Custom ICP Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom ICP hardware returned 87 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
2Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
3Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
4Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
5Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
6Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
7Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
8Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
9Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
10Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
11Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
12Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
13Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
14Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
15Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
16Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
17Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
18Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
19Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
20Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
21Fundamental beam studies of radical enhanced atomic layer deposition of TiN
22Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
23Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
24High-Voltage and Low-Leakage-Current Gate Recessed Normally-Off GaN MIS-HEMTs With Dual Gate Insulator Employing PEALD-SiNx/RF-Sputtered-HfO2
25Improvement of Vth Instability in Normally-Off GaN MIS-HEMTs Employing PEALD-SiNx as an Interfacial Layer
26In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
27In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
28In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
29Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
30Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
31Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
32Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
33Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
34Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
35Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
36Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
37Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
38On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
39Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
40Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
41Plasma enhanced atomic layer deposition of aluminum sulfide thin films
42Plasma enhanced atomic layer deposition of gallium sulfide thin films
43Plasma enhanced atomic layer deposition of zinc sulfide thin films
44Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
45Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
46Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
47Plasma-Assisted Atomic Layer Deposition of Palladium
48Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
49Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
50Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
51Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
52Plasma-enhanced ALD system for SRF cavity
53Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
54Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
55Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
56Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
57Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
58Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
59Plasma-enhanced atomic layer deposition of zinc phosphate
60Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
61Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
62Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
63Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
64Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
65Room-Temperature Atomic Layer Deposition of Platinum
66Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
67Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
68Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
69Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
70Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
71Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
72Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
73Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
74Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
75Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition
76The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
77The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
78The effects of plasma treatment on the thermal stability of HfO2 thin films
79The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
80The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
81The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
82The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
83The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
84Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
85Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
86Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
87Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions


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