Publication Information

Title:
Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 56, No. 1, pp. 104--107
Date:
2009-12-01

Author Information

Name Institution
Han-Bo-Ram LeeYonsei University
Jae-Min KimYonsei University
Hyungjun KimYonsei University
Woo-Hee KimPohang University of Science and Technology (POSTECH)
Jeongwon LeePohang University of Science and Technology (POSTECH)
Inchan HwangPohang University of Science and Technology (POSTECH)

Films

Plasma Co


Thermal Co


Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Wetting Angle
Analysis: Contact Angle Measurement

Substrates

Si(001)
SiO2
OTS, OctadecylTrichloroSilane

Keywords

Area Selective
Plasma vs Thermal Comparison

Notes

702