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Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
Innovative remote plasma source for atomic layer deposition for GaN devices
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
Where to buy Bis(EthylCycloPentadienyl)Ruthenium, Ru(EtCp)2 CAS# 32992-96-4
Bis(EthylCycloPentadienyl)Ruthenium, Ru(EtCp)2 CAS# 32992-96-4 is available from the following source(s):
| Number | Vendor | Region | Link |
|---|---|---|---|
| 1 | DOCK/CHEMICALS | 🇩🇪 | Bis(ethylcyclopentadienyl)ruthenium(II) |
| 2 | Strem Chemicals, Inc. | 🇺🇸 | Bis(ethylcyclopentadienyl)ruthenium(II), 98% (99.9%-Ru) |
| 3 | Strem Chemicals, Inc. | 🇺🇸 | Bis(ethylcyclopentadienyl)ruthenium(II), 98% (99.9%-Ru), contained in 50 ml cylinder with high temperature valve for CVD/ALD |
| 4 | Gelest | 🇺🇸 | Diethylruthenocene |
| 5 | Strem Chemicals, Inc. | 🇺🇸 | Bis(ethylcyclopentadienyl)ruthenium(II), 98% (99.9%-Ru), contained in 50 ml cylinder for CVD/ALD |
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