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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 438 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
2Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
3A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
4Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
5The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
6Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
7Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
8Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
9Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
10Plasma-enhanced atomic layer deposition of superconducting niobium nitride
11Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
12Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
13HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
14Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
15Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
16Radical Enhanced Atomic Layer Deposition of Metals and Oxides
17In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
18Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
19Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
20Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
21Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
22Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
23Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
24Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
25Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
26High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
27Microwave properties of superconducting atomic-layer deposited TiN films
28Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
29Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
30Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
31Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
32Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
33Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
34In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
35Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
36Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
37Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
38GeSbTe deposition for the PRAM application
39The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
40Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
41Copper-ALD Seed Layer as an Enabler for Device Scaling
42Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
43Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
44Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
45Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
46XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
47Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
48Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
49Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
50Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
51Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
52Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
53Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
54Study on the characteristics of aluminum thin films prepared by atomic layer deposition
55Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
56Formation of aluminum nitride thin films as gate dielectrics on Si(100)
57Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
58Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
59Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
60Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
61Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
62Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
63Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
64In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
65A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
66Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
67Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
68Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
69Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
70Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
71Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
72Highly-Conformal Amorphous W-Si-N Thin Films by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization
73HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
74The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
75Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
76Evaluation of plasma parameters on PEALD deposited TaCN
77Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
78Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
79Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
80The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
81Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
82Performance of Samples with Novel SRF Materials and Growth Techniques
83Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
84Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
85Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
86Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
87Plasma enhanced atomic layer deposition of aluminum sulfide thin films
88Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
89Nitride memristors
90Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
91Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
92Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
93Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
94Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
95Room-Temperature Atomic Layer Deposition of Platinum
96Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
97Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
98Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
99Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
100Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
101Atomic layer epitaxy for quantum well nitride-based devices
102Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
103Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
104Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
105Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
106Atomic Layer Deposition of Nanolayered Carbon Films
107Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
108Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
109AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
110Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
111GeSbTe deposition for the PRAM application
112Atomic layer epitaxy for quantum well nitride-based devices
113Atomic layer epitaxy for quantum well nitride-based devices
114Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
115Plasma-Enhanced Atomic Layer Deposition of Ni
116GeSbTe deposition for the PRAM application
117Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
118Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
119The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
120Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
121Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
122Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
123Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
124Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
125Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
126Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
127A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
128Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
129Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
130New materials for memristive switching
131In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
132Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
133Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
134Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
135Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
136Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
137Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
138Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
139Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
140Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
141Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
142Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
143Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
144Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
145Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
146Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
147Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
148Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
149Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
150Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
151New materials for memristive switching
152In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
153Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
154Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
155PEALD of Copper using New Precursors for Next Generation of Interconnections
156Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
157Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
158Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
159Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
160Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
161Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
162Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
163Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
164In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
165A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
166Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
167Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
168Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
169TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
170Fabrication and deformation of three-dimensional hollow ceramic nanostructures
171Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
172Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
173Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
174Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
175Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
176Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
177Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
178Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
179Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
180Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
181Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
182Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
183Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
184Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
185Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
186The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
187Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
188Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
189Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
190Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
191Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
192Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
193In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
194Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
195In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
196Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
197Plasma-enhanced atomic layer deposition of tungsten nitride
198Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
199Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
200Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
201In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
202Atomic hydrogen-assisted ALE of germanium
203Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
204Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
205Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
206Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
207Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
208Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
209Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
210Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
211Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
212Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
213Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
214Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
215Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
216Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
217Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
218Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
219Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
220Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
221Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
222Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
223Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
224Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
225Radical Enhanced Atomic Layer Deposition of Metals and Oxides
226Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
227Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
228ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
229Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
230ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
231Radical Enhanced Atomic Layer Deposition of Metals and Oxides
232Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
233In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
234Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
235Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
236Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
237Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
238Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
239Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
240Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
241High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
242Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
243Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
244Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
245Radical Enhanced Atomic Layer Deposition of Metals and Oxides
246Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
247Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
248Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
249Plasma-enhanced atomic layer deposition of Co on metal surfaces
250Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
251Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
252Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
253Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
254Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
255Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
256Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
257Gadolinium nitride films deposited using a PEALD based process
258Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
259AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
260Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
261Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
262Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
263Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
264Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
265Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
266Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
267Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
268Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
269Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
270Nitride memristors
271WS2 transistors on 300 mm wafers with BEOL compatibility
272Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
273Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
274Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
275Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
276Radical Enhanced Atomic Layer Deposition of Metals and Oxides
277Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
278Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
279Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
280Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
281Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
282Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
283High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
284Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
285Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
286GeSbTe deposition for the PRAM application
287Radical Enhanced Atomic Layer Deposition of Metals and Oxides
288Sub-nanometer heating depth of atomic layer annealing
289Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
290Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
291High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
292Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
293Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
294Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
295Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
296Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
297AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
298Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
299Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
300Remote Plasma ALD of Platinum and Platinum Oxide Films
301Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
302Structural and optical characterization of low-temperature ALD crystalline AlN
303P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
304Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
305Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
306Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
307P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
308Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
309Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
310Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
311Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
312Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
313A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
314Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
315Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
316Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
317Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
318Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
319Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
320Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
321High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
322Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
323TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
324Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
325A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
326Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
327Atomic Layer Deposition of Niobium Nitride from Different Precursors
328High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
329Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
330Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
331Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
332Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
333Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
334Atomic layer epitaxy of germanium
335Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
336Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
337Trilayer Tunnel Selectors for Memristor Memory Cells
338Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
339Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
340Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
341Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
342Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
343A route to low temperature growth of single crystal GaN on sapphire
344Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
345Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
346Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
347Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
348Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
349Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
350Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
351The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
352The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
353The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
354Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
355Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
356Film Uniformity in Atomic Layer Deposition
357Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
358Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
359New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
360Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
361Radical Enhanced Atomic Layer Deposition of Metals and Oxides
362Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
363Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
364Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
365Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
366GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
367Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
368Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
369Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
370Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
371Hydrogen plasma-enhanced atomic layer deposition of copper thin films
372Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
373Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
374Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
375Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
376Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
377Atmospheric pressure plasma enhanced spatial ALD of silver
378Radical Enhanced Atomic Layer Deposition of Metals and Oxides
379Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
380Plasma-Assisted Atomic Layer Deposition of Palladium
381Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
382AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
383Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
384PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
385A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
386Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
387Tuning size and coverage of Pd nanoparticles using atomic layer deposition
388Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
389Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
390Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
391Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
392Radical Enhanced Atomic Layer Deposition of Metals and Oxides
393Atomic layer epitaxy of Si using atomic H
394P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
395Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
396Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
397Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
398Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films