Publication Information

Title:
Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
Type:
Journal
Info:
Chem. Mater. 2018, 30, 663-670
Date:
2017-11-30

Author Information

Name Institution
Joseph A. SinghStanford University
Nick F. W. ThissenEindhoven University of Technology
Woo-Hee KimChonbuk National University
Hannah JohnsonToyota Motor Europe NV/SA
Erwin (W.M.M.) KesselsEindhoven University of Technology
Ageeth A. BolEindhoven University of Technology
Stacey F. BentStanford University
Adriaan J. M. MackusEindhoven University of Technology

Films

Plasma Pt


Plasma Fe2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Substrates

SiO2

Keywords

Area Selective

Notes

1064