Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


WF6, Tungsten Hexafluoride, CAS# 7783-82-6

Where to buy

NumberVendorRegionLink
1SudfluorTungsten Hexafluoride

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 15 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
2WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
3Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
4Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
5Effects of NH3 pulse plasma on atomic layer deposition of tungsten nitride diffusion barrier
6Method to enhance atomic-layer deposition of tungsten-nitride diffusion barrier for Cu interconnect
7Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
8WS2 transistors on 300 mm wafers with BEOL compatibility
9A New Pulse Plasma Enhanced Atomic Layer Deposition of Tungsten Nitride Diffusion Barrier for Copper Interconnect
10Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
11Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
12Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
13Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
14Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
15Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor