TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4, CAS# 546-68-9
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Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 90 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
Number | Title |
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1 | Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation |
2 | Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O |
3 | Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites |
4 | Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation |
5 | Antireflection Coating on PMMA Substrates by Atomic Layer Deposition |
6 | Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range |
7 | Low temperature temporal and spatial atomic layer deposition of TiO2 films |
8 | Optical and Electrical Properties of AlxTi1-xO Films |
9 | MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion |
10 | Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source |
11 | Characteristics of TiO2 Films Prepared by ALD With and Without Plasma |
12 | Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate |
13 | The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films |
14 | Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices |
15 | Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O |
16 | Flexible Memristive Memory Array on Plastic Substrates |
17 | Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition |
18 | Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas |
19 | Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition |
20 | Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants |
21 | Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O |
22 | Highly reflective polymeric substrates functionalized utilizing atomic layer deposition |
23 | Oxygen migration in TiO2-based higher-k gate stacks |
24 | Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries |
25 | Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure |
26 | Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films |
27 | Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD |
28 | Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition |
29 | Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2 |
30 | Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings |
31 | A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application |
32 | Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode |
33 | Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition |
34 | Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films |
35 | Energy-enhanced atomic layer deposition for more process and precursor versatility |
36 | Analysis of nitrogen species in titanium oxynitride ALD films |
37 | In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition |
38 | In-gap states in titanium dioxide and oxynitride atomic layer deposited films |
39 | Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2 |
40 | Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS |
41 | The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films |
42 | Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges |
43 | Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating |
44 | Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries |
45 | Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide |
46 | Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition |
47 | Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices |
48 | Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes |
49 | Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure |
50 | Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants |
51 | Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition |
52 | Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings |
53 | Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance |
54 | Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study |
55 | Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2 |
56 | Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application |
57 | Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source |
58 | Study on the resistive switching time of TiO2 thin films |
59 | In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices |
60 | Optical and Electrical Properties of TixSi1-xOy Films |
61 | Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors |
62 | Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices |
63 | Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides |
64 | Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD |
65 | Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study |
66 | High-efficiency embedded transmission grating |
67 | Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment |
68 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide |
69 | Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry |
70 | Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma |
71 | Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition |
72 | In-gap states in titanium dioxide and oxynitride atomic layer deposited films |
73 | Plasma-enhanced atomic layer deposition of BaTiO3 |
74 | Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation |
75 | Atomic structure of conducting nanofilaments in TiO2 resistive switching memory |
76 | Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating |
77 | Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film |
78 | Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties |
79 | Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition |
80 | Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories |
81 | Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4 |
82 | Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage |
83 | Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition |
84 | TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition |
85 | The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films |
86 | Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide |
87 | Plasma-enhanced atomic layer deposition of BaTiO3 |
88 | Bipolar resistive switching in amorphous titanium oxide thin film |
89 | Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications |
90 | Radical Enhanced Atomic Layer Deposition of Metals and Oxides |