Publication Information

Title:
Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34(1) 2016
Date:
2015-10-26

Author Information

Name Institution
Alexander StrobelWestsächsische Hochschule Zwickau
Hans-Dieter SchnabelWestsächsische Hochschule Zwickau
Ullrich ReinholdWestsächsische Hochschule Zwickau
Sebastian RauerWestsächsische Hochschule Zwickau
Andreas NeidhardtWestsächsische Hochschule Zwickau

Films

Plasma TiO2


Plasma TiO2


Plasma WO3

Hardware used: FHR ALD 150


CAS#: 7732-18-5

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Substrates

Si(111)

Keywords

Notes

406