Ar, Argon, CAS# 7440-37-1

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 51 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
2Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
3Sub-nanometer heating depth of atomic layer annealing
4Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
5AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
6Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
7Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
8Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
9Atomic Layer Deposition of Nanolayered Carbon Films
10Plasma enhanced atomic layer deposition of aluminum sulfide thin films
11Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
12A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
13Formation of aluminum nitride thin films as gate dielectrics on Si(100)
14Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
15Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
16Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
17Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
18Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
19Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
20In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
21The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
22Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
23Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
24Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
25A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
26Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
27Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
28AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
29Room temperature atomic layer deposition of TiO2 on gold nanoparticles
30Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
31Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
32Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
33Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
34Carbon content control of silicon oxycarbide film with methane containing plasma
35Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
36Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
37Experimental and theoretical determination of the role of ions in atomic layer annealing
38Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
39Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
40Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
41Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
42In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
43Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
44Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
45Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
46Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
47Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
48Plasma enhanced atomic layer deposition of zinc sulfide thin films
49Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
50Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
51In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition