Publication Information

Title: Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt

Type: Journal

Info: Journal of the Korean Physical Society, Vol. 56, No. 1, pp. 104--107

Date: 2009-12-01

DOI: https://inis.iaea.org/search/search.aspx?orig_q=RN:44022473

Author Information

Name

Institution

Yonsei University

Yonsei University

Yonsei University

Pohang University of Science and Technology (POSTECH)

Pohang University of Science and Technology (POSTECH)

Pohang University of Science and Technology (POSTECH)

Films

Plasma Co using Quros Plus 150

Deposition Temperature = 350C

635680-58-9

7664-41-7

Thermal Co using Quros Plus 150

Deposition Temperature = 350C

635680-58-9

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

-

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

-

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

-

Resistivity, Sheet Resistance

Four-point Probe

-

Wetting Angle

Contact Angle Measurement

-

Substrates

Si(001)

SiO2

OTS, OctadecylTrichloroSilane

Keywords

Area Selective

Plasma vs Thermal Comparison

Notes

702



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