Publication Information

Title:
The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
Type:
Journal
Info:
physica status solidi (a) Volume 207, Issue 8, pages 1845--1849, 2010
Date:
2009-12-01

Author Information

Name Institution
Seungjun LeeHanyang University
Seokhwan BangHanyang University
Joohyun ParkHanyang University
Soyeon ParkHanyang University
Wooho JeongHanyang University
Hyeongtag JeonHanyang University

Films

Thermal ZnO


Other ZnO

Hardware used: Unknown


CAS#: 7732-18-5

CAS#: 7782-44-7

Film/Plasma Properties

Characteristic: Carrier Concentration
Analysis: Hall Measurements

Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements

Characteristic: Transistor Characteristics
Analysis: Transistor Characterization

Substrates

SiO2

Keywords

Plasma vs Thermal Comparison

Notes

732