TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4, CAS# 546-68-9

Where to buy

NumberVendorLink
1Strem Chemicals, Inc.Titanium(IV) i-propoxide, min. 98%
2EreztechTitanium (IV) isopropoxide
3GelestTitanium Isopropoxide
4Strem Chemicals, Inc.Titanium(IV) i-propoxide, min. 98%, contained in 50 ml cylinder for CVD/ALD
5EpiValenceTitanium isopropoxide

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 85 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
3Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
4Optical and Electrical Properties of AlxTi1-xO Films
5Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
6Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
7Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
8Plasma-enhanced atomic layer deposition of BaTiO3
9Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
10Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
11Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
12Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
13Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
14Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
15Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
16Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
17Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
18Radical Enhanced Atomic Layer Deposition of Metals and Oxides
19A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
20Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
21Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
22Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
23Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
24Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
25Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
26Bipolar resistive switching in amorphous titanium oxide thin film
27Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
28Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
29Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
30Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
31Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
32Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
33Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
34Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
35Energy-enhanced atomic layer deposition for more process and precursor versatility
36Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
37Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
38Flexible Memristive Memory Array on Plastic Substrates
39Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
40Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
41Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
42High-efficiency embedded transmission grating
43Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
44In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
45In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
46In-gap states in titanium dioxide and oxynitride atomic layer deposited films
47Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
48Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
49Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
50Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
51Low temperature temporal and spatial atomic layer deposition of TiO2 films
52Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
53Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
54MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
55Oxygen migration in TiO2-based higher-k gate stacks
56Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
57Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
58Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
59Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
60Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
61Plasma-enhanced atomic layer deposition of BaTiO3
62Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
63Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
64Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
65Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
66Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
67Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
68Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
69Study on the resistive switching time of TiO2 thin films
70Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
71Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
72The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
73Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
74Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
75TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
76Analysis of nitrogen species in titanium oxynitride ALD films
77Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
78Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
79In-gap states in titanium dioxide and oxynitride atomic layer deposited films
80Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
81Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
82Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
83Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
84Optical and Electrical Properties of TixSi1-xOy Films
85Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD