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TiO2 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TiO2 films returned 168 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
2Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
3Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
4Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
5Biofilm prevention on cochlear implants
6Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
7Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
8Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
9Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
10Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
11Energy-enhanced atomic layer deposition for more process and precursor versatility
12Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
13Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
14Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
15Lithium-Iron (III) Fluoride Battery with Double Surface Protection
16Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
17Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
18Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
193D-Branched ZnO/CdS Nanowire Arrays for Solar Water Splitting and the Service Safety Research
20Plasma-enhanced atomic layer deposition of BaTiO3
21Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
22Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
23Theoretical and Experimental Investigation of Graphene/High-κ/p-Si Junctions
24In-gap states in titanium dioxide and oxynitride atomic layer deposited films
25The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
26Photo-Patternable ZnO Thin Films Based on Cross-Linked Zinc Acrylate for Organic/Inorganic Hybrid Complementary Inverters
27Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
28Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
29Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
30Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
31Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
32Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
33High-efficiency embedded transmission grating
34Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
35Direct observation of microscopic change induced by oxygen vacancy drift in amorphous TiO2 thin films
36Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
37Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
38Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
39Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
40Bipolar resistive switching in amorphous titanium oxide thin film
41Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
42Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
43Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
44Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
45Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
46Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
47MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
48Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
49Low temperature temporal and spatial atomic layer deposition of TiO2 films
50Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
51Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
52Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
53Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
54Room temperature atomic layer deposition of TiO2 on gold nanoparticles
55Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
56Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
57Fabrication of Highly Ordered and Well-Aligned PbTiO3/TiN Core-Shell Nanotube Arrays
58Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
59Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
60An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
61Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
62The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
63Highly efficient and bending durable perovskite solar cells: toward a wearable power source
64The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
65Protective capping and surface passivation of III-V nanowires by atomic layer deposition
66Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
67Study on the resistive switching time of TiO2 thin films
68Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
69Electronic Instabilities Leading to Electroformation of Binary Metal Oxide-based Resistive Switches
70Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
71Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
72Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
73A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
74Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
75Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
76Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
77Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
78Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
79X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
80Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
81Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
82Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
83Passivation of Al2O3/TiO2 on monocrystalline Si with relatively low reflectance
84Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
85Flexible Memristive Memory Array on Plastic Substrates
86Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
87Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
88Plasma Enhanced Atomic Layer Deposition on Powders
89Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
90Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
91Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
92The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
93Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
94Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
95Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
96Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
97Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
98Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
99Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
100Transient characterization of the electroforming process in TiO2 based resistive switching devices
101Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
102Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
103Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
104Impact of interface materials on side permeation in indirect encapsulation of organic electronics
105Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
106TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
107Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
108Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
109Fluorinated polymer-grafted organic dielectrics for organic field-effect transistors with low-voltage and electrical stability
110Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
111Mesoporous perovskite solar cells and the role of nanoscale compact layers for remarkable all-round high efficiency under both indoor and outdoor illumination
112Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
113Breakdown and Protection of ALD Moisture Barrier Thin Films
114Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
115Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
116Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
117Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
118Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
119Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
120On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
121Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
122Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
123Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
124Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
125Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
126The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
127Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
128High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
129Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
130Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
131Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
132Oxygen migration in TiO2-based higher-k gate stacks
133Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
134Al2O3/TiO2 nanolaminate gate dielectric films with enhanced electrical performances for organic field-effect transistors
135Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
136Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
137Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
138Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
139A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
140Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
141Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
142Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
143Surface Etching of TiO2 Thin Films Using High Density Cl2/Ar Plasma
144Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
145The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
146Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
147Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
148Epitaxial 1D electron transport layers for high-performance perovskite solar cells
149Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
150In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
151Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
152Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
153Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
154Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
155In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
156Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
157Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
158Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
159Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
160New grating concepts in the NIR and SWIR spectral band for high resolution earth-observation spectrometers
161Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
162Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
163Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
164Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
165Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
166Tribological properties of thin films made by atomic layer deposition sliding against silicon
167Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
168Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition