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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 461 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Nitride memristors
2Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
3The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
4The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
5Tuning size and coverage of Pd nanoparticles using atomic layer deposition
6Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
7In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
8HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
9Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
10Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
11Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
12The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
13Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
14Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
15Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
16Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
17Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
18Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
19Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
20Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
21In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
22Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
23A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
24Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
25Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
26Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
27Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
28Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
29Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
30Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
31Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
32Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
33Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
34Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
35XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
36Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
37PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
38Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
39Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
40A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
41Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
42Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
43Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
44Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
45RF Characterization of Novel Superconducting Materials and Multilayers
46Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
47Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
48Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
49GeSbTe deposition for the PRAM application
50Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
51Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
52Atomic layer epitaxy of Si using atomic H
53Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
54Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
55Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
56Plasma-Enhanced Atomic Layer Deposition of Ni
57Atomic layer epitaxy for quantum well nitride-based devices
58Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
59Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
60Atomic layer epitaxy for quantum well nitride-based devices
61Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
62Performance of Samples with Novel SRF Materials and Growth Techniques
63In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
64Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
65Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
66Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
67Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
68Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
69Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
70Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
71Radical Enhanced Atomic Layer Deposition of Metals and Oxides
72Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
73Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
74Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
75Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
76Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
77ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
78Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
79Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
80Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
81Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
82Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
83A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
84Remote Plasma ALD of Platinum and Platinum Oxide Films
85GeSbTe deposition for the PRAM application
86Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
87Highly-Conformal Amorphous W-Si-N Thin Films by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization
88Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
89Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
90Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
91Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
92Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
93The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
94RF Characterization of Novel Superconducting Materials and Multilayers
95Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
96In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
97In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
98Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
99Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
100Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
101Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
102Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
103Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
104The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
105Radical Enhanced Atomic Layer Deposition of Metals and Oxides
106TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
107Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
108TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
109Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
110PEALD of Copper using New Precursors for Next Generation of Interconnections
111Atomic layer epitaxy for quantum well nitride-based devices
112Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
113WS2 transistors on 300 mm wafers with BEOL compatibility
114Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
115Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
116Gadolinium nitride films deposited using a PEALD based process
117Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
118Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
119Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
120New materials for memristive switching
121Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
122Radical Enhanced Atomic Layer Deposition of Metals and Oxides
123Plasma-Assisted Atomic Layer Deposition of Palladium
124Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
125Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
126Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
127Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
128Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
129Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
130Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
131Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
132High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
133Atomic layer epitaxy of germanium
134Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
135Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
136Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
137Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
138Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
139Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
140Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
141Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
142Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
143P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
144Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
145Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
146Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
147Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
148Plasma enhanced atomic layer deposition of aluminum sulfide thin films
149Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
150Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
151A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
152Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
153Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
154Plasma-enhanced atomic layer deposition of Co on metal surfaces
155Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
156Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
157Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
158Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
159Hydrogen plasma-enhanced atomic layer deposition of copper thin films
160In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
161Radical Enhanced Atomic Layer Deposition of Metals and Oxides
162Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
163Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
164Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
165Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
166Atomic Layer Deposition of Nanolayered Carbon Films
167Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
168Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
169Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
170Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
171Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
172Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
173Formation of aluminum nitride thin films as gate dielectrics on Si(100)
174Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
175Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
176Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
177Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
178Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
179Fabrication and deformation of three-dimensional hollow ceramic nanostructures
180Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
181Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
182Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
183Evaluation of plasma parameters on PEALD deposited TaCN
184Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
185Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
186Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
187Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
188Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
189High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
190Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
191Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
192Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
193Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
194Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
195Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
196Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
197Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
198Self-limiting diamond growth from alternating CFx and H fluxes
199Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
200A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
201Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
202Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
203Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
204Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
205Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
206Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
207Room-Temperature Atomic Layer Deposition of Platinum
208Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
209Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
210Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
211Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
212Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
213Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
214Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
215Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
216Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
217GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
218Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
219In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
220Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
221Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
222Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
223Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
224Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
225Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
226Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
227Nitride memristors
228Study on the characteristics of aluminum thin films prepared by atomic layer deposition
229Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
230Plasma enhanced atomic layer deposition of Co thin film on Ï„-MnAl for effective magnetic exchange coupling and enhanced energy products
231Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
232Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
233Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
234The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
235AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
236Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
237Radical Enhanced Atomic Layer Deposition of Metals and Oxides
238Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
239Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
240Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
241Plasma-enhanced atomic layer deposition of superconducting niobium nitride
242Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
243Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
244Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
245Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
246In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
247P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
248Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
249Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
250Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
251Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
252High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
253Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
254Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
255Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
256Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
257Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
258Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
259High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
260Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
261P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
262Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
263Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
264Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
265Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
266Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
267Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
268Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
269Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
270Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
271AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
272Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
273AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
274Copper-ALD Seed Layer as an Enabler for Device Scaling
275Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
276Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
277A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
278Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
279Sub-10-nm ferroelectric Gd-doped HfO2 layers
280Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
281Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
282Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
283Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
284Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
285Plasma-enhanced atomic layer deposition of tungsten nitride
286Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
287Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
288Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
289The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
290Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
291Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
292New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
293Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
294Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
295Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
296Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
297Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
298Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
299Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
300Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
301Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
302Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
303The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
304Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
305Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
306Radical Enhanced Atomic Layer Deposition of Metals and Oxides
307Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
308A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
309Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
310Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
311Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
312Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
313Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
314Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
315Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
316Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
317Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
318Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
319Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
320Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
321The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
322Atmospheric pressure plasma enhanced spatial ALD of silver
323Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
324Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
325Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
326Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
327Atomic hydrogen-assisted ALE of germanium
328Atomic Layer Deposition of Niobium Nitride from Different Precursors
329ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
330Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
331Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
332Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
333Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
334In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
335Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
336Film Uniformity in Atomic Layer Deposition
337Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
338High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
339Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
340Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
341Sub-nanometer heating depth of atomic layer annealing
342Microwave properties of superconducting atomic-layer deposited TiN films
343Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
344New materials for memristive switching
345Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
346Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
347Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
348Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
349GeSbTe deposition for the PRAM application
350Radical Enhanced Atomic Layer Deposition of Metals and Oxides
351Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
352Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
353Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
354Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
355Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
356Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
357In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
358Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
359Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
360Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
361Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
362Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
363Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
364Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
365Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
366Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
367Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
368Radical Enhanced Atomic Layer Deposition of Metals and Oxides
369High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
370Radical Enhanced Atomic Layer Deposition of Metals and Oxides
371Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
372Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
373Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
374Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
375Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
376Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
377Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
378Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
379Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
380Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
381Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
382Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
383Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
384Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
385Trilayer Tunnel Selectors for Memristor Memory Cells
386Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
387Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
388A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
389Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
390Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
391Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
392Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
393Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
394Structural and optical characterization of low-temperature ALD crystalline AlN
395Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
396Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
397Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
398Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
399A route to low temperature growth of single crystal GaN on sapphire
400Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
401Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
402Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
403Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
404Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
405Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
406Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
407Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
408Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
409Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
410Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
411Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
412Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
413AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
414Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
415HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
416Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
417Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
418GeSbTe deposition for the PRAM application
419Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
420Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
421Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu