| 1 | Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation |
| 2 | Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate |
| 3 | Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy |
| 4 | Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants |
| 5 | Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition |
| 6 | Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2 |
| 7 | Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide |
| 8 | Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications |
| 9 | Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition |
| 10 | Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor |
| 11 | Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition |
| 12 | Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition |
| 13 | Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film |
| 14 | Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method |
| 15 | Fundamental beam studies of radical enhanced atomic layer deposition of TiN |
| 16 | Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition |
| 17 | In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3 |
| 18 | Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces |
| 19 | Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents |
| 20 | Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides |
| 21 | Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition |
| 22 | Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties |
| 23 | Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films |
| 24 | On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies |
| 25 | Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition |
| 26 | Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition |
| 27 | Plasma enhanced atomic layer deposition of aluminum sulfide thin films |
| 28 | Plasma enhanced atomic layer deposition of gallium sulfide thin films |
| 29 | Plasma enhanced atomic layer deposition of zinc sulfide thin films |
| 30 | Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2 |
| 31 | Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films |
| 32 | Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches |
| 33 | Plasma-Assisted Atomic Layer Deposition of Palladium |
| 34 | Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications |
| 35 | Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry |
| 36 | Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering |
| 37 | Plasma-enhanced ALD system for SRF cavity |
| 38 | Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4 |
| 39 | Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries |
| 40 | Plasma-enhanced atomic layer deposition of palladium on a polymer substrate |
| 41 | Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties |
| 42 | Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries |
| 43 | Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material |
| 44 | Plasma-enhanced atomic layer deposition of zinc phosphate |
| 45 | Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene |
| 46 | Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas |
| 47 | Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors |
| 48 | Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films |
| 49 | Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition |
| 50 | Room-Temperature Atomic Layer Deposition of Platinum |
| 51 | Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells |
| 52 | Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films |
| 53 | Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride |
| 54 | Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide |
| 55 | Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide |
| 56 | Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy |
| 57 | Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films |
| 58 | Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition |
| 59 | The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer |
| 60 | The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition |
| 61 | The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties |
| 62 | The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides |
| 63 | The physical properties of cubic plasma-enhanced atomic layer deposition TaN films |
| 64 | The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2 |
| 65 | Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality |
| 66 | Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition |
| 67 | Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions |