Custom Remote Inductively Coupled Plasma Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom Remote Inductively Coupled Plasma hardware returned 131 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
2Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
3Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
4Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
5Room-Temperature Atomic Layer Deposition of Platinum
6Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
7Fundamental beam studies of radical enhanced atomic layer deposition of TiN
8Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
9Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
10Experimental and theoretical determination of the role of ions in atomic layer annealing
11Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
12Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature
13The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
14Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
15Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
16Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
17Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
18Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
19Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
20Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
21Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
22The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
23Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
24Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
25Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
26High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
27TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
28Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
29Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
30Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
31The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
32Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
33Tuning size and coverage of Pd nanoparticles using atomic layer deposition
34Plasma-Assisted Atomic Layer Deposition of Palladium
35Plasma enhanced atomic layer deposition of gallium sulfide thin films
36Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
37Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
38Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
39Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
40Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
41Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
42Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
43In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
44Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
45Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
46Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
47On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
48Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
49Plasma-enhanced ALD system for SRF cavity
50Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
51Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
52Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
53Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
54Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
55Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
56Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition
57Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
58Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
59Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
60Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
61Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
62Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
63Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
64Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
65Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
66Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
67Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
68Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
69Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
70Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
71Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
72Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
73Plasma enhanced atomic layer deposition of aluminum sulfide thin films
74Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
75Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
76Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
77Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
78Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
79Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
80Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
81Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
82Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
83Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
84Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
85Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
86Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
87Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
88In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
89Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
90Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
91Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
92In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
93Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
94Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
95The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
96A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
97Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
98Improvement of Vth Instability in Normally-Off GaN MIS-HEMTs Employing PEALD-SiNx as an Interfacial Layer
99Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
100Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
101Plasma enhanced atomic layer deposition of zinc sulfide thin films
102The effects of plasma treatment on the thermal stability of HfO2 thin films
103Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
104Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
105Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
106Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
107The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
108Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
109Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
110Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
111Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
112Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
113Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
114Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
115Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
116Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
117Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
118Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
119The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
120The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
121Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
122Texture of atomic layer deposited ruthenium
123Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
124Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
125Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
126Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
127Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
128Plasma-enhanced atomic layer deposition of zinc phosphate
129The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
130Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
131High-Voltage and Low-Leakage-Current Gate Recessed Normally-Off GaN MIS-HEMTs With Dual Gate Insulator Employing PEALD-SiNx/RF-Sputtered-HfO2