Publication Information

Title:
Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2012, 4 (7), pp 3471-3475
Date:
2012-06-11

Author Information

Name Institution
Jui-Fen ChienNational Taiwan University
Ching-Hsiang ChenProtrustech Corporation Limited
Jing-Jong ShyueNational Taiwan University
Miin-Jang ChenNational Taiwan University

Films


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Bonding States
Analysis: X-ray Absorption Spectroscopy

Characteristic: Carrier Concentration
Analysis: Hall effect/van der Pauw method

Characteristic: Mobility
Analysis: Hall effect/van der Pauw method

Characteristic: Conductivity Type
Analysis: Hall effect/van der Pauw method

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence

Substrates

Sapphire

Keywords

Notes

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