Custom Remote Inductively Coupled Plasma Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom Remote Inductively Coupled Plasma hardware returned 118 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
2Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
3Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
4Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
5Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
6Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
7Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
8Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
9Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
10Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
11Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
12Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
13Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
14Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
15Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
16Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
17Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
18Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
19Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
20Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
21Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
22Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
23Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
24Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
25Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
26Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
27Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
28Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
29Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
30Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
31Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
32Fundamental beam studies of radical enhanced atomic layer deposition of TiN
33Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
34Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
35Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
36High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
37High-Voltage and Low-Leakage-Current Gate Recessed Normally-Off GaN MIS-HEMTs With Dual Gate Insulator Employing PEALD-SiNx/RF-Sputtered-HfO2
38Improvement of Vth Instability in Normally-Off GaN MIS-HEMTs Employing PEALD-SiNx as an Interfacial Layer
39In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
40In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
41In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
42Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
43Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
44Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
45Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
46Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
47Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
48Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
49Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
50Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
51Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
52On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
53Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
54Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
55Plasma enhanced atomic layer deposition of aluminum sulfide thin films
56Plasma enhanced atomic layer deposition of gallium sulfide thin films
57Plasma enhanced atomic layer deposition of zinc sulfide thin films
58Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
59Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
60Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
61Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
62Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
63Plasma-Assisted Atomic Layer Deposition of Palladium
64Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
65Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
66Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
67Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
68Plasma-enhanced ALD system for SRF cavity
69Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
70Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
71Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
72Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
73Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
74Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
75Plasma-enhanced atomic layer deposition of zinc phosphate
76Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
77Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
78Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
79Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
80Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
81Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
82Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
83Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
84Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
85Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
86Room-Temperature Atomic Layer Deposition of Platinum
87Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
88Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
89Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
90Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature
91Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
92Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
93Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
94Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
95Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
96Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
97Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
98Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
99Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
100TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
101Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition
102The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
103The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
104The effects of plasma treatment on the thermal stability of HfO2 thin films
105The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
106The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
107The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
108The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
109The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
110The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
111Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
112Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
113Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
114Tuning size and coverage of Pd nanoparticles using atomic layer deposition
115Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
116Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
117Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
118Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions