TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4, CAS# 546-68-9

Where to buy

NumberVendorRegionLink
1GelestπŸ‡ΊπŸ‡ΈTitanium Isopropoxide
2DOCK/CHEMICALSπŸ‡©πŸ‡ͺTitaniumtetraisopropoxide
3Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTitanium(IV) i-propoxide, min. 98%
4Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTitanium(IV) i-propoxide, min. 98%, contained in 50 ml cylinder for CVD/ALD
5Pegasus ChemicalsπŸ‡¬πŸ‡§Titanium(IV) isopropoxide

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 94 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
2Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
3Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
4Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
5Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
6Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
7Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
8Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
9In-gap states in titanium dioxide and oxynitride atomic layer deposited films
10Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
11Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
12Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
13Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
14Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
15Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
16In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
17Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
18Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
19Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
20Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
21Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
22Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
23Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
24Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
25Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
26In-gap states in titanium dioxide and oxynitride atomic layer deposited films
27Radical Enhanced Atomic Layer Deposition of Metals and Oxides
28Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
29Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
30Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
31Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
32Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
33Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
34Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
35Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
36Low temperature temporal and spatial atomic layer deposition of TiO2 films
37Study on the resistive switching time of TiO2 thin films
38Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
39Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
40Flexible Memristive Memory Array on Plastic Substrates
41In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
42TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
43Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
44Plasma-enhanced atomic layer deposition of BaTiO3
45Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
46Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
47Optical and Electrical Properties of TixSi1-xOy Films
48Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
49Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
50High-efficiency embedded transmission grating
51Oxygen migration in TiO2-based higher-k gate stacks
52Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
53Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
54Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
55Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
56The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
57Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
58Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
59Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
60Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
61The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
62Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
63Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
64MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
65Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
66Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
67A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
68Plasma-enhanced atomic layer deposition of BaTiO3
69Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
70Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
71Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
72Ti Alloyed Ξ±-Ga2O3: Route towards Wide Band Gap Engineering
73Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
74Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
75Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
76Optical and Electrical Properties of AlxTi1-xO Films
77Analysis of nitrogen species in titanium oxynitride ALD films
78Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
79Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
80The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
81Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
82Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
83Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
84Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
85Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
86Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
87Redshift and amplitude increase in the dielectric function of corundum-like Ξ±-(TixGa1-x)2O3
88Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
89Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
90Bipolar resistive switching in amorphous titanium oxide thin film
91Energy-enhanced atomic layer deposition for more process and precursor versatility
92Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
93Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
94Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices