Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Jurriaan Schmitz Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jurriaan Schmitz returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1PEALD AlN: controlling growth and film crystallinity
2Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
3Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor