Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes

Publication Information

Title: Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes

Type: Journal

Info: physica status solidi (a) Volume 212, Issue 7, pages 1607-1614, July 2015

Date: 2015-04-30

DOI: http://dx.doi.org/10.1002/pssa.201532305

Author Information

Name

Institution

Mengdi Yang

University of Twente

Antonius A. I. Aarnink

University of Twente

Alexey Y. Kovalgin

University of Twente

Rob A. M. Wolters

University of Twente

Jurriaan Schmitz

University of Twente

Films

Plasma W using Unknown

Deposition Temperature Range N/A

WF₆, Tungsten Hexafluoride

7783-82-6

H₂, Hydrogen

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Substrates

SiO₂

Keywords

Notes

488

Mark Sowa

Shortcuts

Films

Precursors

Deposition Hardware

Film and Plasma Characteristics

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