TiO2 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TiO2 films returned 116 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

13D-Branched ZnO/CdS Nanowire Arrays for Solar Water Splitting and the Service Safety Research
2A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
3A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
4Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
5Al2O3/TiO2 nanolaminate gate dielectric films with enhanced electrical performances for organic field-effect transistors
6An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
7Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
8Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
9Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
10Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
11Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
12Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
13Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
14Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
15Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
16Biofilm prevention on cochlear implants
17Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
18Bipolar resistive switching in amorphous titanium oxide thin film
19Breakdown and Protection of ALD Moisture Barrier Thin Films
20Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
21Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
22Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
23Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
24Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
25Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
26Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
27Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
28Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
29Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
30Electronic Instabilities Leading to Electroformation of Binary Metal Oxide-based Resistive Switches
31Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
32Energy-enhanced atomic layer deposition for more process and precursor versatility
33Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
34Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
35Epitaxial 1D electron transport layers for high-performance perovskite solar cells
36Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
37Fabrication of Highly Ordered and Well-Aligned PbTiO3/TiN Core-Shell Nanotube Arrays
38Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
39Flexible Memristive Memory Array on Plastic Substrates
40Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
41Fluorinated polymer-grafted organic dielectrics for organic field-effect transistors with low-voltage and electrical stability
42Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
43Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
44Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
45Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
46High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
47High-efficiency embedded transmission grating
48Highly efficient and bending durable perovskite solar cells: toward a wearable power source
49Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
50Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
51Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
52In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
53In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
54In-gap states in titanium dioxide and oxynitride atomic layer deposited films
55Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
56Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
57Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
58Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
59Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
60Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
61Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
62Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
63Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
64Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
65Low temperature temporal and spatial atomic layer deposition of TiO2 films
66Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
67Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
68Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
69Mesoporous perovskite solar cells and the role of nanoscale compact layers for remarkable all-round high efficiency under both indoor and outdoor illumination
70Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
71Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
72New grating concepts in the NIR and SWIR spectral band for high resolution earth-observation spectrometers
73On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
74Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
75Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
76Oxygen migration in TiO2-based higher-k gate stacks
77Passivation of Al2O3/TiO2 on monocrystalline Si with relatively low reflectance
78Photo-Patternable ZnO Thin Films Based on Cross-Linked Zinc Acrylate for Organic/Inorganic Hybrid Complementary Inverters
79Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
80Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
81Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
82Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
83Plasma Enhanced Atomic Layer Deposition on Powders
84Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
85Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
86Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
87Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
88Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
89Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
90Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
91Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
92Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
93Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
94Room temperature atomic layer deposition of TiO2 on gold nanoparticles
95Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
96Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
97Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
98Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
99Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
100Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
101Surface Etching of TiO2 Thin Films Using High Density Cl2/Ar Plasma
102Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
103Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
104The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
105The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
106The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
107Theoretical and Experimental Investigation of Graphene/High-κ/p-Si Junctions
108Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
109Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
110Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
111TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
112Transient characterization of the electroforming process in TiO2 based resistive switching devices
113Tribological properties of thin films made by atomic layer deposition sliding against silicon
114Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
115Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
116X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect


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