Custom Remote Inductively Coupled Plasma Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom Remote Inductively Coupled Plasma hardware returned 107 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
2Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
3Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
4Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
5Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
6Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
7Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
8Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
9Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
10Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
11Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
12Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
13Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
14Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
15Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
16Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
17Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
18Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
19Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
20Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
21Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
22Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
23Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
24Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
25Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
26Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
27Fundamental beam studies of radical enhanced atomic layer deposition of TiN
28Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
29Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
30Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
31High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
32High-Voltage and Low-Leakage-Current Gate Recessed Normally-Off GaN MIS-HEMTs With Dual Gate Insulator Employing PEALD-SiNx/RF-Sputtered-HfO2
33Improvement of Vth Instability in Normally-Off GaN MIS-HEMTs Employing PEALD-SiNx as an Interfacial Layer
34In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
35In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
36In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
37Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
38Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
39Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
40Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
41Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
42Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
43Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
44Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
45Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
46Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
47On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
48Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
49Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
50Plasma enhanced atomic layer deposition of aluminum sulfide thin films
51Plasma enhanced atomic layer deposition of gallium sulfide thin films
52Plasma enhanced atomic layer deposition of zinc sulfide thin films
53Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
54Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
55Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
56Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
57Plasma-Assisted Atomic Layer Deposition of Palladium
58Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
59Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
60Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
61Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
62Plasma-enhanced ALD system for SRF cavity
63Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
64Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
65Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
66Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
67Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
68Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
69Plasma-enhanced atomic layer deposition of zinc phosphate
70Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
71Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
72Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
73Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
74Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
75Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
76Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
77Room-Temperature Atomic Layer Deposition of Platinum
78Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
79Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
80Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
81Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
82Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
83Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
84Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
85Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
86Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
87Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
88Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
89Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
90TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
91Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition
92The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
93The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
94The effects of plasma treatment on the thermal stability of HfO2 thin films
95The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
96The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
97The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
98The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
99The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
100The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
101Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
102Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
103Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
104Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
105Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
106Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
107Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions