
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 40, 062405 (2022)
Date:
2022-08-31
Author Information
Name | Institution |
---|---|
Jeffrey M. Woodward | U.S. Naval Research Laboratory |
Jaan Aarik | U.S. Naval Research Laboratory |
David R. Boris | U.S. Naval Research Laboratory |
Scooter D. Johnson | Syntek Technologies |
Scott G. Walton | U.S. Naval Research Laboratory |
Scooter D. Johnson | U.S. Naval Research Laboratory |
Zachary R. Robinson | The College at Brockport SUNY |
Neeraj Nepal | U.S. Naval Research Laboratory |
Karl F. Ludwig Jr. | Boston University |
Jennifer K. Hite | U.S. Naval Research Laboratory |
Charles R. Eddy, Jr. | U.S. Naval Research Laboratory |
Films
Plasma InN
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering
Characteristic: Island Characterization
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering
Characteristic: Nucleation
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Electron Density, ne
Analysis: Langmuir Probe
Characteristic: Plasma Potential
Analysis: Langmuir Probe
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Substrates
GaN |
Notes
Custom beamline ALD setup with G1 Fiji plasma source. |
1653 |