The publication database currently has 1502 entries.
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188 Films Compositions
401 Precursors and Plasma Gases
73 Deposition Hardwares
238 Film and Plasma Characteristics
79 Theses
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Recent Database Additions
Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
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Where to buy TMA, AlMe3, Trimethyl Aluminum
TMA, AlMe3, Trimethyl Aluminum is available from the following source(s):
| Number | Vendor | Link |
|---|---|---|
| 1 | Sigma-Aldrich, Co. LLC | Trimethylaluminum 97% |
| 2 | Strem Chemicals, Inc. | Trimethylaluminum, min. 98%, contained in high-temp 50 ml cylinder for CVD/ALD |
| 3 | Strem Chemicals, Inc. | Trimethylaluminum, elec. gr. (99.999+%-Al) |
| 4 | Strem Chemicals, Inc. | Trimethylaluminum, elec. gr. (99.999+%-Al), contained in 50 ml cylinder for CVD/ALD |
| 5 | Strem Chemicals, Inc. | Trimethylaluminum, min. 98% (Material sold in non-returnable cylinder) |
| 6 | Strem Chemicals, Inc. | Trimethylaluminum, min. 98%, contained in 50 ml cylinder for CVD/ALD |
| 7 | Strem Chemicals, Inc. | Trimethylaluminum, elec. gr. (99.999+%-Al), contained in 50 ml electropolished cylinder for CVD/ALD |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |