TiO2 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TiO2 films returned 167 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
2Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
3Photo-Patternable ZnO Thin Films Based on Cross-Linked Zinc Acrylate for Organic/Inorganic Hybrid Complementary Inverters
4Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
5Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
6Study on the resistive switching time of TiO2 thin films
7Surface Etching of TiO2 Thin Films Using High Density Cl2/Ar Plasma
8Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
9Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
10An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
11Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
12Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
13Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
14Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
15Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
16Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
17Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
18Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
19Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
20Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
21Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
22The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
23Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
24Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
25Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
26Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
27Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
28Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
29Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
30Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
313D-Branched ZnO/CdS Nanowire Arrays for Solar Water Splitting and the Service Safety Research
32Fabrication of Highly Ordered and Well-Aligned PbTiO3/TiN Core-Shell Nanotube Arrays
33Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
34Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
35Electronic Instabilities Leading to Electroformation of Binary Metal Oxide-based Resistive Switches
36Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
37Room temperature atomic layer deposition of TiO2 on gold nanoparticles
38Plasma-enhanced atomic layer deposition of BaTiO3
39Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
40Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
41The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
42Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
43Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
44Bipolar resistive switching in amorphous titanium oxide thin film
45Oxygen migration in TiO2-based higher-k gate stacks
46Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
47Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
48X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
49Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
50Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
51The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
52Al2O3/TiO2 nanolaminate gate dielectric films with enhanced electrical performances for organic field-effect transistors
53Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
54Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
55Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
56Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
57Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
58Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
59Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
60Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
61Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
62High-efficiency embedded transmission grating
63Plasma Enhanced Atomic Layer Deposition on Powders
64Transient characterization of the electroforming process in TiO2 based resistive switching devices
65Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
66Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
67The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
68The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
69Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
70Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
71Passivation of Al2O3/TiO2 on monocrystalline Si with relatively low reflectance
72Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
73Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
74Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
75Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
76On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
77The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
78Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
79Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
80Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
81Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
82Flexible Memristive Memory Array on Plastic Substrates
83Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
84Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
85Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
86Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
87Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
88Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
89Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
90Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
91Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
92Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
93Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
94Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
95Low temperature temporal and spatial atomic layer deposition of TiO2 films
96Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
97Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
98A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
99Tribological properties of thin films made by atomic layer deposition sliding against silicon
100Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
101Mesoporous perovskite solar cells and the role of nanoscale compact layers for remarkable all-round high efficiency under both indoor and outdoor illumination
102Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
103Protective capping and surface passivation of III-V nanowires by atomic layer deposition
104Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
105Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
106Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
107Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
108Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
109Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
110Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
111Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
112Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
113Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
114Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
115Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
116Epitaxial 1D electron transport layers for high-performance perovskite solar cells
117Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
118Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
119Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
120Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
121Breakdown and Protection of ALD Moisture Barrier Thin Films
122Highly efficient and bending durable perovskite solar cells: toward a wearable power source
123Energy-enhanced atomic layer deposition for more process and precursor versatility
124Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
125Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
126Theoretical and Experimental Investigation of Graphene/High-κ/p-Si Junctions
127Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
128Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
129Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
130High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
131Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
132Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
133Impact of interface materials on side permeation in indirect encapsulation of organic electronics
134Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
135Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
136In-gap states in titanium dioxide and oxynitride atomic layer deposited films
137Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
138Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
139Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
140Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
141Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
142A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
143Fluorinated polymer-grafted organic dielectrics for organic field-effect transistors with low-voltage and electrical stability
144TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
145Lithium-Iron (III) Fluoride Battery with Double Surface Protection
146In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
147Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
148Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
149Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
150Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
151Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
152Direct observation of microscopic change induced by oxygen vacancy drift in amorphous TiO2 thin films
153Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
154Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
155Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
156Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
157Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
158Biofilm prevention on cochlear implants
159Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
160Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
161In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
162Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
163New grating concepts in the NIR and SWIR spectral band for high resolution earth-observation spectrometers
164Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
165Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
166MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
167Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity