Publication Information

Title:
Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
Type:
Journal
Info:
physica status solidi (a) Volume 212, Issue 7, pages 1607-1614, July 2015
Date:
2015-04-30

Author Information

Name Institution
Mengdi YangUniversity of Twente
Antonius A. I. AarninkUniversity of Twente
Alexey Y. KovalginUniversity of Twente
Rob A. M. WoltersUniversity of Twente
Jurriaan SchmitzUniversity of Twente

Films

Plasma W


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

SiO2

Keywords

Notes

488