The publication database currently has 1556 entries.
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191 Films Compositions
401 Precursors and Plasma Gases
75 Deposition Hardwares
241 Film and Plasma Characteristics
83 Theses
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Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
Search 1556 plasma ALD publications by:
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Where to buy TMA, AlMe3, Trimethyl Aluminum
TMA, AlMe3, Trimethyl Aluminum is available from the following source(s):
| Number | Vendor | Link |
|---|---|---|
| 1 | Strem Chemicals, Inc. | Trimethylaluminum, elec. gr. (99.999+%-Al), contained in 50 ml electropolished cylinder for CVD/ALD |
| 2 | Strem Chemicals, Inc. | Trimethylaluminum, min. 98%, contained in high-temp 50 ml cylinder for CVD/ALD |
| 3 | Sigma-Aldrich, Co. LLC | Trimethylaluminum 97% |
| 4 | Strem Chemicals, Inc. | Trimethylaluminum, min. 98% (Material sold in non-returnable cylinder) |
| 5 | Strem Chemicals, Inc. | Trimethylaluminum, min. 98%, contained in 50 ml cylinder for CVD/ALD |
| 6 | Strem Chemicals, Inc. | Trimethylaluminum, elec. gr. (99.999+%-Al), contained in 50 ml cylinder for CVD/ALD |
| 7 | Strem Chemicals, Inc. | Trimethylaluminum, elec. gr. (99.999+%-Al) |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |