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In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films Influence of oxygen source on the ferroelectric properties of ALD grown Hf_1-xZr_xO₂ films

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Your search for plasma enhanced atomic layer deposition publications using Custom Remote Inductively Coupled Plasma hardware returned 111 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
2	Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
3	Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
4	Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
5	Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O₂ plasma
6	Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
7	Atomic Layer Deposition of Cobalt Using H₂-, N₂-, and NH₃-Based Plasmas: On the Role of the Co-reactant
8	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)₂ Precursor and Oxygen Gas
9	Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N₂ Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
10	Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
11	Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe₂O₃-SnO₂
12	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
13	Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)₂
14	Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N₂ and N₂O Plasma Post-Treatments
15	Characterization of plasma-enhanced atomic layer deposition of Al₂O₃ using dimethylaluminum isopropoxide
16	Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al₂O₃ film as the tunnel and blocking oxides for nonvolatile memory applications
17	Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta₂O₅ and the Effects on Electrical Properties of In situ Nitridation
18	Conformality of Al₂O₃ and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
19	Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
20	Deposition Of MnO Anode And MnO₂ Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)₃ Precursor
21	Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
22	Diffusion barrier properties of TaN_x films prepared by plasma enhanced atomic layer deposition from PDMAT with N₂ or NH₃ plasma
23	Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
24	Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
25	Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
26	Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
27	Electrical Properties of Atomic Layer Deposition HfO₂ and HfO_xN_y on Si Substrates with Various Crystal Orientations
28	Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
29	Fundamental beam studies of radical enhanced atomic layer deposition of TiN
30	Growth Kinetics and Crystallization Behavior of TiO₂ Films Prepared by Plasma Enhanced Atomic Layer Deposition
31	Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
32	Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
33	High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
34	High-Voltage and Low-Leakage-Current Gate Recessed Normally-Off GaN MIS-HEMTs With Dual Gate Insulator Employing PEALD-SiN_x/RF-Sputtered-HfO₂
35	Improvement of V_th Instability in Normally-Off GaN MIS-HEMTs Employing PEALD-SiN_x as an Interfacial Layer
36	In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al₂O₃
37	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
38	In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
39	Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
40	Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
41	Infrared study on room-temperature atomic layer deposition of HfO₂ using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
42	Interfacial Self-Cleaning during PEALD HfO₂ Process on GaAs Using TDMAH/O₂ with Different (NH₄)₂S Cleaning Time
43	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
44	Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
45	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
46	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
47	Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
48	Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
49	On the determination of χ⁽²⁾ in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
50	Photocatalytic activities of TiO₂ thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
51	Photocatalytic functional coatings of TiO₂ thin films on polymer substrate by plasma enhanced atomic layer deposition
52	Plasma enhanced atomic layer deposition of aluminum sulfide thin films
53	Plasma enhanced atomic layer deposition of gallium sulfide thin films
54	Plasma enhanced atomic layer deposition of zinc sulfide thin films
55	Plasma Modeling of a PEALD System for the Deposition of TiO₂ and HfO₂
56	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO₃ Thin Films
57	Plasma-assisted atomic layer deposition of Al₂O₃ moisture permeation barriers on polymers
58	Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
59	Plasma-Assisted Atomic Layer Deposition of Palladium
60	Plasma-assisted atomic layer deposition of Ta₂O₅ from alkylamide precursor and remote O₂ plasma
61	Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
62	Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
63	Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
64	Plasma-enhanced ALD system for SRF cavity
65	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO₂ Using TiCl₄
66	Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
67	Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
68	Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
69	Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
70	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
71	Plasma-enhanced atomic layer deposition of zinc phosphate
72	Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
73	Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al₂O₃
74	Reaction mechanisms of atomic layer deposition of TaN_x from Ta(NMe₂)₅ precursor and H₂-based plasmas
75	Remote Plasma ALD of SrTiO₃ Using Cyclopentadienlyl-Based Ti and Sr Precursors
76	Remote Plasma Atomic Layer Deposition of Co₃O₄ Thin Films
77	Remote Plasma Atomic Layer Deposition of SiN_x Using Cyclosilazane and H₂/N₂ Plasma
78	Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO₂
79	Robust TaN_x diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
80	Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
81	Room-Temperature Atomic Layer Deposition of Platinum
82	Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
83	Si atomic layer epitaxy based on Si₂H₆ and remote He plasma bombardment
84	Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
85	Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO₂ Thin Films
86	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
87	Surface chemistry of plasma-assisted atomic layer deposition of Al₂O₃ studied by infrared spectroscopy
88	Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
89	Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
90	Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
91	Surface reactions of aminosilane precursors during N₂ plasma-assisted atomic layer deposition of SiN_x
92	Synthesis and in situ characterization of low-resistivity TaN_x films by remote plasma atomic layer deposition
93	Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co₃O₄ and Co₃O₄/Fe₂O₃ catalyst films
94	TaCN growth with PDMAT and H₂/Ar plasma by plasma enhanced atomic layer deposition
95	Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition
96	The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
97	The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfO_xN_y prepared by in situ nitridation
98	The effects of plasma treatment on the thermal stability of HfO₂ thin films
99	The Effects of Radio Frequency Plasma Power on Al₂O₃ Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
100	The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
101	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
102	The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
103	The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO₂
104	The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
105	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
106	Thermal Stability of ALD HfO₂ Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
107	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
108	Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al₂O₃
109	Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
110	Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
111	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions