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Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
Self-limiting diamond growth from alternating CFx and H fluxes
Sub-10-nm ferroelectric Gd-doped HfO2 layers
Where to buy TEA, Al(C2H5)3, AlEt3, Triethyl Aluminum CAS# 97-93-8
TEA, Al(C2H5)3, AlEt3, Triethyl Aluminum CAS# 97-93-8 is available from the following source(s):
| Number | Vendor | Region | Link |
|---|---|---|---|
| 1 | Strem Chemicals, Inc. | 🇺🇸 | Triethylaluminum, elec. gr. (99.999+%-Al) PURATREM **S.Steel Cyl Extra** |
| 2 | Strem Chemicals, Inc. | 🇺🇸 | Triethylaluminum, min. 93% |
| 3 | DOCK/CHEMICALS | 🇩🇪 | Triethylaluminum |
| 4 | Pegasus Chemicals | 🇬🇧 | Triethylaluminium |
| 5 | Sigma-Aldrich, Co. LLC | 🇺🇸 | Triethylaluminum 93% |
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