TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4, CAS# 546-68-9

Where to buy

NumberVendorRegionLink
1GelestπŸ‡ΊπŸ‡ΈTitanium Isopropoxide
2Pegasus ChemicalsπŸ‡¬πŸ‡§Titanium(IV) isopropoxide
3DOCK/CHEMICALSπŸ‡©πŸ‡ͺTitaniumtetraisopropoxide
4Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTitanium(IV) i-propoxide, min. 98%
5Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTitanium(IV) i-propoxide, min. 98%, contained in 50 ml cylinder for CVD/ALD

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 94 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Low temperature temporal and spatial atomic layer deposition of TiO2 films
2Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
3Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
4Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
5Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
6Optical and Electrical Properties of TixSi1-xOy Films
7Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
8Optical and Electrical Properties of AlxTi1-xO Films
9Analysis of nitrogen species in titanium oxynitride ALD films
10Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
11Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
12Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
13Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
14A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
15Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
16Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
17Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
18Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
19Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
20Study on the resistive switching time of TiO2 thin films
21Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
22MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
23Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
24Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
25Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
26Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
27Plasma-enhanced atomic layer deposition of BaTiO3
28Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
29Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
30Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
31Redshift and amplitude increase in the dielectric function of corundum-like Ξ±-(TixGa1-x)2O3
32Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
33In-gap states in titanium dioxide and oxynitride atomic layer deposited films
34Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
35Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
36Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
37Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
38Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
39In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
40Flexible Memristive Memory Array on Plastic Substrates
41Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
42Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
43Radical Enhanced Atomic Layer Deposition of Metals and Oxides
44Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
45TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
46Plasma-enhanced atomic layer deposition of BaTiO3
47Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
48Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
49Bipolar resistive switching in amorphous titanium oxide thin film
50Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
51Oxygen migration in TiO2-based higher-k gate stacks
52Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
53Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
54Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
55Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
56Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
57Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
58Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
59Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
60Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
61Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
62Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
63Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
64Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
65Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
66Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
67Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
68Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
69High-efficiency embedded transmission grating
70Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
71Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
72Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
73Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
74Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
75Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
76Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
77Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
78Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
79The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
80Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
81Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
82The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
83Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
84Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
85In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
86In-gap states in titanium dioxide and oxynitride atomic layer deposited films
87Energy-enhanced atomic layer deposition for more process and precursor versatility
88Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
89Ti Alloyed Ξ±-Ga2O3: Route towards Wide Band Gap Engineering
90Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
91The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
92Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
93Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
94Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition