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The publication database currently has 1536 entries.
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189 Films Compositions
401 Precursors and Plasma Gases
75 Deposition Hardwares
239 Film and Plasma Characteristics
82 Theses

Use Multifactor Search for more complex searches and for searching by other criteria (author, affiliation, analysis, deposition temperature)


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Recent Database Additions
Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
Search 1536 plasma ALD publications by:
189 Films Compositions
401 Precursors and Plasma Gases
75 Deposition Hardwares
239 Film and Plasma Characteristics

Jaesang Lee Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jaesang Lee returned 8 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
2Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
3Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
4Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
5Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
6Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
7The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
8The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition

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