Custom ICP Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom ICP hardware returned 100 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
2Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
3Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
4Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
5Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
6Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
7Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
8Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
9Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
10Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
11Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
12Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
13Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
14Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
15Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
16Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
17Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
18Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
19Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
20Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
21Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
22Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
23Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
24Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
25Fundamental beam studies of radical enhanced atomic layer deposition of TiN
26Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
27Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
28High-Voltage and Low-Leakage-Current Gate Recessed Normally-Off GaN MIS-HEMTs With Dual Gate Insulator Employing PEALD-SiNx/RF-Sputtered-HfO2
29Improvement of Vth Instability in Normally-Off GaN MIS-HEMTs Employing PEALD-SiNx as an Interfacial Layer
30In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
31In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
32In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
33Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
34Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
35Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
36Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
37Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
38Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
39Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
40Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
41Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
42Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
43On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
44Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
45Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
46Plasma enhanced atomic layer deposition of aluminum sulfide thin films
47Plasma enhanced atomic layer deposition of gallium sulfide thin films
48Plasma enhanced atomic layer deposition of zinc sulfide thin films
49Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
50Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
51Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
52Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
53Plasma-Assisted Atomic Layer Deposition of Palladium
54Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
55Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
56Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
57Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
58Plasma-enhanced ALD system for SRF cavity
59Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
60Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
61Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
62Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
63Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
64Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
65Plasma-enhanced atomic layer deposition of zinc phosphate
66Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
67Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
68Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
69Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
70Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
71Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
72Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
73Room-Temperature Atomic Layer Deposition of Platinum
74Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
75Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
76Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
77Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
78Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
79Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
80Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
81Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
82Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
83Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
84Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
85TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
86Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition
87The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
88The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
89The effects of plasma treatment on the thermal stability of HfO2 thin films
90The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
91The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
92The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
93The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
94The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
95Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
96Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
97Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
98Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
99Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
100Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions


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