
197Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
198Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
199In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
200Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
201Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
202Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
203Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
204Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
205Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
206Film Uniformity in Atomic Layer Deposition
207Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
208GeSbTe deposition for the PRAM application
209Study on the characteristics of aluminum thin films prepared by atomic layer deposition
210Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
211Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
212Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
213Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
214Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
215Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
216Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
217Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
218Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
219Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
220Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
221PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
222Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
223Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
224Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
225Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
226Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
227Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
228Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
229Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
230Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
231Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
232Plasma enhanced atomic layer deposition of Co thin film on Ï„-MnAl for effective magnetic exchange coupling and enhanced energy products
233Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
234Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
235Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
236Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
237Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
238Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
239Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
240Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
241Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
242GeSbTe deposition for the PRAM application
243Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
244Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
245Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
246Plasma-Assisted Atomic Layer Deposition of Palladium
247Trilayer Tunnel Selectors for Memristor Memory Cells
248Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
249Atomic Layer Deposition of Niobium Nitride from Different Precursors
250Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
251In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
252High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
253Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
254Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
255Evaluation of plasma parameters on PEALD deposited TaCN
256Atomic Layer Deposition of Nanolayered Carbon Films
257Sub-nanometer heating depth of atomic layer annealing
258Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
259Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
260Atomic layer epitaxy for quantum well nitride-based devices
261Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
262A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
263Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
264Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
265Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
266Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
267Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
268Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
269Radical Enhanced Atomic Layer Deposition of Metals and Oxides
270A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
271Hydrogen plasma-enhanced atomic layer deposition of copper thin films
272Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
273Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
274P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
275Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
276Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
277Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
278Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
279RF Characterization of Novel Superconducting Materials and Multilayers
280Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
281XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
282In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
283Microwave properties of superconducting atomic-layer deposited TiN films
284Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
285Plasma enhanced atomic layer deposition of aluminum sulfide thin films
286Formation of aluminum nitride thin films as gate dielectrics on Si(100)
287Radical Enhanced Atomic Layer Deposition of Metals and Oxides
288Copper-ALD Seed Layer as an Enabler for Device Scaling
289Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
290Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
291Room-Temperature Atomic Layer Deposition of Platinum
292Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
293Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
294Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
295Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
296Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
297Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
298New materials for memristive switching
299Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
300Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
301Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
302The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
303Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
304GeSbTe deposition for the PRAM application
305High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
306Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
307Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
308Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
309P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
310Remote Plasma ALD of Platinum and Platinum Oxide Films
311Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
312A route to low temperature growth of single crystal GaN on sapphire
313Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
314Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
315P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
316Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
317Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
318Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
319Radical Enhanced Atomic Layer Deposition of Metals and Oxides
320Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
321Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
322Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
323Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
324Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
325Fabrication and deformation of three-dimensional hollow ceramic nanostructures
326Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
327Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
328Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
329Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
330Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
331Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
332Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
333Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
334Atomic layer epitaxy of germanium
335Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
336Atomic layer epitaxy of Si using atomic H
337Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
338Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
339Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
340Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
341Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
342Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
343A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
344ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
345Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
346Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
347AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
348Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
349Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
350In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
351Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
352Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
353Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
354Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
355Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
356The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
357Tuning size and coverage of Pd nanoparticles using atomic layer deposition
358Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
359Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
360Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
361In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
362Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
363Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
364Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
365A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
366Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
367Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
368Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
369Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
370Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
371Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
372AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
373Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
374Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
375Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
376Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
377Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
378Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
379Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
380Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
381Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
382Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
383Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
384Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
385Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
386In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
387Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
388Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
389Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
390Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
391Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
392Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
393Plasma-Enhanced Atomic Layer Deposition of Ni
394The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
395Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
396Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
397GeSbTe deposition for the PRAM application
398Radical Enhanced Atomic Layer Deposition of Metals and Oxides
399Highly-Conformal Amorphous W-Si-N Thin Films by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization
400Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
401Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
402Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
403GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
404The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
405Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
406Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
407The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
408Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
409Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
410Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
411Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
412Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
413Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
414The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
415Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
416Gadolinium nitride films deposited using a PEALD based process
417Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
418Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
419Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
420RF Characterization of Novel Superconducting Materials and Multilayers
421Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions