Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film

Type:
Journal
Info:
ECS J. Solid State Sci. Technol. 2012 volume 1, issue 4, Q63-Q69
Date:
2012-07-02
DOI:
http://dx.doi.org/10.1149/2.001204jss

Author Information

Name Institution
Jaesang LeeHanyang University
Seung Jae LeeHanyang University
Won Bae HanHanyang University
Heeyoung JeonHanyang University
Jingyu ParkHanyang University
Hyungjun KimHanyang University
Chong Seung YoonHanyang University
Hyeongtag JeonHanyang University

Films

Plasma TiO2

Hardware used: Custom Remote Inductively Coupled Plasma
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 150-300C

Film/Plasma Properties

Characteristic: Photocatalytic Activity
Analysis: Custom
Diagnostic: Custom

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Substrates

Si(100)

Notes

641