Publication Information

Title: Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition

Type: Journal

Info: J. Vac. Sci. Technol. A 30(1), Jan/Feb 2012

Date: 2011-12-09

DOI: http://dx.doi.org/10.1116/1.3666033

Author Information

Name

Institution

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Wonik IPS Ltd.

Wonik IPS Ltd.

Air Products

Air Products

Films

Plasma Ru using Custom

Deposition Temperature Range N/A

32992-96-4

7664-41-7

7440-37-1

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

AES, Auger Electron Spectroscopy

Unknown

Compositional Depth Profiling

AES, Auger Electron Spectroscopy

Unknown

Adhesion

Scotch Tape Test

Unknown

Thickness

XRR, X-Ray Reflectivity

Unknown

Morphology, Roughness, Topography

TEM, Transmission Electron Microscope

Unknown

Surface Polarity

Sessile Drop Tests

Unknown

Substrates

SiO2

Keywords

DRAM Electrode

Notes

Testing impact of Ar plasma on Ru process and material properties.

In situ AES produces interesting atomic % depth profiles of substrate and Ru materials as Ru nucleates and completes coverage of SiO2.

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