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Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
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Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings

Type:
Journal
Info:
OPTICAL MATERIALS EXPRESS, Vol. 5, No. 1, 1 Jan 2015.
Date:
2014-12-05
DOI:
http://dx.doi.org/10.1364/OME.5.000124

Author Information

Name Institution
Thomas PaulFraunhofer Institute for Applied Optics and Precision Engineering

Films

Plasma TiO2

Hardware used: Unknown
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Film/Plasma Properties

Substrates

Notes

212