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Publication Information

Title: Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes

Type: Journal

Info: physica status solidi (a) Volume 212, Issue 7, pages 1607-1614, July 2015

Date: 2015-04-30

DOI: http://dx.doi.org/10.1002/pssa.201532305

Author Information

Name

Institution

University of Twente

University of Twente

University of Twente

University of Twente

University of Twente

Films

Plasma W using Unknown

Deposition Temperature Range N/A

7783-82-6

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Substrates

SiO2

Keywords

Notes

488


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