TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4, CAS# 546-68-9

Where to buy

NumberVendorRegionLink
1GelestπŸ‡ΊπŸ‡ΈTitanium Isopropoxide
2Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTitanium(IV) i-propoxide, min. 98%
3EreztechπŸ‡ΊπŸ‡ΈTitanium (IV) isopropoxide
4EpiValenceπŸ‡¬πŸ‡§Titanium isopropoxide
5DOCK/CHEMICALSπŸ‡©πŸ‡ͺTitaniumtetraisopropoxide
6Pegasus ChemicalsπŸ‡¬πŸ‡§Titanium(IV) isopropoxide
7Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTitanium(IV) i-propoxide, min. 98%, contained in 50 ml cylinder for CVD/ALD

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 92 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
2Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
3High-efficiency embedded transmission grating
4Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
5Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
6In-gap states in titanium dioxide and oxynitride atomic layer deposited films
7Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
8Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
9Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
10Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
11Optical and Electrical Properties of AlxTi1-xO Films
12Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
13In-gap states in titanium dioxide and oxynitride atomic layer deposited films
14Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
15Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
16Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
17Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
18Low temperature temporal and spatial atomic layer deposition of TiO2 films
19Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
20Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
21Bipolar resistive switching in amorphous titanium oxide thin film
22Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
23Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
24Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
25Energy-enhanced atomic layer deposition for more process and precursor versatility
26Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
27Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
28Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
29Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
30Radical Enhanced Atomic Layer Deposition of Metals and Oxides
31Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
32Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
33Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
34Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
35Ti Alloyed Ξ±-Ga2O3: Route towards Wide Band Gap Engineering
36TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
37The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
38The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
39Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
40Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
41Study on the resistive switching time of TiO2 thin films
42Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
43Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
44Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
45Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
46Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
47In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
48Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
49MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
50Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
51Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
52Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
53Oxygen migration in TiO2-based higher-k gate stacks
54Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
55Plasma-enhanced atomic layer deposition of BaTiO3
56Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
57Analysis of nitrogen species in titanium oxynitride ALD films
58Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
59Optical and Electrical Properties of TixSi1-xOy Films
60Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
61Redshift and amplitude increase in the dielectric function of corundum-like Ξ±-(TixGa1-x)2O3
62Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
63Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
64Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
65In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
66Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
67A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
68Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
69Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
70Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
71Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
72Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
73Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
74Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
75Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
76Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
77Flexible Memristive Memory Array on Plastic Substrates
78Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
79Plasma-enhanced atomic layer deposition of BaTiO3
80Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
81Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
82Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
83Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
84The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
85Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
86Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
87Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
88Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
89Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
90Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
91Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
92Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties