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Carbon content control of silicon oxycarbide film with methane containing plasma
Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
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Publication Information
Title:
Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-10-31
Author Information
| Name | Institution |
|---|---|
| Joel W. Clancey | University of Colorado, Boulder |
Films
Thermal Al2O3
Thermal W
Plasma Pt
Thermal W
Film/Plasma Properties
Substrates
Keywords
Notes
| 224 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |