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Publication Information

Title: Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System

Type: Journal

Info: ECS J. Solid State Sci. Technol. 2013 volume 2, issue 4, P149-P155

Date: 2013-01-11

DOI: http://dx.doi.org/10.1149/2.015304jss

Author Information

Name

Institution

University of Twente

University of Twente

University of Twente

University of Twente

Films

Thermal TiN using Custom

Deposition Temperature = 350C

7550-45-0

7664-41-7

Other TiN using Custom

Deposition Temperature = 350C

7550-45-0

7664-41-7

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Substrates

Silicon

Keywords

Notes

675



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