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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 461 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
2Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
3Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
4Performance of Samples with Novel SRF Materials and Growth Techniques
5Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
6In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
7The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
8Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
9Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
10Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
11P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
12Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
13Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
14Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
15Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
16The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
17Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
18Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
19Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
20New materials for memristive switching
21TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
22Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
23Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
24Room-Temperature Atomic Layer Deposition of Platinum
25In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
26Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
27Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
28Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
29A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
30Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
31AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
32Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
33Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
34Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
35Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
36Sub-10-nm ferroelectric Gd-doped HfO2 layers
37Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
38Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
39Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
40Radical Enhanced Atomic Layer Deposition of Metals and Oxides
41Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
42Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
43Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
44WS2 transistors on 300 mm wafers with BEOL compatibility
45Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
46Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
47Sub-nanometer heating depth of atomic layer annealing
48Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
49In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
50Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
51Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
52Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
53In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
54Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
55Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
56Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
57Radical Enhanced Atomic Layer Deposition of Metals and Oxides
58Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
59Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
60Atomic layer epitaxy of germanium
61Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
62Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
63Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
64Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
65ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
66Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
67Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
68Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
69Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
70The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
71Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
72Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
73Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
74High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
75Film Uniformity in Atomic Layer Deposition
76Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
77Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
78Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
79The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
80Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
81Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
82Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
83The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
84Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
85Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
86Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
87Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
88RF Characterization of Novel Superconducting Materials and Multilayers
89Formation of aluminum nitride thin films as gate dielectrics on Si(100)
90Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
91Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
92Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
93Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
94Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
95Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
96Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
97Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
98In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
99Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
100Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
101Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
102Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
103Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
104Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
105Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
106Remote Plasma ALD of Platinum and Platinum Oxide Films
107Gadolinium nitride films deposited using a PEALD based process
108Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
109Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
110Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
111Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
112Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
113Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
114Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
115Fabrication and deformation of three-dimensional hollow ceramic nanostructures
116Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
117Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
118Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
119Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
120High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
121Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
122Radical Enhanced Atomic Layer Deposition of Metals and Oxides
123Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
124Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
125Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
126In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
127Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
128Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
129AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
130Tuning size and coverage of Pd nanoparticles using atomic layer deposition
131Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
132Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
133Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
134Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
135Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
136Nitride memristors
137Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
138In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
139Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
140XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
141Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
142Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
143Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
144Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
145Study on the characteristics of aluminum thin films prepared by atomic layer deposition
146Trilayer Tunnel Selectors for Memristor Memory Cells
147Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
148Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
149Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
150Plasma enhanced atomic layer deposition of Co thin film on Ï„-MnAl for effective magnetic exchange coupling and enhanced energy products
151The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
152Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
153Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
154Nitride memristors
155Structural and optical characterization of low-temperature ALD crystalline AlN
156Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
157Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
158Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
159Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
160Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
161Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
162Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
163In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
164Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
165Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
166Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
167New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
168GeSbTe deposition for the PRAM application
169Radical Enhanced Atomic Layer Deposition of Metals and Oxides
170Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
171Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
172Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
173Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
174Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
175Plasma-Enhanced Atomic Layer Deposition of Ni
176Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
177Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
178Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
179Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
180High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
181Microwave properties of superconducting atomic-layer deposited TiN films
182Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
183Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
184Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
185Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
186Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
187Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
188P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
189Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
190Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
191Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
192Evaluation of plasma parameters on PEALD deposited TaCN
193Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
194Plasma enhanced atomic layer deposition of aluminum sulfide thin films
195Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
196Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
197Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
198Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
199ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
200Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
201Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
202Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
203Hydrogen plasma-enhanced atomic layer deposition of copper thin films
204A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
205Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
206Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
207Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
208Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
209Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
210Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
211Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
212Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
213Atomic layer epitaxy for quantum well nitride-based devices
214Atomic layer epitaxy for quantum well nitride-based devices
215Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
216Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
217Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
218Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
219A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
220Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
221Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
222Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
223A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
224AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
225Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
226Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
227Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
228Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
229Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
230Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
231Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
232Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
233Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
234Radical Enhanced Atomic Layer Deposition of Metals and Oxides
235A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
236Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
237Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
238High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
239Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
240In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
241Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
242AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
243Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
244Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
245A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
246Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
247Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
248Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
249Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
250Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
251Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
252GeSbTe deposition for the PRAM application
253Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
254Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
255Atomic Layer Deposition of Nanolayered Carbon Films
256Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
257Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
258Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
259Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
260High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
261Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
262TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
263HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
264Atomic Layer Deposition of Niobium Nitride from Different Precursors
265Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
266HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
267Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
268Highly-Conformal Amorphous W-Si-N Thin Films by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization
269Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
270Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
271Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
272Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
273A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
274Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
275Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
276Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
277Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
278Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
279Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
280Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
281In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
282Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
283Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
284Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
285GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
286Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
287Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
288Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
289Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
290The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
291Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
292Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
293Radical Enhanced Atomic Layer Deposition of Metals and Oxides
294High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
295Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
296Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
297Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
298Atomic layer epitaxy of Si using atomic H
299Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
300A route to low temperature growth of single crystal GaN on sapphire
301Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
302Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
303Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
304Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
305A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
306Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
307Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
308Plasma-enhanced atomic layer deposition of tungsten nitride
309Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
310New materials for memristive switching
311Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
312Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
313Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
314Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
315Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
316PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
317Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
318Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
319Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
320Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
321Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
322Atomic hydrogen-assisted ALE of germanium
323Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
324Radical Enhanced Atomic Layer Deposition of Metals and Oxides
325Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
326Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
327Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
328Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
329Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
330Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
331GeSbTe deposition for the PRAM application
332Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
333Plasma-Assisted Atomic Layer Deposition of Palladium
334Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
335Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
336Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
337Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
338The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
339Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
340Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
341Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
342Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
343Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
344P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
345Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
346Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
347Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
348Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
349Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
350Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
351Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
352The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
353Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
354Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
355Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
356Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
357Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
358Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
359Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
360Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
361Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
362Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
363Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
364Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
365Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
366Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
367Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
368Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
369Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
370Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
371Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
372Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
373Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
374Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
375Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
376Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
377Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
378Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
379Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
380GeSbTe deposition for the PRAM application
381RF Characterization of Novel Superconducting Materials and Multilayers
382Self-limiting diamond growth from alternating CFx and H fluxes
383Atmospheric pressure plasma enhanced spatial ALD of silver
384Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
385Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
386Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
387Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
388Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
389Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
390Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
391Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
392Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
393Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
394Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
395Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
396Radical Enhanced Atomic Layer Deposition of Metals and Oxides
397Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
398Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
399Plasma-enhanced atomic layer deposition of Co on metal surfaces
400Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
401Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
402Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
403Plasma-enhanced atomic layer deposition of superconducting niobium nitride
404Radical Enhanced Atomic Layer Deposition of Metals and Oxides
405Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
406Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
407Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
408Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
409Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
410PEALD of Copper using New Precursors for Next Generation of Interconnections
411Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
412Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
413Copper-ALD Seed Layer as an Enabler for Device Scaling
414Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
415Atomic layer epitaxy for quantum well nitride-based devices
416Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
417Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
418Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
419Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
420Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
421Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique