Ar, Argon, CAS# 7440-37-1

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 46 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al₂O₃ on GaN based metal oxide semiconductor capacitor
2	AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
3	Influence of argon plasma on the deposition of Al₂O₃ film onto the PET surfaces by atomic layer deposition
4	Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al₂O₃
5	Working gas effect on properties of Al₂O₃ film in plasma-enhanced atomic layer deposition
6	AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
7	Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
8	Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
9	Formation of aluminum nitride thin films as gate dielectrics on Si(100)
10	Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
11	Sub-nanometer heating depth of atomic layer annealing
12	Plasma enhanced atomic layer deposition of aluminum sulfide thin films
13	Atomic Layer Deposition of Nanolayered Carbon Films
14	Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)₂ Precursor
15	In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
16	In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
17	Phase Control of Crystalline Ga₂O₃ Films by Plasma-Enhanced Atomic Layer Deposition
18	Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
19	Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
20	Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
21	Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
22	Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
23	Plasma-Assisted ALD of Highly Conductive HfN_x: On the Effect of Energetic Ions on Film Microstructure
24	Interface engineering of ALD HfO₂-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
25	Plasma-enhanced atomic-layer-deposited MoO_x emitters for silicon heterojunction solar cells
26	Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
27	Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
28	Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
29	Carbon content control of silicon oxycarbide film with methane containing plasma
30	Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
31	Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
32	Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
33	Infrared Study of Room Temperature Atomic Layer Deposition of SnO₂ Using Sn(CH₃)₄ and Plasma Excited Humidified Argon
34	Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnO_x infrared transparent conductive thin films
35	Effective work function tunability and interfacial reactions with underlying HfO₂ layer of plasma-enhanced atomic layer deposited TaC_xN_y films
36	Improved electrical performances of plasma-enhanced atomic layer deposited TaC_xN_y films by adopting Ar/H₂ plasma
37	In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
38	Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
39	Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH₃-Ar-H₂ plasma treatment for capacitor electrodes
40	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
41	Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
42	Room temperature atomic layer deposition of TiO₂ on gold nanoparticles
43	The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
44	Evaluation of V₂O₅ Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
45	Plasma enhanced atomic layer deposition of zinc sulfide thin films
46	Room-temperature atomic layer deposition of ZrO₂ using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon