Electron-enhanced atomic layer deposition of silicon thin films at room temperature

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 01A118 (2018)
Date:
2017-11-30

Author Information

Name Institution
Jaclyn K. SprengerUniversity of Colorado, Boulder
Huaxing SunUniversity of Colorado, Boulder
A. S. CavanaghUniversity of Colorado, Boulder
Steven GeorgeUniversity of Colorado, Boulder

Films

Plasma Si


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Substrates

Al2O3
ZnMgO

Notes

1635