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Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Chem. Mater. 2020, XXXX, XXX, XXX-XXX
Date:
2020-01-13
Author Information
| Name | Institution |
|---|---|
| Virginia D. Wheeler | U.S. Naval Research Laboratory |
| Neeraj Nepal | U.S. Naval Research Laboratory |
| David R. Boris | U.S. Naval Research Laboratory |
| Syed B. Qadri | U.S. Naval Research Laboratory |
| Luke O. Nyakiti | Texas A&M University College Station |
| Andrew Lang | U.S. Naval Research Laboratory |
| Andrew D. Koehler | U.S. Naval Research Laboratory |
| Geoffrey Foster | U.S. Naval Research Laboratory |
| Scott G. Walton | U.S. Naval Research Laboratory |
| Charles R. Eddy, Jr. | U.S. Naval Research Laboratory |
| David J. Meyer | U.S. Naval Research Laboratory |
Films
Plasma Ga2O3
Plasma Ga2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Strain
Analysis: XRD, X-Ray Diffraction
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: -
Characteristic: Magnetic Properties
Analysis: SQUID, Superconducting Quantum Interference Device
Substrates
| Sapphire |
Notes
| 1428 |