TTIP, Titanium(IV) i-propoxide, CAS# 546-68-9

Where to buy

Number	Vendor	Link
1	Strem Chemicals, Inc.	Titanium(IV) i-propoxide, min. 98%
2	Ereztech	Titanium (IV) isopropoxide
3	Strem Chemicals, Inc.	Titanium(IV) i-propoxide, min. 98%, contained in 50 ml cylinder for CVD/ALD

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
3	Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
4	Optical and Electrical Properties of AlxTi1-xO Films
5	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
6	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
7	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
8	Plasma-enhanced atomic layer deposition of BaTiO3
9	Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
10	Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
11	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
12	Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
13	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
14	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
15	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
16	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
17	A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
18	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
19	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
20	Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
21	Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
22	Bipolar resistive switching in amorphous titanium oxide thin film
23	Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
24	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
25	Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
26	Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
27	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
28	Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
29	Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
30	Energy-enhanced atomic layer deposition for more process and precursor versatility
31	Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
32	Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
33	Flexible Memristive Memory Array on Plastic Substrates
34	Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
35	Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
36	High-efficiency embedded transmission grating
37	Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
38	In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
39	In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
40	In-gap states in titanium dioxide and oxynitride atomic layer deposited films
41	Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
42	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
43	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
44	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
45	Low temperature temporal and spatial atomic layer deposition of TiO2 films
46	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
47	Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
48	Oxygen migration in TiO2-based higher-k gate stacks
49	Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
50	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
51	Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
52	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
53	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
54	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
55	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
56	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
57	Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
58	Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
59	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
60	Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
61	Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
62	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
63	Analysis of nitrogen species in titanium oxynitride ALD films
64	Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
65	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
66	In-gap states in titanium dioxide and oxynitride atomic layer deposited films
67	Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
68	Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
69	Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
70	Optical and Electrical Properties of TixSi1-xOy Films
71	Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD

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