Ar, Argon, CAS# 7440-37-1

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
2Carbon content control of silicon oxycarbide film with methane containing plasma
3Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
4Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
5Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
6Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
7Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
8Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
9Formation of aluminum nitride thin films as gate dielectrics on Si(100)
10Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
11The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
12Experimental and theoretical determination of the role of ions in atomic layer annealing
13Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
14Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
15Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
16Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
17Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
18Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
19Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
20Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
21Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
22Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
23Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
24Atomic Layer Deposition of Nanolayered Carbon Films
25Sub-nanometer heating depth of atomic layer annealing
26Plasma enhanced atomic layer deposition of zinc sulfide thin films
27Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
28Plasma enhanced atomic layer deposition of aluminum sulfide thin films
29Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
30Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
31Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
32Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
33Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
34In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
35A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
36Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
37Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
38Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
39In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
40Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
41In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
42Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
43Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
44Room temperature atomic layer deposition of TiO2 on gold nanoparticles
45Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
46Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
47A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
48AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
49Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
50Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
51Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks