Ar, Argon, CAS# 7440-37-1

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 18 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
2	AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
3	Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
4	Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
5	Plasma enhanced atomic layer deposition of aluminum sulfide thin films
6	Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
7	Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
8	Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
9	Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
10	Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
11	Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
12	Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
13	Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
14	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
15	Room temperature atomic layer deposition of TiO2 on gold nanoparticles
16	Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
17	Plasma enhanced atomic layer deposition of zinc sulfide thin films
18	Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon

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