Electron-enhanced atomic layer deposition of silicon thin films at room temperature

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 01A118 (2018)
Date:
2017-11-30

Author Information

Name Institution
Jaclyn K. SprengerUniversity of Colorado, Boulder
Huaxing SunUniversity of Colorado, Boulder
A. S. CavanaghUniversity of Colorado, Boulder
Steven GeorgeUniversity of Colorado, Boulder

Films

Plasma Si

Hardware used: Custom Hot-wire

CAS#: 1590-87-0

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Substrates

Al2O3
ZnMgO

Keywords

Notes

1635