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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

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Woo-Hee Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Woo-Hee Kim returned 12 record(s).

NumberTitle
1Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
2Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
3Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
4Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
5Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
6In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
7Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
8Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
9Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
10Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
11Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
12Plasma-Enhanced Atomic Layer Deposition of Ni