Publication Information

Title: Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation

Type: Journal

Info: Chem. Mater. 2018, 30, 663-670

Date: 2017-11-30

DOI: http://dx.doi.org/10.1021/acs.chemmater.7b03818

Author Information

Name

Institution

Stanford University

Eindhoven University of Technology

Chonbuk National University

Toyota Motor Europe NV/SA

Eindhoven University of Technology

Eindhoven University of Technology

Stanford University

Eindhoven University of Technology

Films

Plasma Pt using Custom ICP

Deposition Temperature Range N/A

94442-22-5

7782-44-7

Plasma Fe2O3 using Custom ICP

Deposition Temperature Range N/A

1316-98-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific KA1066 spectrometer

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

PHI Versaprobe III

Images

TEM, Transmission Electron Microscope

JEOL JEM ARM 200

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

JEOL JEM ARM 200

Chemical Composition, Impurities

AES, Auger Electron Spectroscopy

ULVAC PHI Inc., PHI 700

Substrates

SiO2

Keywords

Area Selective

Notes

1064



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