| 1 | Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation |
| 2 | Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure |
| 3 | Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition |
| 4 | Optical and Electrical Properties of AlxTi1-xO Films |
| 5 | Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants |
| 6 | Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films |
| 7 | Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation |
| 8 | Plasma-enhanced atomic layer deposition of BaTiO3 |
| 9 | Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O |
| 10 | Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O |
| 11 | Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure |
| 12 | Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition |
| 13 | Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition |
| 14 | Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes |
| 15 | Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source |
| 16 | Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4 |
| 17 | Radical Enhanced Atomic Layer Deposition of Metals and Oxides |
| 18 | A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application |
| 19 | Antireflection Coating on PMMA Substrates by Atomic Layer Deposition |
| 20 | Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition |
| 21 | Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices |
| 22 | Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges |
| 23 | Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors |
| 24 | Atomic structure of conducting nanofilaments in TiO2 resistive switching memory |
| 25 | Bipolar resistive switching in amorphous titanium oxide thin film |
| 26 | Characteristics of TiO2 Films Prepared by ALD With and Without Plasma |
| 27 | Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices |
| 28 | Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O |
| 29 | Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application |
| 30 | Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories |
| 31 | Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study |
| 32 | Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition |
| 33 | Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film |
| 34 | Energy-enhanced atomic layer deposition for more process and precursor versatility |
| 35 | Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment |
| 36 | Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate |
| 37 | Flexible Memristive Memory Array on Plastic Substrates |
| 38 | Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma |
| 39 | Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition |
| 40 | Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings |
| 41 | High-efficiency embedded transmission grating |
| 42 | Highly reflective polymeric substrates functionalized utilizing atomic layer deposition |
| 43 | In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices |
| 44 | In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition |
| 45 | In-gap states in titanium dioxide and oxynitride atomic layer deposited films |
| 46 | Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS |
| 47 | Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides |
| 48 | Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings |
| 49 | Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films |
| 50 | Low temperature temporal and spatial atomic layer deposition of TiO2 films |
| 51 | Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source |
| 52 | Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range |
| 53 | MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion |
| 54 | Oxygen migration in TiO2-based higher-k gate stacks |
| 55 | Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites |
| 56 | Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries |
| 57 | Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide |
| 58 | Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2 |
| 59 | Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation |
| 60 | Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants |
| 61 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide |
| 62 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage |
| 63 | Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode |
| 64 | Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD |
| 65 | Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas |
| 66 | Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide |
| 67 | The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films |
| 68 | Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties |
| 69 | Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications |
| 70 | TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition |
| 71 | Analysis of nitrogen species in titanium oxynitride ALD films |
| 72 | Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition |
| 73 | Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices |
| 74 | In-gap states in titanium dioxide and oxynitride atomic layer deposited films |
| 75 | Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition |
| 76 | Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study |
| 77 | Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries |
| 78 | Optical and Electrical Properties of TixSi1-xOy Films |
| 79 | Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD |