Ar, Argon, CAS# 7440-37-1

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 22 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
2	AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
3	Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
4	Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
5	Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
6	Formation of aluminum nitride thin films as gate dielectrics on Si(100)
7	Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
8	Plasma enhanced atomic layer deposition of aluminum sulfide thin films
9	Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
10	Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
11	Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
12	Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
13	Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
14	Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
15	Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
16	Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
17	Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
18	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
19	Room temperature atomic layer deposition of TiO2 on gold nanoparticles
20	Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
21	Plasma enhanced atomic layer deposition of zinc sulfide thin films
22	Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon

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