Search 1536 plasma ALD publications by:
Search 1536 plasma ALD publications by:
Publication Information
Title:
The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
Type:
Journal
Info:
physica status solidi (a) Volume 207, Issue 8, pages 1845--1849, 2010
Date:
2009-12-01
Author Information
Name | Institution |
---|---|
Seungjun Lee | Hanyang University |
Seokhwan Bang | Hanyang University |
Joohyun Park | Hanyang University |
Soyeon Park | Hanyang University |
Wooho Jeong | Hanyang University |
Hyeongtag Jeon | Hanyang University |
Films
Film/Plasma Properties
Characteristic: Carrier Concentration
Analysis: Hall Measurements
Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements
Characteristic: Transistor Characteristics
Analysis: Transistor Characterization
Substrates
SiO2 |
Keywords
Plasma vs Thermal Comparison |
Notes
732 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |