The publication database currently has 1573 entries.
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196 Films Compositions
265 Precursors and Plasma Gases
76 Deposition Hardwares
242 Film and Plasma Characteristics
84 Theses
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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
Search 1573 plasma ALD publications by:
Search 1573 plasma ALD publications by:
TEA, Al(C2H5)3, AlEt3, Triethyl Aluminum, CAS# 97-93-8
Where to buy
| Number | Vendor | Link |
|---|---|---|
| 1 | Strem Chemicals, Inc. | Triethylaluminum, min. 93% |
| 2 | Strem Chemicals, Inc. | Triethylaluminum, elec. gr. (99.999+%-Al) PURATREM **S.Steel Cyl Extra** |
| 3 | Sigma-Aldrich, Co. LLC | Triethylaluminum 93% |
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
| Number | Title |
|---|---|
| 1 | Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization |