The publication database currently has 1573 entries.
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196 Films Compositions
265 Precursors and Plasma Gases
76 Deposition Hardwares
242 Film and Plasma Characteristics
84 Theses
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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
Type:
Journal
Info:
physica status solidi (a) Volume 207, Issue 8, pages 1845--1849, 2010
Date:
2009-12-01
Author Information
| Name | Institution |
|---|---|
| Seungjun Lee | Hanyang University |
| Seokhwan Bang | Hanyang University |
| Joohyun Park | Hanyang University |
| Soyeon Park | Hanyang University |
| Wooho Jeong | Hanyang University |
| Hyeongtag Jeon | Hanyang University |
Films
Film/Plasma Properties
Characteristic: Carrier Concentration
Analysis: Hall Measurements
Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements
Characteristic: Transistor Characteristics
Analysis: Transistor Characterization
Substrates
| SiO2 |
Keywords
| Plasma vs Thermal Comparison |
Notes
| 732 |