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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Antonius A. I. Aarnink Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Antonius A. I. Aarnink returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
2Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
3Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
4Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
5PEALD AlN: controlling growth and film crystallinity
6Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor