TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4, CAS# 546-68-9

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTitanium(IV) i-propoxide, min. 98%, contained in 50 ml cylinder for CVD/ALD
2Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTitanium(IV) i-propoxide, min. 98%
3GelestπŸ‡ΊπŸ‡ΈTitanium Isopropoxide
4Pegasus ChemicalsπŸ‡¬πŸ‡§Titanium(IV) isopropoxide
5DOCK/CHEMICALSπŸ‡©πŸ‡ͺTitaniumtetraisopropoxide

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 94 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
2Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
3The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
4Redshift and amplitude increase in the dielectric function of corundum-like Ξ±-(TixGa1-x)2O3
5Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
6Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
7Low temperature temporal and spatial atomic layer deposition of TiO2 films
8Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
9Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
10Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
11Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
12Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
13A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
14Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
15In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
16Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
17Energy-enhanced atomic layer deposition for more process and precursor versatility
18Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
19Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
20Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
21Bipolar resistive switching in amorphous titanium oxide thin film
22Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas
23Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
24Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
25Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
26Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
27Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
28Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
29Oxygen migration in TiO2-based higher-k gate stacks
30Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
31Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
32Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
33Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
34In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
35Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
36Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
37Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
38Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
39Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
40Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
41Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
42The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
43Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
44Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
45Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
46Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
47Study on the resistive switching time of TiO2 thin films
48Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
49Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
50Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
51MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
52Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
53Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
54Ti Alloyed Ξ±-Ga2O3: Route towards Wide Band Gap Engineering
55Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
56Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
57Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
58Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
59Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
60Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
61Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
62TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
63Analysis of nitrogen species in titanium oxynitride ALD films
64Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
65Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
66Plasma-enhanced atomic layer deposition of BaTiO3
67Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
68Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
69Optical and Electrical Properties of AlxTi1-xO Films
70Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
71Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
72High-efficiency embedded transmission grating
73The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
74Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
75Plasma-enhanced atomic layer deposition of BaTiO3
76Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
77Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
78Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
79Radical Enhanced Atomic Layer Deposition of Metals and Oxides
80Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
81Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
82Optical and Electrical Properties of TixSi1-xOy Films
83Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
84Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
85Flexible Memristive Memory Array on Plastic Substrates
86Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
87Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
88Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
89In-gap states in titanium dioxide and oxynitride atomic layer deposited films
90Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
91In-gap states in titanium dioxide and oxynitride atomic layer deposited films
92Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
93Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
94Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition