The publication database currently has 1511 entries.
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189 Films Compositions
401 Precursors and Plasma Gases
73 Deposition Hardwares
238 Film and Plasma Characteristics
79 Theses
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From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
Carbon content control of silicon oxycarbide film with methane containing plasma
Search 1511 plasma ALD publications by:
Search 1511 plasma ALD publications by:
TEA, Al(C2H5)3, AlEt3, Triethyl Aluminum, CAS# 97-93-8
Where to buy
| Number | Vendor | Link |
|---|---|---|
| 1 | Strem Chemicals, Inc. | Triethylaluminum, min. 93% |
| 2 | Strem Chemicals, Inc. | Triethylaluminum, elec. gr. (99.999+%-Al) PURATREM **S.Steel Cyl Extra** |
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
| Number | Title |
|---|---|
| 1 | Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |