Neeraj Nepal Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Neeraj Nepal returned 19 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
2Atomic layer epitaxy for quantum well nitride-based devices
3Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
4Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
5Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
6Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
7Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
8Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
9Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
10Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
11Investigation of AlGaN/GaN HEMTs Passivated by AlN Films Grown by Atomic Layer Epitaxy
12Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
13Perspectives on future directions in III-N semiconductor research
14Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
15Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
16Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
17Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
18The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
19Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering