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203 Films Compositions
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Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
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Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
Type:
Other
Info:
Final technical report to Office of the Chief of Naval Research
Date:
1996-09-01
Author Information
| Name | Institution |
|---|---|
| R. F. Davis | North Carolina State University |
| S. Bedair | North Carolina State University |
| N. A. El-Masry | North Carolina State University |
| Z. Sitar | North Carolina State University |
Films
Film/Plasma Properties
Characteristic: Transistor Characteristics
Analysis: Transistor Characterization
Substrates
| Silicon |
Keywords
Notes
| 1192 |