2021 Year in Review
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203 Films Compositions
272 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics
90 Theses
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Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
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Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
Type:
Journal
Info:
physica status solidi (a) Volume 212, Issue 7, pages 1607-1614, July 2015
Date:
2015-04-30
Author Information
| Name | Institution |
|---|---|
| Mengdi Yang | University of Twente |
| Antonius A. I. Aarnink | University of Twente |
| Alexey Y. Kovalgin | University of Twente |
| Rob A. M. Wolters | University of Twente |
| Jurriaan Schmitz | University of Twente |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| SiO2 |
Keywords
Notes
| 488 |