Publication Information

Title:
Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 031508 (2017)
Date:
2017-03-07

Author Information

Name Institution
Virginia R. AndersonU.S. Naval Research Laboratory
Neeraj NepalU.S. Naval Research Laboratory
Scooter D. JohnsonU.S. Naval Research Laboratory
Zachary R. RobinsonThe College at Brockport SUNY
Anindya NathGeorge Mason University
Alexander Campbell KozenU.S. Naval Research Laboratory
Syed B. QadriU.S. Naval Research Laboratory
Alexander DeMasiBoston University
Jennifer K. HiteU.S. Naval Research Laboratory
Karl F. Ludwig Jr.Boston University
Charles R. Eddy, Jr.U.S. Naval Research Laboratory

Films

Plasma AlN


Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Substrates

Sapphire

Keywords

Notes

Used beamlines at Brookhaven and Cornell.
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