Publication Information

Title: Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates

Type: Journal

Info: J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015

Date: 2014-10-31

DOI: http://dx.doi.org/10.1116/1.4901459

Author Information

Name

Institution

Joel W. Clancey

University of Colorado, Boulder

Films

Thermal Al2O3 using Custom Rotary

Deposition Temperature = 180C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH3)3, AlMe3, Al2(CH3)6, Al2Me6

75-24-1

Water, H2O

7732-18-5

Thermal W using Custom Rotary

Deposition Temperature = 120C

Disilane, Si2H6

1590-87-0

WF6, Tungsten Hexafluoride

7783-82-6

Plasma Pt using Custom Rotary

Deposition Temperature = 150C

(Trimethyl)methylcyclopentadienylplatinum, MeCpMe3Pt

94442-22-5

Hydrogen, H2

1333-74-0

Thermal Al2O3 using Custom

Deposition Temperature = 120C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH3)3, AlMe3, Al2(CH3)6, Al2Me6

75-24-1

Water, H2O

7732-18-5

Thermal W using Custom

Deposition Temperature = 120C

Disilane, Si2H6

1590-87-0

WF6, Tungsten Hexafluoride

7783-82-6

Plasma Pt using Custom

Deposition Temperature = 120C

(Trimethyl)methylcyclopentadienylplatinum, MeCpMe3Pt

94442-22-5

Hydrogen, H2

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

224


Mark Sowa

Shortcuts

Films
Precursors
Deposition Hardware
Authors
Film and Plasma Characteristics
Multi-factor Search
ALD and PEALD Background
On-line PEALD Theses
About plasma-ald.com

Contact Us
ALD Links

© 2014-2018 plasma-ald.com