Custom Remote Inductively Coupled Plasma Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom Remote Inductively Coupled Plasma hardware returned 130 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
2Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
3Plasma enhanced atomic layer deposition of aluminum sulfide thin films
4Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
5Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
6Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
7Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
8Tuning size and coverage of Pd nanoparticles using atomic layer deposition
9The effects of plasma treatment on the thermal stability of HfO2 thin films
10Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
11Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
12Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
13Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
14Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
15The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
16Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
17Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
18Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
19Plasma-Assisted Atomic Layer Deposition of Palladium
20Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
21Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
22Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
23Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
24Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
25Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
26The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
27Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
28Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
29Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
30Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
31Plasma-enhanced atomic layer deposition of zinc phosphate
32Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
33Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
34Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
35Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
36Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
37Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
38Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
39Room-Temperature Atomic Layer Deposition of Platinum
40Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
41Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
42Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
43The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
44Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
45Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
46Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
47High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
48Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
49Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
50Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
51Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
52Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
53Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
54Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
55Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
56Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
57The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
58TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
59Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
60In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
61Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
62Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
63Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
64Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
65Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature
66The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
67Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
68Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
69Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
70Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
71Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
72Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
73Fundamental beam studies of radical enhanced atomic layer deposition of TiN
74Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
75Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
76Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
77Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
78Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
79Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
80Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
81Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
82Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
83Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
84Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
85Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
86Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
87Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
88Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
89Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
90Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
91Plasma-enhanced ALD system for SRF cavity
92High-Voltage and Low-Leakage-Current Gate Recessed Normally-Off GaN MIS-HEMTs With Dual Gate Insulator Employing PEALD-SiNx/RF-Sputtered-HfO2
93A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
94On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
95In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
96Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
97Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
98Improvement of Vth Instability in Normally-Off GaN MIS-HEMTs Employing PEALD-SiNx as an Interfacial Layer
99The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
100Plasma enhanced atomic layer deposition of zinc sulfide thin films
101Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
102Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
103Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
104Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition
105Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
106Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
107Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
108Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
109Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
110Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
111Texture of atomic layer deposited ruthenium
112Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
113Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
114Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
115The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
116The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
117Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
118Experimental and theoretical determination of the role of ions in atomic layer annealing
119Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
120In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
121Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
122Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
123Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
124Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
125Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
126Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
127Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
128Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
129Plasma enhanced atomic layer deposition of gallium sulfide thin films
130Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature