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Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
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Publication Information
Title:
Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
Type:
Journal
Info:
OPTICAL MATERIALS EXPRESS, Vol. 5, No. 1, 1 Jan 2015.
Date:
2014-12-05
Author Information
| Name | Institution |
|---|---|
| Thomas Paul | Fraunhofer Institute for Applied Optics and Precision Engineering |
Films
Film/Plasma Properties
Substrates
Keywords
Notes
| 212 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |