Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 40, 062405 (2022)
Date:
2022-08-31

Author Information

Name Institution
Jeffrey M. WoodwardU.S. Naval Research Laboratory
Jaan AarikU.S. Naval Research Laboratory
David R. BorisU.S. Naval Research Laboratory
Scooter D. JohnsonSyntek Technologies
Scott G. WaltonU.S. Naval Research Laboratory
Scooter D. JohnsonU.S. Naval Research Laboratory
Zachary R. RobinsonThe College at Brockport SUNY
Neeraj NepalU.S. Naval Research Laboratory
Karl F. Ludwig Jr.Boston University
Jennifer K. HiteU.S. Naval Research Laboratory
Charles R. Eddy, Jr.U.S. Naval Research Laboratory

Films

Plasma InN


Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering

Characteristic: Island Characterization
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering

Characteristic: Nucleation
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Electron Density, ne
Analysis: Langmuir Probe

Characteristic: Plasma Potential
Analysis: Langmuir Probe

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Substrates

GaN

Keywords

Nucleation

Notes

Custom beamline ALD setup with G1 Fiji plasma source.
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