Plasma ALD, LLC Consulting
Mark Sowa, owner of Plasma ALD, LLC and operator of www.plasma-ald.com, has over 30 years experience of plasma-based thin film processing experience.
- Ph.D. Chemical Engineering, Princeton University, Dissertation: Mechanism for the Selective Etch of Silicon Dioxide in a High-Density, Low-Pressure Inductively Coupled Fluorocarbon Plasma
- Postdoctoral Appointee, Sandia National Laboratory, Microelectronics Development Laboratory
- Development Associate, Praxair, Electronic Materials
- Senior/Staff Research Scientist, Cambridge NanoTech, Ultratech, Veeco
Mark's focus has been on plasma enhanced atomic layer deposition (PEALD) as the lead scientist on the Fiji PEALD system from its 2008 introduction at Cambridge NanoTech, through its years at Ultratech(2013-2017), and continued to Spring 2025 at Veeco.
Over those 16+ years, 100's of Fijis were delivered to universities, government laboratories, and industrial customers world wide. Everyday Mark would provide ongoing support to those customers in the form of:
- On-site hardware installations
- On-site training
- Identification of best (PE)ALD materials and processes for specific applications
- Deposition requirements
- Required hardware configurations
- Optimized process recipes
- Process integration
- Process troubleshooting
- Hardware troubleshooting
Mark's expertise extends to applications adjacent to PEALD as well, including:
- Thermal (normal, standard) atomic layer deposition
- Molecular layer deposition
- Plasmas for surface modification and functionalization
- Plasma source design (the Fiji plasma source was designed by Mark)
Contact Mark at marksowa@plasma-ald.com to discuss how he can assist you.
