Custom ICP Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom ICP hardware returned 90 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
2	Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
3	Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
4	Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
5	Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
6	Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
7	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
8	Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
9	Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
10	Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
11	Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
12	Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
13	Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
14	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
15	Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
16	Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
17	Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
18	Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
19	Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
20	Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
21	Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
22	Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
23	Fundamental beam studies of radical enhanced atomic layer deposition of TiN
24	Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
25	Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
26	High-Voltage and Low-Leakage-Current Gate Recessed Normally-Off GaN MIS-HEMTs With Dual Gate Insulator Employing PEALD-SiNx/RF-Sputtered-HfO2
27	Improvement of Vth Instability in Normally-Off GaN MIS-HEMTs Employing PEALD-SiNx as an Interfacial Layer
28	In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
29	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
30	In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
31	Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
32	Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
33	Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
34	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
35	Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
36	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
37	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
38	Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
39	Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
40	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
41	Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
42	Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
43	Plasma enhanced atomic layer deposition of aluminum sulfide thin films
44	Plasma enhanced atomic layer deposition of gallium sulfide thin films
45	Plasma enhanced atomic layer deposition of zinc sulfide thin films
46	Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
47	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
48	Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
49	Plasma-Assisted Atomic Layer Deposition of Palladium
50	Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
51	Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
52	Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
53	Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
54	Plasma-enhanced ALD system for SRF cavity
55	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
56	Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
57	Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
58	Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
59	Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
60	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
61	Plasma-enhanced atomic layer deposition of zinc phosphate
62	Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
63	Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
64	Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
65	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
66	Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
67	Room-Temperature Atomic Layer Deposition of Platinum
68	Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
69	Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
70	Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
71	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
72	Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
73	Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
74	Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
75	Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
76	Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
77	Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
78	Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition
79	The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
80	The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
81	The effects of plasma treatment on the thermal stability of HfO2 thin films
82	The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
83	The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
84	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
85	The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
86	The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
87	Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
88	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
89	Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
90	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions

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