Ar, Argon, CAS# 7440-37-1

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 51 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
2Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
3Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
4Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
5Room temperature atomic layer deposition of TiO2 on gold nanoparticles
6Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
7Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
8In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
9Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
10Sub-nanometer heating depth of atomic layer annealing
11Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
12AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
13Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
14Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
15Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
16Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
17Formation of aluminum nitride thin films as gate dielectrics on Si(100)
18Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
19Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
20Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
21The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
22Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
23Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
24Experimental and theoretical determination of the role of ions in atomic layer annealing
25Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
26A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
27Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
28Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
29Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
30Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
31Atomic Layer Deposition of Nanolayered Carbon Films
32Plasma enhanced atomic layer deposition of zinc sulfide thin films
33A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
34Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
35Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
36Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
37Carbon content control of silicon oxycarbide film with methane containing plasma
38Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
39Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
40Plasma enhanced atomic layer deposition of aluminum sulfide thin films
41In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
42Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
43Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
44Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
45AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
46Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
47Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
48Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
49Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
50In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
51Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films