TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4, CAS# 546-68-9

Where to buy

NumberVendorRegionLink
1DOCK/CHEMICALS🇩🇪Titaniumtetraisopropoxide
2Strem Chemicals, Inc.🇺🇸Titanium(IV) i-propoxide, min. 98%, contained in 50 ml cylinder for CVD/ALD
3EpiValence🇬🇧Titanium isopropoxide
4Strem Chemicals, Inc.🇺🇸Titanium(IV) i-propoxide, min. 98%
5Gelest🇺🇸Titanium Isopropoxide
6Ereztech🇺🇸Titanium (IV) isopropoxide

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 88 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
3Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
4Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
5Optical and Electrical Properties of AlxTi1-xO Films
6Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
7Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
8Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
9Plasma-enhanced atomic layer deposition of BaTiO3
10Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
11Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
12Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
13Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
14Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
15Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
16Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
17Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
18Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
19Radical Enhanced Atomic Layer Deposition of Metals and Oxides
20A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
21Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
22Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
23Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
24Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
25Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
26Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
27Bipolar resistive switching in amorphous titanium oxide thin film
28Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
29Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
30Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
31Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
32Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
33Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
34Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
35Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
36Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
37Energy-enhanced atomic layer deposition for more process and precursor versatility
38Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
39Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
40Flexible Memristive Memory Array on Plastic Substrates
41Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
42Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
43Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
44High-efficiency embedded transmission grating
45Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
46In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
47In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
48In-gap states in titanium dioxide and oxynitride atomic layer deposited films
49Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
50Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
51Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
52Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
53Low temperature temporal and spatial atomic layer deposition of TiO2 films
54Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
55Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
56MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
57Oxygen migration in TiO2-based higher-k gate stacks
58Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
59Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
60Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
61Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
62Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
63Plasma-enhanced atomic layer deposition of BaTiO3
64Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
65Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
66Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
67Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
68Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
69Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
70Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
71Study on the resistive switching time of TiO2 thin films
72Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
73Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
74The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
75Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
76Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
77Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
78TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
79Analysis of nitrogen species in titanium oxynitride ALD films
80Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
81Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
82In-gap states in titanium dioxide and oxynitride atomic layer deposited films
83Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
84Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
85Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
86Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
87Optical and Electrical Properties of TixSi1-xOy Films
88Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD