Ar, Argon, CAS# 7440-37-1

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 49 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
2Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
3Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
4Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
5Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
6Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
7A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
8Plasma enhanced atomic layer deposition of zinc sulfide thin films
9Sub-nanometer heating depth of atomic layer annealing
10A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
11Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
12In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
13Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
14Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
15Atomic Layer Deposition of Nanolayered Carbon Films
16Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
17Plasma enhanced atomic layer deposition of aluminum sulfide thin films
18Method of sealing pores in porous low-k SiOC(-H) films fabricated using plasma-assisted atomic layer deposition
19The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
20In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
21Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
22Room temperature atomic layer deposition of TiO2 on gold nanoparticles
23Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
24Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
25Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
26Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
27Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
28Carbon content control of silicon oxycarbide film with methane containing plasma
29Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
30AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
31Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
32Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
33Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
34Formation of aluminum nitride thin films as gate dielectrics on Si(100)
35Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
36Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
37Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
38Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
39Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
40Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
41Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
42Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
43Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
44In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
45AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
46Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
47Experimental and theoretical determination of the role of ions in atomic layer annealing
48Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
49Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films