Charles R. Eddy, Jr. Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Charles R. Eddy, Jr. returned 20 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
2Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
3Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
4Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
5Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
6Atomic layer epitaxy for quantum well nitride-based devices
7Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
8Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
9Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
10The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
11Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
12Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
13Perspectives on future directions in III-N semiconductor research
14Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
15Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
16Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
17Investigation of AlGaN/GaN HEMTs Passivated by AlN Films Grown by Atomic Layer Epitaxy
18ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
19Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
20Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering