TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4, CAS# 546-68-9

Where to buy

NumberVendorRegionLink
1DOCK/CHEMICALSπŸ‡©πŸ‡ͺTitaniumtetraisopropoxide
2EpiValenceπŸ‡¬πŸ‡§Titanium isopropoxide
3EreztechπŸ‡ΊπŸ‡ΈTitanium (IV) isopropoxide
4GelestπŸ‡ΊπŸ‡ΈTitanium Isopropoxide
5Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTitanium(IV) i-propoxide, min. 98%, contained in 50 ml cylinder for CVD/ALD
6Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTitanium(IV) i-propoxide, min. 98%

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 90 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
3Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
4Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
5Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
6Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
7Low temperature temporal and spatial atomic layer deposition of TiO2 films
8Optical and Electrical Properties of AlxTi1-xO Films
9MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
10Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
11Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
12Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
13The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
14Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
15Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
16Flexible Memristive Memory Array on Plastic Substrates
17Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
18Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
19Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
20Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
21Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
22Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
23Oxygen migration in TiO2-based higher-k gate stacks
24Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
25Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
26Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
27Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
28Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
29Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
30Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
31A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
32Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
33Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
34Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
35Energy-enhanced atomic layer deposition for more process and precursor versatility
36Analysis of nitrogen species in titanium oxynitride ALD films
37In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
38In-gap states in titanium dioxide and oxynitride atomic layer deposited films
39Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
40Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
41The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
42Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
43Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
44Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
45Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
46Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
47Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
48Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
49Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
50Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
51Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
52Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
53Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
54Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
55Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
56Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
57Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
58Study on the resistive switching time of TiO2 thin films
59In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
60Optical and Electrical Properties of TixSi1-xOy Films
61Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
62Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
63Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
64Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
65Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
66High-efficiency embedded transmission grating
67Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
68Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
69Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
70Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
71Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
72In-gap states in titanium dioxide and oxynitride atomic layer deposited films
73Plasma-enhanced atomic layer deposition of BaTiO3
74Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
75Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
76Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
77Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
78Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
79Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
80Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
81Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
82Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
83Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
84TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
85The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
86Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
87Plasma-enhanced atomic layer deposition of BaTiO3
88Bipolar resistive switching in amorphous titanium oxide thin film
89Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
90Radical Enhanced Atomic Layer Deposition of Metals and Oxides