DEZ, diethyl zinc, ZnEt2, CAS# 557-20-0
Where to buy
Number | Vendor | Region | Link |
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1 | Strem Chemicals, Inc. | πΊπΈ | Diethylzinc, min. 95%, contained in 50 ml cylinder for CVD/ALD |
2 | Strem Chemicals, Inc. | πΊπΈ | Diethylzinc, elec. gr. (99.9998%-Zn) |
3 | Strem Chemicals, Inc. | πΊπΈ | Diethylzinc, min. 95%, contained in high-temp 50 ml cylinder for CVD/ALD |
4 | Pegasus Chemicals | π¬π§ | Diethylzinc |
5 | Ereztech | πΊπΈ | Diethylzinc |
6 | Strem Chemicals, Inc. | πΊπΈ | Diethylzinc, min. 95% (10 wt% in hexanes) (Sure/SealTM Bottle) |
7 | Strem Chemicals, Inc. | πΊπΈ | Diethylzinc, min. 95% |
8 | DOCK/CHEMICALS | π©πͺ | Diethylzinc |
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Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 77 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
Number | Title |
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1 | New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping |
2 | The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition |
3 | Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition |
4 | Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition |
5 | Plasma-enhanced atomic layer deposition of zinc phosphate |
6 | Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces |
7 | Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices |
8 | Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current |
9 | Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide |
10 | Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications |
11 | Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition |
12 | Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors |
13 | Low-Power Double-Gate ZnO TFT Active Rectifier |
14 | Oxide semiconductor thin film transistors on thin solution-cast flexible substrates |
15 | Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells |
16 | Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition |
17 | Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study |
18 | Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration |
19 | Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors |
20 | Fast Flexible Plastic Substrate ZnO Circuits |
21 | Plasma enhanced atomic layer deposition of zinc sulfide thin films |
22 | The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO |
23 | A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density |
24 | Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique |
25 | Encapsulation method for atom probe tomography analysis of nanoparticles |
26 | Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions |
27 | Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films |
28 | ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window" |
29 | The Ξ± and Ξ³ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges |
30 | All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process |
31 | Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells |
32 | Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO |
33 | Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition |
34 | Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition |
35 | Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates |
36 | Fast PEALD ZnO Thin-Film Transistor Circuits |
37 | Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films |
38 | Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature |
39 | P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping |
40 | P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping |
41 | Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges |
42 | Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment |
43 | Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition |
44 | Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition |
45 | Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System |
46 | Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices |
47 | The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor |
48 | Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD |
49 | Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition |
50 | Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell |
51 | P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping |
52 | ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition |
53 | Hysteresis behaviour of top-down fabricated ZnO nanowire transistors |
54 | Oxide TFT LC Oscillators on Glass and Plastic for Wireless Functions in Large-Area Flexible Electronic Systems |
55 | Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma |
56 | Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition |
57 | The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition |
58 | Spectroscopy and control of near-surface defects in conductive thin film ZnO |
59 | Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers |
60 | Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating |
61 | P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping |
62 | Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant |
63 | Atomic layer deposition of high-mobility hydrogen-doped zinc oxide |
64 | Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices |
65 | Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition |
66 | Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell |
67 | The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering |
68 | Top-down fabricated ZnO nanowire transistors for application in biosensors |
69 | Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition |
70 | Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays |
71 | Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD |
72 | Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications |
73 | Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth |
74 | Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping |
75 | Atomic layer deposition of high-mobility hydrogen-doped zinc oxide |
76 | Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8 |
77 | Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma |