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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Si Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing Si films returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Electron-enhanced atomic layer deposition of silicon thin films at room temperature
2Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
3Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
4Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
5Atomic layer epitaxy of Si using atomic H