Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


FHR-150-ALD Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using FHR-150-ALD hardware returned 2 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
2Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films