TiO2 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TiO2 films returned 152 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

13D-Branched ZnO/CdS Nanowire Arrays for Solar Water Splitting and the Service Safety Research
2A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
3A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
4Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
5Al2O3/TiO2 nanolaminate gate dielectric films with enhanced electrical performances for organic field-effect transistors
6An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
7Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
8Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
9Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
10Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
11Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
12Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
13Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
14Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
15Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
16Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
17Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
18Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
19Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
20Biofilm prevention on cochlear implants
21Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
22Bipolar resistive switching in amorphous titanium oxide thin film
23Breakdown and Protection of ALD Moisture Barrier Thin Films
24Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
25Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
26Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
27Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
28Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
29Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
30Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
31Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
32Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
33Direct observation of microscopic change induced by oxygen vacancy drift in amorphous TiO2 thin films
34Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
35Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
36Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
37Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
38Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
39Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
40Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
41Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
42Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
43Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
44Electronic Instabilities Leading to Electroformation of Binary Metal Oxide-based Resistive Switches
45Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
46Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
47Energy-enhanced atomic layer deposition for more process and precursor versatility
48Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
49Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
50Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
51Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
52Epitaxial 1D electron transport layers for high-performance perovskite solar cells
53Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
54Fabrication of Highly Ordered and Well-Aligned PbTiO3/TiN Core-Shell Nanotube Arrays
55Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
56Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
57Flexible Memristive Memory Array on Plastic Substrates
58Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
59Fluorinated polymer-grafted organic dielectrics for organic field-effect transistors with low-voltage and electrical stability
60Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
61Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
62Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
63Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
64Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
65Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
66Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
67High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
68High-efficiency embedded transmission grating
69Highly efficient and bending durable perovskite solar cells: toward a wearable power source
70Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
71Impact of interface materials on side permeation in indirect encapsulation of organic electronics
72Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
73Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
74In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
75In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
76In-gap states in titanium dioxide and oxynitride atomic layer deposited films
77Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
78Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
79Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
80Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
81Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
82Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
83Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
84Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
85Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
86Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
87Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
88Lithium-Iron (III) Fluoride Battery with Double Surface Protection
89Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
90Low temperature temporal and spatial atomic layer deposition of TiO2 films
91Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
92Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
93Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
94Mesoporous perovskite solar cells and the role of nanoscale compact layers for remarkable all-round high efficiency under both indoor and outdoor illumination
95Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
96Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
97MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
98Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
99New grating concepts in the NIR and SWIR spectral band for high resolution earth-observation spectrometers
100On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
101Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
102Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
103Oxygen migration in TiO2-based higher-k gate stacks
104Passivation of Al2O3/TiO2 on monocrystalline Si with relatively low reflectance
105Photo-Patternable ZnO Thin Films Based on Cross-Linked Zinc Acrylate for Organic/Inorganic Hybrid Complementary Inverters
106Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
107Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
108Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
109Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
110Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
111Plasma Enhanced Atomic Layer Deposition on Powders
112Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
113Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
114Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
115Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
116Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
117Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
118Plasma-enhanced atomic layer deposition of BaTiO3
119Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
120Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
121Protective capping and surface passivation of III-V nanowires by atomic layer deposition
122Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
123Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
124Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
125Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
126Room temperature atomic layer deposition of TiO2 on gold nanoparticles
127Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
128Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
129Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
130Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
131Study on the resistive switching time of TiO2 thin films
132Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
133Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
134Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
135Surface Etching of TiO2 Thin Films Using High Density Cl2/Ar Plasma
136Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
137Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
138The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
139The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
140The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
141The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
142The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
143Theoretical and Experimental Investigation of Graphene/High-κ/p-Si Junctions
144Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
145Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
146Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
147TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
148Transient characterization of the electroforming process in TiO2 based resistive switching devices
149Tribological properties of thin films made by atomic layer deposition sliding against silicon
150Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
151Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
152X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect