Custom Remote Inductively Coupled Plasma Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom Remote Inductively Coupled Plasma hardware returned 106 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
2Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
3Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
4Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
5Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
6Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
7Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
8Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
9Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
10Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
11Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
12Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
13Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
14Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
15Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
16Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
17Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
18Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
19Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
20Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
21Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
22Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
23Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
24Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
25Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
26Fundamental beam studies of radical enhanced atomic layer deposition of TiN
27Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
28Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
29Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
30High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
31High-Voltage and Low-Leakage-Current Gate Recessed Normally-Off GaN MIS-HEMTs With Dual Gate Insulator Employing PEALD-SiNx/RF-Sputtered-HfO2
32Improvement of Vth Instability in Normally-Off GaN MIS-HEMTs Employing PEALD-SiNx as an Interfacial Layer
33In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
34In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
35In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
36Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
37Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
38Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
39Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
40Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
41Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
42Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
43Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
44Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
45Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
46On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
47Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
48Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
49Plasma enhanced atomic layer deposition of aluminum sulfide thin films
50Plasma enhanced atomic layer deposition of gallium sulfide thin films
51Plasma enhanced atomic layer deposition of zinc sulfide thin films
52Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
53Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
54Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
55Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
56Plasma-Assisted Atomic Layer Deposition of Palladium
57Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
58Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
59Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
60Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
61Plasma-enhanced ALD system for SRF cavity
62Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
63Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
64Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
65Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
66Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
67Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
68Plasma-enhanced atomic layer deposition of zinc phosphate
69Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
70Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
71Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
72Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
73Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
74Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
75Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
76Room-Temperature Atomic Layer Deposition of Platinum
77Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
78Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
79Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
80Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
81Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
82Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
83Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
84Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
85Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
86Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
87Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
88Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
89TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
90Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition
91The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
92The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
93The effects of plasma treatment on the thermal stability of HfO2 thin films
94The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
95The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
96The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
97The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
98The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
99The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
100Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
101Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
102Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
103Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
104Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
105Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
106Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions