Ar, Argon, CAS# 7440-37-1

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
2AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
3Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
4Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
5Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
6AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
7Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
8Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
9Formation of aluminum nitride thin films as gate dielectrics on Si(100)
10Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
11Plasma enhanced atomic layer deposition of aluminum sulfide thin films
12Atomic Layer Deposition of Nanolayered Carbon Films
13Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
14In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
15In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
16Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
17Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
18Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
19Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
20Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
21Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
22Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
23Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
24Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
25Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
26Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
27Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
28Carbon content control of silicon oxycarbide film with methane containing plasma
29Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
30Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
31Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
32Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
33Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
34Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
35Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
36In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
37Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
38Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
39Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
40Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
41Room temperature atomic layer deposition of TiO2 on gold nanoparticles
42The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
43Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
44Plasma enhanced atomic layer deposition of zinc sulfide thin films
45Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon