Publication Information

Title:
Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
Type:
Journal
Info:
physica status solidi (a) Volume 210, Issue 2, pages 276--284, 2013
Date:
2012-10-05

Author Information

Name Institution
Jaesang LeeHanyang University
Seung Jae LeeHanyang University
Won Bae HanHanyang University
Heeyoung JeonHanyang University
Jingyu ParkHanyang University
Woochool JangHanyang University
Chong Seung YoonHanyang University
Hyeongtag JeonHanyang University

Films

Plasma TiO2


Film/Plasma Properties

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Microstructure
Analysis: XRD, X-Ray Diffraction

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Substrates

Si(100)

Keywords

Notes

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