Han-Bo-Ram Lee Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Han-Bo-Ram Lee returned 21 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
2Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
3Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
4High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
5Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
6Plasma-Enhanced Atomic Layer Deposition of Ni
7Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
8A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
9In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
10Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
11Formation of Ni silicide from atomic layer deposited Ni
12Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
13Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
14Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
15Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
16Plasma-enhanced atomic layer deposition of Co on metal surfaces
17Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
18Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
19Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
20Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
21Very high frequency plasma reactant for atomic layer deposition