1 | Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application |
2 | Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions |
3 | Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies |
4 | X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect |
5 | Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties |
6 | Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide |
7 | Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2 |
8 | Impact of interface materials on side permeation in indirect encapsulation of organic electronics |
9 | Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS |
10 | Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors |
11 | Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer |
12 | Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications |
13 | The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges |
14 | Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition |
15 | Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition |
16 | Characteristics of TiO2 Films Prepared by ALD With and Without Plasma |
17 | On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies |
18 | Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2 |
19 | Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics |
20 | Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O |
21 | Opportunities of Atomic Layer Deposition for Perovskite Solar Cells |
22 | Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants |
23 | Antireflection Coating on PMMA Substrates by Atomic Layer Deposition |
24 | Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition |
25 | The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films |
26 | Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition |
27 | Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices |
28 | Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method |
29 | Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries |
30 | Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors |
31 | Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features |
32 | Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension |
33 | In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices |
34 | Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition |
35 | Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma |
36 | Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film |
37 | Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source |
38 | Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories |
39 | Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD |
40 | Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges |
41 | Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method |
42 | Theoretical and Experimental Investigation of Graphene/High-κ/p-Si Junctions |
43 | 3D-Branched ZnO/CdS Nanowire Arrays for Solar Water Splitting and the Service Safety Research |
44 | Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices |
45 | An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor |
46 | A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application |
47 | Energy-enhanced atomic layer deposition for more process and precursor versatility |
48 | Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices |
49 | Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2 |
50 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage |
51 | Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition |
52 | High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films |
53 | Electronic Instabilities Leading to Electroformation of Binary Metal Oxide-based Resistive Switches |
54 | Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment |
55 | The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain |
56 | Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate |
57 | MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion |
58 | Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings |
59 | Direct observation of microscopic change induced by oxygen vacancy drift in amorphous TiO2 thin films |
60 | Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating |
61 | Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification |
62 | Passivation of Al2O3/TiO2 on monocrystalline Si with relatively low reflectance |
63 | Bipolar resistive switching in amorphous titanium oxide thin film |
64 | Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells |
65 | The role of plasma in plasma-enhanced atomic layer deposition of crystalline films |
66 | Photo-Patternable ZnO Thin Films Based on Cross-Linked Zinc Acrylate for Organic/Inorganic Hybrid Complementary Inverters |
67 | Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition |
68 | Protective capping and surface passivation of III-V nanowires by atomic layer deposition |
69 | Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry |
70 | High-efficiency embedded transmission grating |
71 | Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide |
72 | Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization |
73 | Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides |
74 | Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers |
75 | Room temperature atomic layer deposition of TiO2 on gold nanoparticles |
76 | Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing |
77 | Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition |
78 | Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance |
79 | Epitaxial 1D electron transport layers for high-performance perovskite solar cells |
80 | Study on the resistive switching time of TiO2 thin films |
81 | Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity |
82 | Biofilm prevention on cochlear implants |
83 | Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation |
84 | Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas |
85 | Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2 |
86 | Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films |
87 | Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma |
88 | Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode |
89 | Fabrication of Highly Ordered and Well-Aligned PbTiO3/TiN Core-Shell Nanotube Arrays |
90 | Al2O3/TiO2 nanolaminate gate dielectric films with enhanced electrical performances for organic field-effect transistors |
91 | Highly reflective polymeric substrates functionalized utilizing atomic layer deposition |
92 | Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer |
93 | Lithium-Iron (III) Fluoride Battery with Double Surface Protection |
94 | Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films |
95 | Tribological properties of thin films made by atomic layer deposition sliding against silicon |
96 | Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support |
97 | Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode |
98 | Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition |
99 | Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films |
100 | Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition |
101 | In-gap states in titanium dioxide and oxynitride atomic layer deposited films |
102 | Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting |
103 | Fluorinated polymer-grafted organic dielectrics for organic field-effect transistors with low-voltage and electrical stability |
104 | Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications |
105 | Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition |
106 | Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings |
107 | Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition |
108 | Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films |
109 | Surface Etching of TiO2 Thin Films Using High Density Cl2/Ar Plasma |
110 | Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition |
111 | Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme |
112 | The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells |
113 | Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation |
114 | Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition |
115 | Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor |
116 | Breakdown and Protection of ALD Moisture Barrier Thin Films |
117 | Plasma Enhanced Atomic Layer Deposition on Powders |
118 | Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C |
119 | Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications |
120 | Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors |
121 | Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition |
122 | Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination |
123 | Oxygen migration in TiO2-based higher-k gate stacks |
124 | TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition |
125 | Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films |
126 | Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study |
127 | Plasma-enhanced atomic layer deposition of BaTiO3 |
128 | Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates |
129 | The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films |
130 | Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition |
131 | Flexible Memristive Memory Array on Plastic Substrates |
132 | Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy |
133 | Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application |
134 | Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition |
135 | Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy |
136 | Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range |
137 | New grating concepts in the NIR and SWIR spectral band for high resolution earth-observation spectrometers |
138 | Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites |
139 | Low temperature temporal and spatial atomic layer deposition of TiO2 films |
140 | Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes |
141 | In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition |
142 | Transient characterization of the electroforming process in TiO2 based resistive switching devices |
143 | Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2 |
144 | Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy |
145 | Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide |
146 | Interfaces Formed by ALD Metal Oxide Growth on Metal Layers |
147 | Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition |
148 | Highly efficient and bending durable perovskite solar cells: toward a wearable power source |
149 | Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors |
150 | Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4 |
151 | Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition |
152 | Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source |
153 | Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition |
154 | Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor |
155 | Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques |
156 | Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition |
157 | Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy |
158 | A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects |
159 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide |
160 | Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films |
161 | Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2 |
162 | Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition |
163 | Mesoporous perovskite solar cells and the role of nanoscale compact layers for remarkable all-round high efficiency under both indoor and outdoor illumination |
164 | Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties |
165 | Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors |
166 | Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films |
167 | Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth |
168 | Atomic structure of conducting nanofilaments in TiO2 resistive switching memory |