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Introducing Plasma ALD, LLC's first in-house product. |
An economical, compact inductively coupled plasma source. |
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Ideal for: |
- Plasma-Enhanced Atomic Layer Deposition
- Thin Film Etch
- Surface cleaning
- Surface modification
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Contact us for more information. |
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Where to buy Bis(EthylCycloPentadienyl)Ruthenium, Ru(EtCp)2 CAS# 32992-96-4
Bis(EthylCycloPentadienyl)Ruthenium, Ru(EtCp)2 CAS# 32992-96-4 is available from the following source(s):
| Number | Vendor | Region | Link |
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| 1 | Strem Chemicals, Inc. | πΊπΈ | Bis(ethylcyclopentadienyl)ruthenium(II), 98% (99.9%-Ru) |
| 2 | Strem Chemicals, Inc. | πΊπΈ | Bis(ethylcyclopentadienyl)ruthenium(II), 98% (99.9%-Ru), contained in 50 ml cylinder with high temperature valve for CVD/ALD |
| 3 | DOCK/CHEMICALS | π©πͺ | Bis(ethylcyclopentadienyl)ruthenium |
| 4 | Yoodatech (Shanghai) Co., Ltd | | Bis(EthylCycloPentadienyl)Ruthenium, Ru(EtCp)2 - contact maggie@yoodatech.com |
| 5 | Strem Chemicals, Inc. | πΊπΈ | Bis(ethylcyclopentadienyl)ruthenium(II), 98% (99.9%-Ru), contained in 50 ml cylinder for CVD/ALD |
| 6 | Gelest | πΊπΈ | Diethylruthenocene |
| 7 | Pegasus Chemicals | π¬π§ | Bis(ethylcyclopentadienyl)ruthenium |
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