Disilane, Si2H6, CAS# 1590-87-0

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
2Electron-enhanced atomic layer deposition of silicon thin films at room temperature
3Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
4Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization