TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4, CAS# 546-68-9
Where to buy
www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.
If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 94 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
| Number | Title |
|---|
| 1 | Optical and Electrical Properties of TixSi1-xOy Films |
| 2 | Ti Alloyed Ξ±-Ga2O3: Route towards Wide Band Gap Engineering |
| 3 | Study on the resistive switching time of TiO2 thin films |
| 4 | Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry |
| 5 | Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants |
| 6 | Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O |
| 7 | Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites |
| 8 | Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors |
| 9 | Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation |
| 10 | Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries |
| 11 | In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition |
| 12 | Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition |
| 13 | Highly reflective polymeric substrates functionalized utilizing atomic layer deposition |
| 14 | Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides |
| 15 | Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings |
| 16 | Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories |
| 17 | Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries |
| 18 | Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD |
| 19 | The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films |
| 20 | Bipolar resistive switching in amorphous titanium oxide thin film |
| 21 | Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate |
| 22 | Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application |
| 23 | Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes |
| 24 | Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition |
| 25 | Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide |
| 26 | Low temperature temporal and spatial atomic layer deposition of TiO2 films |
| 27 | Optical and Electrical Properties of AlxTi1-xO Films |
| 28 | Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O |
| 29 | Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure |
| 30 | Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4 |
| 31 | Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS |
| 32 | Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings |
| 33 | Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study |
| 34 | Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating |
| 35 | Characteristics of TiO2 Films Prepared by ALD With and Without Plasma |
| 36 | Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices |
| 37 | Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition |
| 38 | Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance |
| 39 | Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition |
| 40 | Radical Enhanced Atomic Layer Deposition of Metals and Oxides |
| 41 | Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film |
| 42 | Flexible Memristive Memory Array on Plastic Substrates |
| 43 | Oxygen migration in TiO2-based higher-k gate stacks |
| 44 | The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films |
| 45 | Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment |
| 46 | Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study |
| 47 | Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas |
| 48 | Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma |
| 49 | Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure |
| 50 | Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications |
| 51 | Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries |
| 52 | Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges |
| 53 | TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition |
| 54 | Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices |
| 55 | Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source |
| 56 | Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2 |
| 57 | The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films |
| 58 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide |
| 59 | Antireflection Coating on PMMA Substrates by Atomic Layer Deposition |
| 60 | Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source |
| 61 | Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation |
| 62 | Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode |
| 63 | Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD |
| 64 | Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition |
| 65 | Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation |
| 66 | A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application |
| 67 | Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide |
| 68 | Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries |
| 69 | Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2 |
| 70 | Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition |
| 71 | Analysis of nitrogen species in titanium oxynitride ALD films |
| 72 | Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O |
| 73 | Plasma-enhanced atomic layer deposition of BaTiO3 |
| 74 | High-efficiency embedded transmission grating |
| 75 | Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range |
| 76 | MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion |
| 77 | Redshift and amplitude increase in the dielectric function of corundum-like Ξ±-(TixGa1-x)2O3 |
| 78 | In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices |
| 79 | Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties |
| 80 | Energy-enhanced atomic layer deposition for more process and precursor versatility |
| 81 | Plasma-enhanced atomic layer deposition of BaTiO3 |
| 82 | Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants |
| 83 | Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices |
| 84 | Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films |
| 85 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage |
| 86 | Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating |
| 87 | Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films |
| 88 | In-gap states in titanium dioxide and oxynitride atomic layer deposited films |
| 89 | Atomic structure of conducting nanofilaments in TiO2 resistive switching memory |
| 90 | Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2 |
| 91 | Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition |
| 92 | In-gap states in titanium dioxide and oxynitride atomic layer deposited films |
| 93 | Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition |
| 94 | Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition |
