TiO₂ Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TiO₂ films returned 134 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	3D-Branched ZnO/CdS Nanowire Arrays for Solar Water Splitting and the Service Safety Research
2	A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
3	A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
4	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
5	Al2O3/TiO2 nanolaminate gate dielectric films with enhanced electrical performances for organic field-effect transistors
6	An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
7	Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
8	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
9	Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
10	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
11	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
12	Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
13	Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
14	Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
15	Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
16	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
17	Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
18	Biofilm prevention on cochlear implants
19	Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
20	Bipolar resistive switching in amorphous titanium oxide thin film
21	Breakdown and Protection of ALD Moisture Barrier Thin Films
22	Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
23	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
24	Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
25	Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
26	Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
27	Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
28	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
29	Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
30	Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
31	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
32	Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
33	Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
34	Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
35	Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
36	Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
37	Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
38	Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
39	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
40	Electronic Instabilities Leading to Electroformation of Binary Metal Oxide-based Resistive Switches
41	Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
42	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
43	Energy-enhanced atomic layer deposition for more process and precursor versatility
44	Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
45	Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
46	Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
47	Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
48	Epitaxial 1D electron transport layers for high-performance perovskite solar cells
49	Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
50	Fabrication of Highly Ordered and Well-Aligned PbTiO3/TiN Core-Shell Nanotube Arrays
51	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
52	Flexible Memristive Memory Array on Plastic Substrates
53	Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
54	Fluorinated polymer-grafted organic dielectrics for organic field-effect transistors with low-voltage and electrical stability
55	Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
56	Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
57	Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
58	Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
59	Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
60	Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
61	Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
62	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
63	High-efficiency embedded transmission grating
64	Highly efficient and bending durable perovskite solar cells: toward a wearable power source
65	Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
66	Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
67	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
68	In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
69	In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
70	In-gap states in titanium dioxide and oxynitride atomic layer deposited films
71	Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
72	Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
73	Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
74	Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
75	Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
76	Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
77	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
78	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
79	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
80	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
81	Low temperature temporal and spatial atomic layer deposition of TiO2 films
82	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
83	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
84	Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
85	Mesoporous perovskite solar cells and the role of nanoscale compact layers for remarkable all-round high efficiency under both indoor and outdoor illumination
86	Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
87	Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
88	New grating concepts in the NIR and SWIR spectral band for high resolution earth-observation spectrometers
89	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
90	Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
91	Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
92	Oxygen migration in TiO2-based higher-k gate stacks
93	Passivation of Al2O3/TiO2 on monocrystalline Si with relatively low reflectance
94	Photo-Patternable ZnO Thin Films Based on Cross-Linked Zinc Acrylate for Organic/Inorganic Hybrid Complementary Inverters
95	Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
96	Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
97	Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
98	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
99	Plasma Enhanced Atomic Layer Deposition on Powders
100	Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
101	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
102	Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
103	Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
104	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
105	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
106	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
107	Protective capping and surface passivation of III-V nanowires by atomic layer deposition
108	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
109	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
110	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
111	Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
112	Room temperature atomic layer deposition of TiO2 on gold nanoparticles
113	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
114	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
115	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
116	Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
117	Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
118	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
119	Surface Etching of TiO2 Thin Films Using High Density Cl2/Ar Plasma
120	Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
121	Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
122	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
123	The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
124	The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
125	Theoretical and Experimental Investigation of Graphene/High-κ/p-Si Junctions
126	Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
127	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
128	Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
129	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
130	Transient characterization of the electroforming process in TiO2 based resistive switching devices
131	Tribological properties of thin films made by atomic layer deposition sliding against silicon
132	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
133	Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
134	X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect

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