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Publication Information

Title: Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor

Type: Journal

Info: Journal of Vacuum Science & Technology A 34, 01A129 (2016)

Date: 2015-11-11

DOI: http://dx.doi.org/10.1116/1.4936387

Author Information

Name

Institution

University of Twente

University of Twente

University of Twente

University of Twente

University of Twente

University of Twente

Films

Plasma W using Custom

Deposition Temperature = 315C

7783-82-6

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

PANalytical Xpert PRO MPD X-ray Diffractometer

Resistivity, Sheet Resistance

Four-point Probe

Polytec

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Thickness

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MPD X-ray Diffractometer

Density

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MPD X-ray Diffractometer

Images

SEM, Scanning Electron Microscopy

Unknown

Thickness

SEM, Scanning Electron Microscopy

Unknown

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Bruker Fastscan/ICON

Images

TEM, Transmission Electron Microscope

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

TEM, Transmission Electron Microscope

Unknown

Chemical Composition, Impurities

EFTEM, Energy Filtered Transmission Electron Microscopy

Unknown

Substrates

W

Keywords

Notes

Discusses using Te etching as a means to determine H-radical flux.

411


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