TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4, CAS# 546-68-9

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTitanium(IV) i-propoxide, min. 98%, contained in 50 ml cylinder for CVD/ALD
2GelestπŸ‡ΊπŸ‡ΈTitanium Isopropoxide
3Pegasus ChemicalsπŸ‡¬πŸ‡§Titanium(IV) isopropoxide
4DOCK/CHEMICALSπŸ‡©πŸ‡ͺTitaniumtetraisopropoxide
5Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTitanium(IV) i-propoxide, min. 98%
6EreztechπŸ‡ΊπŸ‡ΈTitanium (IV) isopropoxide
7EpiValenceπŸ‡¬πŸ‡§Titanium isopropoxide

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 92 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
2Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
3Optical and Electrical Properties of AlxTi1-xO Films
4Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
5Optical and Electrical Properties of TixSi1-xOy Films
6Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
7Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
8Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
9Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
10Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
11Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
12Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
13Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
14Oxygen migration in TiO2-based higher-k gate stacks
15Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
16Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
17In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
18Radical Enhanced Atomic Layer Deposition of Metals and Oxides
19Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
20Redshift and amplitude increase in the dielectric function of corundum-like Ξ±-(TixGa1-x)2O3
21Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
22Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
23Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
24Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
25Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
26Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
27Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
28Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
29TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
30Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
31Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
32Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
33Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
34Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
35Bipolar resistive switching in amorphous titanium oxide thin film
36Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
37Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
38Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
39Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
40Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
41Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
42Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
43Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
44The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
45Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
46Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
47Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
48Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
49Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
50In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
51Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
52Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
53In-gap states in titanium dioxide and oxynitride atomic layer deposited films
54Energy-enhanced atomic layer deposition for more process and precursor versatility
55Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
56Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
57Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
58Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
59Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
60Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
61Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
62The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
63MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
64Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
65Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
66Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
67Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
68Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
69Plasma-enhanced atomic layer deposition of BaTiO3
70The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
71Low temperature temporal and spatial atomic layer deposition of TiO2 films
72Flexible Memristive Memory Array on Plastic Substrates
73Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
74Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
75Ti Alloyed Ξ±-Ga2O3: Route towards Wide Band Gap Engineering
76Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
77Plasma-enhanced atomic layer deposition of BaTiO3
78Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
79Analysis of nitrogen species in titanium oxynitride ALD films
80Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
81Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
82A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
83High-efficiency embedded transmission grating
84Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
85Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
86Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
87In-gap states in titanium dioxide and oxynitride atomic layer deposited films
88Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
89Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
90Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
91Study on the resistive switching time of TiO2 thin films
92Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties