Custom ICP Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom ICP hardware returned 100 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
2	Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
3	Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
4	Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
5	Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
6	Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
7	Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
8	Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
9	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
10	Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
11	Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
12	Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
13	Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
14	Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
15	Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
16	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
17	Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
18	Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
19	Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
20	Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
21	Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
22	Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
23	Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
24	Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
25	Fundamental beam studies of radical enhanced atomic layer deposition of TiN
26	Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
27	Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
28	High-Voltage and Low-Leakage-Current Gate Recessed Normally-Off GaN MIS-HEMTs With Dual Gate Insulator Employing PEALD-SiNx/RF-Sputtered-HfO2
29	Improvement of Vth Instability in Normally-Off GaN MIS-HEMTs Employing PEALD-SiNx as an Interfacial Layer
30	In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
31	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
32	In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
33	Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
34	Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
35	Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
36	Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
37	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
38	Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
39	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
40	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
41	Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
42	Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
43	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
44	Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
45	Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
46	Plasma enhanced atomic layer deposition of aluminum sulfide thin films
47	Plasma enhanced atomic layer deposition of gallium sulfide thin films
48	Plasma enhanced atomic layer deposition of zinc sulfide thin films
49	Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
50	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
51	Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
52	Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
53	Plasma-Assisted Atomic Layer Deposition of Palladium
54	Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
55	Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
56	Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
57	Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
58	Plasma-enhanced ALD system for SRF cavity
59	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
60	Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
61	Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
62	Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
63	Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
64	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
65	Plasma-enhanced atomic layer deposition of zinc phosphate
66	Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
67	Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
68	Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
69	Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
70	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
71	Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
72	Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
73	Room-Temperature Atomic Layer Deposition of Platinum
74	Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
75	Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
76	Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
77	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
78	Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
79	Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
80	Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
81	Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
82	Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
83	Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
84	Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
85	TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
86	Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition
87	The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
88	The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
89	The effects of plasma treatment on the thermal stability of HfO2 thin films
90	The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
91	The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
92	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
93	The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
94	The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
95	Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
96	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
97	Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
98	Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
99	Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
100	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions

Shortcuts

© 2014-2020 plasma-ald.com