Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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W Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing W films returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
2Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
3Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
4Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
5Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor