TiO2 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TiO2 films returned 167 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
2Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
3Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
4Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
5Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
6Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
73D-Branched ZnO/CdS Nanowire Arrays for Solar Water Splitting and the Service Safety Research
8Biofilm prevention on cochlear implants
9Protective capping and surface passivation of III-V nanowires by atomic layer deposition
10TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
11Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
12Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
13Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
14Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
15Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
16Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
17Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
18In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
19Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
20An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
21MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
22Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
23Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
24Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
25Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
26Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
27Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
28Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
29Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
30Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
31Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
32The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
33Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
34Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
35Room temperature atomic layer deposition of TiO2 on gold nanoparticles
36Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
37Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
38Lithium-Iron (III) Fluoride Battery with Double Surface Protection
39Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
40Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
41Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
42Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
43Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
44Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
45Photo-Patternable ZnO Thin Films Based on Cross-Linked Zinc Acrylate for Organic/Inorganic Hybrid Complementary Inverters
46Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
47Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
48The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
49Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
50Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
51Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
52New grating concepts in the NIR and SWIR spectral band for high resolution earth-observation spectrometers
53Passivation of Al2O3/TiO2 on monocrystalline Si with relatively low reflectance
54Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
55Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
56Epitaxial 1D electron transport layers for high-performance perovskite solar cells
57High-efficiency embedded transmission grating
58Electronic Instabilities Leading to Electroformation of Binary Metal Oxide-based Resistive Switches
59Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
60Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
61Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
62Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
63Transient characterization of the electroforming process in TiO2 based resistive switching devices
64Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
65Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
66Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
67Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
68Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
69Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
70Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
71Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
72Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
73Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
74Tribological properties of thin films made by atomic layer deposition sliding against silicon
75Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
76Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
77Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
78X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
79Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
80Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
81In-gap states in titanium dioxide and oxynitride atomic layer deposited films
82Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
83A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
84The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
85Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
86A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
87Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
88Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
89Breakdown and Protection of ALD Moisture Barrier Thin Films
90Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
91Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
92Fabrication of Highly Ordered and Well-Aligned PbTiO3/TiN Core-Shell Nanotube Arrays
93Mesoporous perovskite solar cells and the role of nanoscale compact layers for remarkable all-round high efficiency under both indoor and outdoor illumination
94Low temperature temporal and spatial atomic layer deposition of TiO2 films
95Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
96Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
97Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
98Al2O3/TiO2 nanolaminate gate dielectric films with enhanced electrical performances for organic field-effect transistors
99Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
100Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
101In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
102Flexible Memristive Memory Array on Plastic Substrates
103Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
104Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
105Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
106Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
107Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
108Direct observation of microscopic change induced by oxygen vacancy drift in amorphous TiO2 thin films
109Plasma Enhanced Atomic Layer Deposition on Powders
110Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
111Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
112Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
113The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
114Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
115Highly efficient and bending durable perovskite solar cells: toward a wearable power source
116Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
117Impact of interface materials on side permeation in indirect encapsulation of organic electronics
118Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
119Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
120The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
121Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
122Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
123Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
124Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
125Theoretical and Experimental Investigation of Graphene/High-κ/p-Si Junctions
126Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
127Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
128Plasma-enhanced atomic layer deposition of BaTiO3
129Surface Etching of TiO2 Thin Films Using High Density Cl2/Ar Plasma
130Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
131Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
132Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
133Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
134Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
135Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
136Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
137High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
138Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
139Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
140Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
141Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
142Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
143Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
144Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
145On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
146Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
147Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
148Oxygen migration in TiO2-based higher-k gate stacks
149Energy-enhanced atomic layer deposition for more process and precursor versatility
150Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
151Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
152Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
153Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
154Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
155The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
156Bipolar resistive switching in amorphous titanium oxide thin film
157Fluorinated polymer-grafted organic dielectrics for organic field-effect transistors with low-voltage and electrical stability
158Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
159Study on the resistive switching time of TiO2 thin films
160Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
161Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
162Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
163Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
164Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
165Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
166Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
167Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films