Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 56, No. 1, pp. 104--107
Date:
2009-12-01
Author Information
Name | Institution |
---|---|
Han-Bo-Ram Lee | Yonsei University |
Jae-Min Kim | Yonsei University |
Hyungjun Kim | Yonsei University |
Woo-Hee Kim | Pohang University of Science and Technology (POSTECH) |
Jeongwon Lee | Pohang University of Science and Technology (POSTECH) |
Inchan Hwang | Pohang University of Science and Technology (POSTECH) |
Films
Plasma Co
Thermal Co
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Wetting Angle
Analysis: Contact Angle Measurement
Substrates
Si(001) |
SiO2 |
OTS, OctadecylTrichloroSilane |
Notes
702 |