TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4, CAS# 546-68-9
Where to buy
www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.
If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 94 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
| Number | Title |
|---|
| 1 | Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas |
| 2 | Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries |
| 3 | Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries |
| 4 | Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices |
| 5 | A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application |
| 6 | Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation |
| 7 | Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O |
| 8 | Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2 |
| 9 | Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2 |
| 10 | Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation |
| 11 | Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices |
| 12 | Plasma-enhanced atomic layer deposition of BaTiO3 |
| 13 | Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties |
| 14 | Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges |
| 15 | Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure |
| 16 | The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films |
| 17 | Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition |
| 18 | Oxygen migration in TiO2-based higher-k gate stacks |
| 19 | Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries |
| 20 | Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes |
| 21 | Optical and Electrical Properties of AlxTi1-xO Films |
| 22 | Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings |
| 23 | Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition |
| 24 | The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films |
| 25 | Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film |
| 26 | Study on the resistive switching time of TiO2 thin films |
| 27 | Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation |
| 28 | Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma |
| 29 | Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study |
| 30 | Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS |
| 31 | Plasma-enhanced atomic layer deposition of BaTiO3 |
| 32 | Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition |
| 33 | Flexible Memristive Memory Array on Plastic Substrates |
| 34 | Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD |
| 35 | Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices |
| 36 | Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study |
| 37 | Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites |
| 38 | Redshift and amplitude increase in the dielectric function of corundum-like Ξ±-(TixGa1-x)2O3 |
| 39 | TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition |
| 40 | MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion |
| 41 | Highly reflective polymeric substrates functionalized utilizing atomic layer deposition |
| 42 | Characteristics of TiO2 Films Prepared by ALD With and Without Plasma |
| 43 | Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O |
| 44 | Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate |
| 45 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage |
| 46 | In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition |
| 47 | Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants |
| 48 | Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide |
| 49 | Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment |
| 50 | Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4 |
| 51 | Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O |
| 52 | Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2 |
| 53 | Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition |
| 54 | Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range |
| 55 | Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition |
| 56 | Energy-enhanced atomic layer deposition for more process and precursor versatility |
| 57 | Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition |
| 58 | Radical Enhanced Atomic Layer Deposition of Metals and Oxides |
| 59 | Ti Alloyed Ξ±-Ga2O3: Route towards Wide Band Gap Engineering |
| 60 | High-efficiency embedded transmission grating |
| 61 | Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide |
| 62 | In-gap states in titanium dioxide and oxynitride atomic layer deposited films |
| 63 | Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating |
| 64 | Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings |
| 65 | Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries |
| 66 | Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application |
| 67 | Analysis of nitrogen species in titanium oxynitride ALD films |
| 68 | Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition |
| 69 | Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications |
| 70 | Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors |
| 71 | Antireflection Coating on PMMA Substrates by Atomic Layer Deposition |
| 72 | Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films |
| 73 | Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating |
| 74 | Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source |
| 75 | Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films |
| 76 | Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry |
| 77 | The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films |
| 78 | Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode |
| 79 | Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD |
| 80 | Bipolar resistive switching in amorphous titanium oxide thin film |
| 81 | Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure |
| 82 | Optical and Electrical Properties of TixSi1-xOy Films |
| 83 | Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants |
| 84 | Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition |
| 85 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide |
| 86 | Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance |
| 87 | In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices |
| 88 | Atomic structure of conducting nanofilaments in TiO2 resistive switching memory |
| 89 | Low temperature temporal and spatial atomic layer deposition of TiO2 films |
| 90 | In-gap states in titanium dioxide and oxynitride atomic layer deposited films |
| 91 | Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides |
| 92 | Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition |
| 93 | Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories |
| 94 | Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source |