Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 031508 (2017)
Date:
2017-03-07
Author Information
| Name | Institution |
|---|---|
| Virginia R. Anderson | U.S. Naval Research Laboratory |
| Neeraj Nepal | U.S. Naval Research Laboratory |
| Scooter D. Johnson | U.S. Naval Research Laboratory |
| Zachary R. Robinson | The College at Brockport SUNY |
| Anindya Nath | George Mason University |
| Alexander Campbell Kozen | U.S. Naval Research Laboratory |
| Syed B. Qadri | U.S. Naval Research Laboratory |
| Alexander DeMasi | Boston University |
| Jennifer K. Hite | U.S. Naval Research Laboratory |
| Karl F. Ludwig Jr. | Boston University |
| Charles R. Eddy, Jr. | U.S. Naval Research Laboratory |
Films
Plasma AlN
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Substrates
| Sapphire |
Notes
| Used beamlines at Brookhaven and Cornell. |
| 1020 |