Ar, Argon, CAS# 7440-37-1

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 51 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
2Plasma enhanced atomic layer deposition of zinc sulfide thin films
3Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
4Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
5Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
6Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
7Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
8Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
9Experimental and theoretical determination of the role of ions in atomic layer annealing
10Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
11Atomic Layer Deposition of Nanolayered Carbon Films
12Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
13Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
14Formation of aluminum nitride thin films as gate dielectrics on Si(100)
15Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
16Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
17Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
18Sub-nanometer heating depth of atomic layer annealing
19Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
20Room temperature atomic layer deposition of TiO2 on gold nanoparticles
21Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
22Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
23Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
24Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
25Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
26Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
27Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
28Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
29Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
30Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
31AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
32Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
33Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
34In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
35Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
36AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
37Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
38Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
39Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
40Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
41Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
42In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
43Plasma enhanced atomic layer deposition of aluminum sulfide thin films
44Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
45Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
46A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
47Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
48Carbon content control of silicon oxycarbide film with methane containing plasma
49In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
50The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
51A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor