Ar, Argon, CAS# 7440-37-1

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
2Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
3Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
4Sub-nanometer heating depth of atomic layer annealing
5Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
6Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
7Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
8Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
9Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
10Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
11Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
12Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
13Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
14AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
15Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
16Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
17Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
18Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
19Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
20In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
21Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
22Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
23Plasma enhanced atomic layer deposition of aluminum sulfide thin films
24Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
25Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
26Formation of aluminum nitride thin films as gate dielectrics on Si(100)
27Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
28AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
29Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
30Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
31Carbon content control of silicon oxycarbide film with methane containing plasma
32Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
33Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
34Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
35A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
36Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
37Experimental and theoretical determination of the role of ions in atomic layer annealing
38Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
39Atomic Layer Deposition of Nanolayered Carbon Films
40Room temperature atomic layer deposition of TiO2 on gold nanoparticles
41Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
42A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
43Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
44In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
45Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
46Plasma enhanced atomic layer deposition of zinc sulfide thin films
47Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
48The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
49Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
50In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
51Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition