Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



Film Materials in the Plasma Enhanced Atomic Layer Deposition Publication Database

A wide variety of films have been deposited using plasma enhanced atomic layer deposition including oxides, nitrides, and metals. Below is a table which lists all the films which have been discussed in the publications included in the plasma-ald.com database. Click on the film chemical formula to get a list of publications discussing that material.