Ar, Argon, CAS# 7440-37-1

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 51 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
2Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
3Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
4Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
5Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
6Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
7Plasma enhanced atomic layer deposition of aluminum sulfide thin films
8AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
9In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
10Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
11Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
12Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
13Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
14Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
15Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
16Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
17Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
18Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
19Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
20Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
21Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
22Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
23Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
24Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
25AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
26Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
27Formation of aluminum nitride thin films as gate dielectrics on Si(100)
28Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
29Plasma enhanced atomic layer deposition of zinc sulfide thin films
30Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
31In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
32A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
33Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
34Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
35Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
36The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
37Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
38Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
39Experimental and theoretical determination of the role of ions in atomic layer annealing
40Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
41Atomic Layer Deposition of Nanolayered Carbon Films
42Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
43Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
44Carbon content control of silicon oxycarbide film with methane containing plasma
45Room temperature atomic layer deposition of TiO2 on gold nanoparticles
46Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
47Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
48Sub-nanometer heating depth of atomic layer annealing
49Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
50A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
51Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy