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Publication Information

Title: PEALD AlN: controlling growth and film crystallinity

Type: Conference Proceedings

Info: physica status solidi (c) Volume 12, Issue 7, pages 1036--1042, 2015

Date: 2015-06-05

DOI: http://dx.doi.org/10.1002/pssc.201510039

Author Information

Name

Institution

University of Twente

University of Twente

University of Twente

University of Twente

University of Twente

Films

Plasma AlN using Picosun R200

Deposition Temperature = 350C

75-24-1

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

Unknown

Substrates

Si(111)

Si(100)

SiO2

Keywords

Notes

511


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