Custom ICP Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom ICP hardware returned 90 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
2Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
3Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
4Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
5Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
6Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
7Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
8Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
9Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
10Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
11Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
12Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
13Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
14Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
15Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
16Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
17Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
18Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
19Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
20Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
21Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
22Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
23Fundamental beam studies of radical enhanced atomic layer deposition of TiN
24Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
25Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
26High-Voltage and Low-Leakage-Current Gate Recessed Normally-Off GaN MIS-HEMTs With Dual Gate Insulator Employing PEALD-SiNx/RF-Sputtered-HfO2
27Improvement of Vth Instability in Normally-Off GaN MIS-HEMTs Employing PEALD-SiNx as an Interfacial Layer
28In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
29In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
30In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
31Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
32Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
33Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
34Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
35Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
36Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
37Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
38Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
39Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
40On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
41Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
42Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
43Plasma enhanced atomic layer deposition of aluminum sulfide thin films
44Plasma enhanced atomic layer deposition of gallium sulfide thin films
45Plasma enhanced atomic layer deposition of zinc sulfide thin films
46Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
47Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
48Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
49Plasma-Assisted Atomic Layer Deposition of Palladium
50Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
51Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
52Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
53Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
54Plasma-enhanced ALD system for SRF cavity
55Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
56Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
57Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
58Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
59Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
60Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
61Plasma-enhanced atomic layer deposition of zinc phosphate
62Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
63Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
64Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
65Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
66Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
67Room-Temperature Atomic Layer Deposition of Platinum
68Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
69Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
70Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
71Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
72Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
73Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
74Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
75Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
76Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
77Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
78Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition
79The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
80The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
81The effects of plasma treatment on the thermal stability of HfO2 thin films
82The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
83The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
84The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
85The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
86The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
87Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
88Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
89Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
90Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions


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